Patents by Inventor Kourosh Nafisi

Kourosh Nafisi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10347462
    Abstract: A method for detecting crystal defects includes scanning a first FOV on a first sample using a charged particle beam with a plurality of different tilt angles. BSE emitted from the first sample are detected and a first image of the first FOV is created. A first area within the first image is identified where signals from the BSE are lower than other areas of the first image. A second FOV on a second sample is scanned using approximately the same tilt angles or deflections as those used to scan the first area. The BSE emitted from the second sample are detected and a second image of the second FOV is created. Crystal defects within the second sample are identified by identifying areas within the second image where signals from the BSE are different than other areas of the second image.
    Type: Grant
    Filed: April 17, 2018
    Date of Patent: July 9, 2019
    Assignee: Applied Materials Israel Ltd.
    Inventors: Dror Shemesh, Uri Lev, Benjamin Colombeau, Amir Wachs, Kourosh Nafisi
  • Publication number: 20190180975
    Abstract: A method for detecting crystal defects includes scanning a first FOV on a first sample using a charged particle beam with a plurality of different tilt angles. BSE emitted from the first sample are detected and a first image of the first FOV is created. A first area within the first image is identified where signals from the BSE are lower than other areas of the first image. A second FOV on a second sample is scanned using approximately the same tilt angles or deflections as those used to scan the first area. The BSE emitted from the second sample are detected and a second image of the second FOV is created. Crystal defects within the second sample are identified by identifying areas within the second image where signals from the BSE are different than other areas of the second image.
    Type: Application
    Filed: April 17, 2018
    Publication date: June 13, 2019
    Inventors: Dror Shemesh, Uri Lev, Benjamin Colombeau, Amir Wachs, Kourosh Nafisi
  • Patent number: 8450120
    Abstract: A method and system for repairing photomasks is disclosed. A scanning electron microscope (SEM) is used to identify, measure, and correct defects. The SEM is operated in multiple modes, including a measuring mode and a repair mode. The repair mode is of higher landing energy and exposure time than the measuring mode, and induces shrinkage in the photoresist to correct various features, such as vias that are too small.
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: May 28, 2013
    Assignee: International Business Machines Corporation
    Inventors: Stuart A. Sieg, Kourosh Nafisi, Eric Peter Solecky
  • Publication number: 20120187294
    Abstract: A method and system for repairing photomasks is disclosed. A scanning electron microscope (SEM) is used to identify, measure, and correct defects. The SEM is operated in multiple modes, including a measuring mode and a repair mode. The repair mode is of higher landing energy and exposure time than the measuring mode, and induces shrinkage in the photoresist to correct various features, such as vias that are too small.
    Type: Application
    Filed: March 30, 2012
    Publication date: July 26, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Stuart A. Sieg, Kourosh Nafisi, Eric Peter Solecky
  • Publication number: 20120190134
    Abstract: A method and system for repairing photomasks is disclosed. A scanning electron microscope (SEM) is used to identify, measure, and correct defects. The SEM is operated in multiple modes, including a measuring mode and a repair mode. The repair mode is of higher landing energy and exposure time than the measuring mode, and induces shrinkage in the photoresist to correct various features, such as vias that are too small.
    Type: Application
    Filed: January 26, 2011
    Publication date: July 26, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Stuart A. Sieg, Kourosh Nafisi, Eric Peter Solecky
  • Patent number: 8211717
    Abstract: A method and system for repairing photomasks is disclosed. A scanning electron microscope (SEM) is used to identify, measure, and correct defects. The SEM is operated in multiple modes, including a measuring mode and a repair mode. The repair mode is of higher landing energy and exposure time than the measuring mode, and induces shrinkage in the photoresist to correct various features, such as vias that are too small.
    Type: Grant
    Filed: January 26, 2011
    Date of Patent: July 3, 2012
    Assignee: International Business Machines Corporation
    Inventors: Stuart A. Sieg, Kourosh Nafisi, Eric Peter Solecky
  • Patent number: 8111900
    Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.
    Type: Grant
    Filed: May 15, 2010
    Date of Patent: February 7, 2012
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid B. Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkarni
  • Publication number: 20100226562
    Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.
    Type: Application
    Filed: May 15, 2010
    Publication date: September 9, 2010
    Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION
    Inventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid B. Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkami
  • Patent number: 7729529
    Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.
    Type: Grant
    Filed: December 7, 2004
    Date of Patent: June 1, 2010
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid B. Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkarni
  • Publication number: 20080225284
    Abstract: A method and computer program product for implementing inspection recipe services are provided. The method includes defining a modified reticle pitch for use in inspecting programmed defects on a test structure, the modified reticle pitch extending the distance of one reticle field plus a portion of an adjacent reticle field on the test structure. The test structure includes a number of arrays linearly arranged on the test structure and spaced equidistant, and each of the arrays corresponds to a reticle field and includes a number of cells. The method also includes using the modified reticle field pitch and an alignment site on the test structure to perform a random mode inspection of the test structure.
    Type: Application
    Filed: May 28, 2008
    Publication date: September 18, 2008
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Oliver D. Patterson, Maryjane Brodsky, Kourosh Nafisi
  • Patent number: 7397556
    Abstract: A method, apparatus, and computer program product for implementing inspection recipe services are provided. The apparatus includes a test structure including a semiconductor substrate and a number of arrays disposed on the semiconductor substrate. The arrays are linearly arranged and spaced equidistant. Each of the arrays corresponds to a reticle field and includes a number of cells. The test structure also includes a defect programmed into every third array. The defect is programmed in the same location on each third array. The test structure further includes an alignment site defined on the test structure for providing a point of reference upon inspection. The alignment site, in conjunction with a modified reticle pitch extending the distance of one reticle field plus a portion of an adjacent reticle field, are used to perform a random mode inspection of selected arrays in the test structure.
    Type: Grant
    Filed: October 31, 2006
    Date of Patent: July 8, 2008
    Assignee: International Business Machines Corporation
    Inventors: Oliver D. Patterson, Maryjane Brodsky, Kourosh Nafisi
  • Publication number: 20080100831
    Abstract: A method, apparatus, and computer program product for implementing inspection recipe services are provided. The apparatus includes a test structure including a semiconductor substrate and a number of arrays disposed on the semiconductor substrate. The arrays are linearly arranged and spaced equidistant. Each of the arrays corresponds to a reticle field and includes a number of cells. The test structure also includes a defect programmed into every third array. The defect is programmed in the same location on each third array. The test structure further includes an alignment site defined on the test structure for providing a point of reference upon inspection. The alignment site, in conjunction with a modified reticle pitch extending the distance of one reticle field plus a portion of an adjacent reticle field, are used to perform a random mode inspection of selected arrays in the test structure.
    Type: Application
    Filed: October 31, 2006
    Publication date: May 1, 2008
    Applicant: International Business Machines Corporation
    Inventors: Oliver D. Patterson, Maryjane Brodsky, Kourosh Nafisi
  • Publication number: 20060291714
    Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.
    Type: Application
    Filed: December 7, 2004
    Publication date: December 28, 2006
    Inventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkarni