Patents by Inventor Kousei Uehira

Kousei Uehira has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8691495
    Abstract: A photoresist pattern forming method, comprising a first step of forming on an underlayer a photoresist film which includes a convex portion and a concave portion having a thickness thinner than a thickness of the convex portion, and a second step of processing the photoresist film to form, in a portion which has been the convex portion, an opening having a width narrower than a width of the convex portion, wherein in the second step, the convex portion of the photoresist film is at least partially exposed, and the photoresist film is then developed, and exposure light is condensed by the convex portion in exposing the photoresist film.
    Type: Grant
    Filed: August 24, 2012
    Date of Patent: April 8, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kousei Uehira, Satoshi Hirayama
  • Publication number: 20130059239
    Abstract: A photoresist pattern forming method, comprising a first step of forming on an underlayer a photoresist film which includes a convex portion and a concave portion having a thickness thinner than a thickness of the convex portion, and a second step of processing the photoresist film to form, in a portion which has been the convex portion, an opening having a width narrower than a width of the convex portion, wherein in the second step, the convex portion of the photoresist film is at least partially exposed, and the photoresist film is then developed, and exposure light is condensed by the convex portion in exposing the photoresist film.
    Type: Application
    Filed: August 24, 2012
    Publication date: March 7, 2013
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Kousei Uehira, Satoshi Hirayama