Patents by Inventor Kourosh Nafisi
Kourosh Nafisi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230401694Abstract: A method and apparatus for identifying locations to be inspected on a substrate is disclosed. A defect location prediction model is trained using a training dataset associated with other substrates to generate a prediction of defect or non-defect and a confidence score associated with the prediction for each of the locations based on process-related data associated with the substrates. Those of the locations determined by the defect location prediction model as having confidences scores satisfying a confidence threshold are added to a set of locations to be inspected by an inspection system. After the set of locations are inspected, the inspection results data is obtained, and the defect location prediction model is incrementally trained by using the inspection results data and process-related data for the set of locations as training data.Type: ApplicationFiled: November 2, 2021Publication date: December 14, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Chenxi LIN, Yi ZOU, Tanbir HASAN, Huina XU, Ren-Jay KOU, Nabeel Noor MOIN, Kourosh NAFISI
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Publication number: 20220214165Abstract: Disclosed herein are methods and systems for analyzing a cross-sectional feature of a structural element on a semiconductor wafer to determine whether an isolated or a systemic failure to reach preselected parameters occurred.Type: ApplicationFiled: May 21, 2020Publication date: July 7, 2022Inventors: Manoj Kumar Dayyala, Jorge Pablo Fernandez, Kourosh Nafisi
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Patent number: 10347462Abstract: A method for detecting crystal defects includes scanning a first FOV on a first sample using a charged particle beam with a plurality of different tilt angles. BSE emitted from the first sample are detected and a first image of the first FOV is created. A first area within the first image is identified where signals from the BSE are lower than other areas of the first image. A second FOV on a second sample is scanned using approximately the same tilt angles or deflections as those used to scan the first area. The BSE emitted from the second sample are detected and a second image of the second FOV is created. Crystal defects within the second sample are identified by identifying areas within the second image where signals from the BSE are different than other areas of the second image.Type: GrantFiled: April 17, 2018Date of Patent: July 9, 2019Assignee: Applied Materials Israel Ltd.Inventors: Dror Shemesh, Uri Lev, Benjamin Colombeau, Amir Wachs, Kourosh Nafisi
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Publication number: 20190180975Abstract: A method for detecting crystal defects includes scanning a first FOV on a first sample using a charged particle beam with a plurality of different tilt angles. BSE emitted from the first sample are detected and a first image of the first FOV is created. A first area within the first image is identified where signals from the BSE are lower than other areas of the first image. A second FOV on a second sample is scanned using approximately the same tilt angles or deflections as those used to scan the first area. The BSE emitted from the second sample are detected and a second image of the second FOV is created. Crystal defects within the second sample are identified by identifying areas within the second image where signals from the BSE are different than other areas of the second image.Type: ApplicationFiled: April 17, 2018Publication date: June 13, 2019Inventors: Dror Shemesh, Uri Lev, Benjamin Colombeau, Amir Wachs, Kourosh Nafisi
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Patent number: 8450120Abstract: A method and system for repairing photomasks is disclosed. A scanning electron microscope (SEM) is used to identify, measure, and correct defects. The SEM is operated in multiple modes, including a measuring mode and a repair mode. The repair mode is of higher landing energy and exposure time than the measuring mode, and induces shrinkage in the photoresist to correct various features, such as vias that are too small.Type: GrantFiled: March 30, 2012Date of Patent: May 28, 2013Assignee: International Business Machines CorporationInventors: Stuart A. Sieg, Kourosh Nafisi, Eric Peter Solecky
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Publication number: 20120190134Abstract: A method and system for repairing photomasks is disclosed. A scanning electron microscope (SEM) is used to identify, measure, and correct defects. The SEM is operated in multiple modes, including a measuring mode and a repair mode. The repair mode is of higher landing energy and exposure time than the measuring mode, and induces shrinkage in the photoresist to correct various features, such as vias that are too small.Type: ApplicationFiled: January 26, 2011Publication date: July 26, 2012Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Stuart A. Sieg, Kourosh Nafisi, Eric Peter Solecky
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Publication number: 20120187294Abstract: A method and system for repairing photomasks is disclosed. A scanning electron microscope (SEM) is used to identify, measure, and correct defects. The SEM is operated in multiple modes, including a measuring mode and a repair mode. The repair mode is of higher landing energy and exposure time than the measuring mode, and induces shrinkage in the photoresist to correct various features, such as vias that are too small.Type: ApplicationFiled: March 30, 2012Publication date: July 26, 2012Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Stuart A. Sieg, Kourosh Nafisi, Eric Peter Solecky
