Patents by Inventor Kousaburou Matsumura

Kousaburou Matsumura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive resist patterns
    Patent number: 4983495
    Abstract: Positive resist patterns prepared by using a derivative of polyacrylic acid esters containing halogen expressed by the following general formula for the resist material; ##STR1## (where A is a structural unit which is derived from monomers having a copolymerable double bond, and X is either a halogen atom or a methyl group. m is a positive integer, n is 0 or a positive integer, n/m is 0 to 2 and m+n are 20 to 20,000. Y.sub.1 to Y.sub.5 are a fluorine or hydrogen atom and at least one of them is a fluorine atom).
    Type: Grant
    Filed: December 29, 1989
    Date of Patent: January 8, 1991
    Assignee: Tosoh Corporation
    Inventors: Yoshitaka Tsutsumi, Toru Seita, Kousaburou Matsumura, Kyoko Nagaoka, Toshimitsu Yanagihara
  • A method of image-wise exposing and developing halogen-containing polyacrylate derivatives
    Patent number: 4822721
    Abstract: Halogen-containing polyacrylate derivatives having the formula: ##STR1## wherein A is a structural unit derived from a copolymeriazable monomer having a double bond; R is ##STR2## wherein each of R.sub.1 and R.sub.2 is a hydrogen atom or a fluorinated methyl group, provided R.sub.1 and R.sub.2 are not hydrogen atoms at the same time, and R.sub.3 is a hydrogen atom or a lower alkyl group; X is a halogen atom or a methyl group; and m is a positive integer, n is 0 or a positive integer, and n/m from 0 to 2, preferably from 0 to 1 are disclosed.Also disclosed are methods for forming a resist pattern by using the halogen-containing polyacrylate derivatives as a resist material.
    Type: Grant
    Filed: November 23, 1987
    Date of Patent: April 18, 1989
    Assignee: Toyo Soda Manufacturing Co., Ltd.
    Inventors: Yoshitaka Tsutsumi, Toru Seita, Hideo Shuyama, Kousaburou Matsumura, Kyoko Nakazawa
  • Halogen-containing polyacrylate derivatives
    Patent number: 4752635
    Abstract: A halogen-containing polyacrylate derivative having the formula: ##STR1## wherein A is a structural unit derived from a copolymerizable monomer having a double bond; R is ##STR2## wherein each of R.sub.1 and R.sub.2 is a hydrogen atom or a fluorinated methyl group, provided R.sub.1 and R.sub.2 are not hydrogen atoms at the same time, and R.sub.3 is a hydrogen atom or a lower alkyl group; X is a halogen atom or a methyl group; and m is a positive integer, n is 0 or a positive integer, and n/m is from 0 to 2, preferably from 0 to 1.
    Type: Grant
    Filed: December 24, 1986
    Date of Patent: June 21, 1988
    Assignee: Toyo Soda Manufacturing Co., Ltd.
    Inventors: Yoshitaka Tsutsumi, Toru Seita, Hideo Shuyama, Kousaburou Matsumura, Kyoko Nakazawa