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Patent number: 8211717Abstract: A method and system for repairing photomasks is disclosed. A scanning electron microscope (SEM) is used to identify, measure, and correct defects. The SEM is operated in multiple modes, including a measuring mode and a repair mode. The repair mode is of higher landing energy and exposure time than the measuring mode, and induces shrinkage in the photoresist to correct various features, such as vias that are too small.Type: GrantFiled: January 26, 2011Date of Patent: July 3, 2012Assignee: International Business Machines CorporationInventors: Stuart A. Sieg, Kourosh Nafisi, Eric Peter Solecky
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Patent number: 8111900Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.Type: GrantFiled: May 15, 2010Date of Patent: February 7, 2012Assignee: KLA-Tencor Technologies Corp.Inventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid B. Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkarni
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Publication number: 20100226562Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.Type: ApplicationFiled: May 15, 2010Publication date: September 9, 2010Applicant: KLA-TENCOR TECHNOLOGIES CORPORATIONInventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid B. Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkami
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Patent number: 7729529Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.Type: GrantFiled: December 7, 2004Date of Patent: June 1, 2010Assignee: KLA-Tencor Technologies Corp.Inventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid B. Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkarni
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Publication number: 20080225284Abstract: A method and computer program product for implementing inspection recipe services are provided. The method includes defining a modified reticle pitch for use in inspecting programmed defects on a test structure, the modified reticle pitch extending the distance of one reticle field plus a portion of an adjacent reticle field on the test structure. The test structure includes a number of arrays linearly arranged on the test structure and spaced equidistant, and each of the arrays corresponds to a reticle field and includes a number of cells. The method also includes using the modified reticle field pitch and an alignment site on the test structure to perform a random mode inspection of the test structure.Type: ApplicationFiled: May 28, 2008Publication date: September 18, 2008Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Oliver D. Patterson, Maryjane Brodsky, Kourosh Nafisi
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Patent number: 7397556Abstract: A method, apparatus, and computer program product for implementing inspection recipe services are provided. The apparatus includes a test structure including a semiconductor substrate and a number of arrays disposed on the semiconductor substrate. The arrays are linearly arranged and spaced equidistant. Each of the arrays corresponds to a reticle field and includes a number of cells. The test structure also includes a defect programmed into every third array. The defect is programmed in the same location on each third array. The test structure further includes an alignment site defined on the test structure for providing a point of reference upon inspection. The alignment site, in conjunction with a modified reticle pitch extending the distance of one reticle field plus a portion of an adjacent reticle field, are used to perform a random mode inspection of selected arrays in the test structure.Type: GrantFiled: October 31, 2006Date of Patent: July 8, 2008Assignee: International Business Machines CorporationInventors: Oliver D. Patterson, Maryjane Brodsky, Kourosh Nafisi
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Publication number: 20080100831Abstract: A method, apparatus, and computer program product for implementing inspection recipe services are provided. The apparatus includes a test structure including a semiconductor substrate and a number of arrays disposed on the semiconductor substrate. The arrays are linearly arranged and spaced equidistant. Each of the arrays corresponds to a reticle field and includes a number of cells. The test structure also includes a defect programmed into every third array. The defect is programmed in the same location on each third array. The test structure further includes an alignment site defined on the test structure for providing a point of reference upon inspection. The alignment site, in conjunction with a modified reticle pitch extending the distance of one reticle field plus a portion of an adjacent reticle field, are used to perform a random mode inspection of selected arrays in the test structure.Type: ApplicationFiled: October 31, 2006Publication date: May 1, 2008Applicant: International Business Machines CorporationInventors: Oliver D. Patterson, Maryjane Brodsky, Kourosh Nafisi
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Publication number: 20060291714Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.Type: ApplicationFiled: December 7, 2004Publication date: December 28, 2006Inventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkarni