Patents by Inventor Kousuke Doi

Kousuke Doi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240112682
    Abstract: An utterer identification device executes: performing voice recognition from input utterance data; selecting, from among a plurality of registered utterance contents set in advance, a registered utterance content closest to a recognized utterance content indicated by a result of the voice recognition as a selected utterance content; selecting, from among a plurality of databases respectively associated with the registered utterance contents, a database associated with the selected utterance content; calculating a similarity between a feature quantity of the input utterance data and a feature quantity stored in the selected database; and identifying a certain utterer on the basis of the similarity, and outputting a result of the identification.
    Type: Application
    Filed: December 7, 2023
    Publication date: April 4, 2024
    Applicant: Panasonic Intellectual Property Corporation of America
    Inventors: Takahiro KAMAI, Misaki DOI, Katsunori DAIMO, Kousuke ITAKURA
  • Publication number: 20240105174
    Abstract: A voice recognition device includes an estimation unit that compares a plurality of pieces of registration voice data stored in a database with input voice data uttered by a speaker who gets on a mobile body to estimate a registration command corresponding to the input command, a presentation unit that presents an estimation result, a second acquisition unit that acquires an error instruction indicating that the estimation result is an error, a determination unit that, in a case where the error instruction is acquired, determines a correct command corresponding to the input command based on an operation by the speaker, and a database management unit that stores the correct command and the input voice data in the database in association with each other
    Type: Application
    Filed: December 4, 2023
    Publication date: March 28, 2024
    Applicant: Panasonic Intellectual Property Corporation of America
    Inventors: Takahiro KAMAI, Katsunori DAIMO, Misaki DOI, Kousuke ITAKURA
  • Publication number: 20240087570
    Abstract: A voice recognition device includes: a calculation unit that calculates a first feature amount that is a feature amount of input voice data acquired by a first acquisition unit; an estimation unit that estimates a driving situation of a mobile object on the basis of operation information acquired by a second acquisition unit; an extraction unit that extracts, from a feature amount database, a second feature amount corresponding to the driving situation; a recognition unit that recognizes an input command on the basis of similarity between the first feature amount and the second feature amount; and an output unit that outputs a recognition result.
    Type: Application
    Filed: November 22, 2023
    Publication date: March 14, 2024
    Applicant: Panasonic Intellectual Property Corporation of America
    Inventors: Takahiro KAMAI, Kousuke ITAKURA, Misaki DOI, Katsunori DAIMO
  • Publication number: 20240077819
    Abstract: Provided is a heater including: a substrate that has electrical conductivity; a first insulation portion that is provided on a first surface of the substrate, has an insulation property; at least one heat generation body that is provided on the first insulation portion; a second insulation portion that is provided on a second surface of the substrate which is opposite to the first surface, has an insulation property; at least one detection unit that is provided on at least one of the first insulation portion and the second insulation portion; and a first wiring which is provided on at least one of the first insulation portion and the second insulation portion, and in which one end is electrically connected to one terminal of the detection unit and the other end is electrically connected to the substrate having the electrical conductivity.
    Type: Application
    Filed: September 6, 2023
    Publication date: March 7, 2024
    Inventors: Kousuke Ueno, Masahiko Tamai, Shinjiro Aono, Akio Tsubouchi, Tsuyoshi Ohashi, Satoko Kato, Masahiro Doi, Makoto Sakai
  • Patent number: 7522660
    Abstract: An object of this invention is to realize a pulse pattern generating apparatus that outputs a test signal of high waveform quality even when the shape of an eye pattern is changed. This invention is an improvement of a pulse pattern generating apparatus that generates a test signal of a predetermined pattern by using plural digital-analog converters and outputs the test signal to a test subject.
    Type: Grant
    Filed: July 23, 2004
    Date of Patent: April 21, 2009
    Assignee: Yokogawa Electric Corporation
    Inventors: Chie Sato, Shinji Kobayashi, Hirotoshi Kodaka, Ikurou Aoki, Kousuke Doi, Akira Toyama, Morio Wada, Hiroyuki Matsuura, Hiroshi Sugawara, Masamichi Ohashi, Hironori Okita, Yasukazu Akasaka, Tsuyoshi Yakihara, Akira Miura
  • Patent number: 7358028
    Abstract: The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle. A novolak resin or a hydroxystyrenic resin is reacted with a crosslinking agent to give a slightly alkali-soluble or alkali-insoluble resin having such a property that solubility in an aqueous alkali solution is enhanced in the presence of an acid, which is then dissolved in an organic solvent, together with (B) a compound generating an acid under irradiation with radiation to obtain a chemical amplification type positive photoresist composition wherein the content of an acid component is 10 ppm or less.
    Type: Grant
    Filed: May 19, 2004
    Date of Patent: April 15, 2008
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kenji Maruyama, Masaki Kurihara, Ken Miyagi, Satoshi Niikura, Satoshi Shimatani, Masahiro Masujima, Kazuyuki Nitta, Toshihiro Yamaguchi, Kousuke Doi
  • Patent number: 7245413
    Abstract: A light modulation apparatus including a Mach-Zehnder type light modulator, a driver for modulator outputting a control signal according to an input electric signal, a light branching circuit branching the output light signal, and a bias control circuit applying a bias voltage to the light modulator based on the branched light signal, the apparatus further comprises: a burst pause state detection circuit detecting a pause state of a burst signal included in the input electric signal; a photoelectric transducer converting an output light signal branched by the light branching circuit into an electric signal; a sampling circuit extracting the electric signal converted while the pause state is detected by the burst pause state; and a bias voltage adjustment circuit adjusting a bias voltage value of the bias voltage based on a voltage level of the extracted electric signal.
    Type: Grant
    Filed: September 27, 2006
    Date of Patent: July 17, 2007
    Assignee: Yokogawa Electric Corporation
    Inventors: Akira Miura, Kenji Uchida, Katsuya Ikezawa, Hiroyuki Matsuura, Akira Toyama, Toshiaki Kobayashi, Tsuyoshi Yakihara, Kousuke Doi
  • Publication number: 20070117045
    Abstract: The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle A novolak resin or a hydroxystyrenic resin is reacted with a crosslinking agent to give a slightly alkali-soluble or alkali-insoluble resin having such a property that solubility in an aqueous alkali solution is enhanced in the presence of an acid, which is then dissolved in an organic solvent, together with (B) a compound generating an acid under irradiation with radiation to obtain a chemical amplification type positive photoresist composition wherein the content of an acid component is 10 ppm or less.
    Type: Application
    Filed: January 12, 2007
    Publication date: May 24, 2007
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kenji Maruyama, Masaki Kurihara, Ken Miyagi, Satoshi Niikura, Satoshi Shimatani, Masahiro Masujima, Kazuyuki Nitta, Toshihiro Yamaguchi, Kousuke Doi
  • Publication number: 20070070488
    Abstract: A light modulation apparatus including a Mach-Zehnder type light modulator, a driver for modulator outputting a control signal according to an input electric signal, a light branching circuit branching the output light signal, and a bias control circuit applying a bias voltage to the light modulator based on the branched light signal, the apparatus further comprises: a burst pause state detection circuit detecting a pause state of a burst signal included in the input electric signal; a photoelectric transducer converting an output light signal branched by the light branching circuit into an electric signal; a sampling circuit extracting the electric signal converted while the pause state is detected by the burst pause state; and a bias voltage adjustment circuit adjusting a bias voltage value of the bias voltage based on a voltage level of the extracted electric signal.
    Type: Application
    Filed: September 27, 2006
    Publication date: March 29, 2007
    Inventors: Akira Miura, Kenji Uchida, Katsuya Ikezawa, Hiroyuki Matsuura, Akira Toyama, Toshiaki Kobayashi, Tsuyoshi Yakihara, Kousuke Doi
  • Patent number: 7060410
    Abstract: There is provided a method of producing a resist composition which yields a resist composition with good storage stability, and no fluctuation in characteristics between production lots. There are provided: a novolak resin solution formed by adding benzoquinone to a novolak resin solution produced by dissolving a novolak resin in an organic solvent; a positive photoresist composition comprising the novolak resin solution and a photosensitive component; a positive photoresist composition comprising the novolak resin solution, a photosensitive component, and hydroquinone; and a method of producing a positive photoresist composition involving mixing the novolak resin solution described above and a photosensitive component.
    Type: Grant
    Filed: April 15, 2003
    Date of Patent: June 13, 2006
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hiroyuki Ohnishi, Yusuke Nakagawa, Kousuke Doi
  • Patent number: 6964838
    Abstract: A composition includes (A) an alkali-soluble resin, (B) a quinonediazide ester of a compound represented by the following formula: and (C) a compound represented by the following formula: This composition is a positive photoresist composition that is excellent in sensitivity and definition and causes less shrink.
    Type: Grant
    Filed: January 4, 2002
    Date of Patent: November 15, 2005
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Masaki Kurihara, Takako Suzuki, Kenji Maruyama, Satoshi Niikura, Kousuke Doi
  • Publication number: 20050244740
    Abstract: The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle. A novolak resin or a hydroxystyrenic resin is reacted with a crosslinking agent to give a slightly alkali-soluble or alkali-insoluble resin having such a property that solubility in an aqueous alkali solution is enhanced in the presence of an acid, which is then dissolved in an organic solvent, together with (B) a compound generating an acid under irradiation with radiation to obtain a chemical amplification type positive photoresist composition wherein the content of an acid component is 10 ppm or less.
    Type: Application
    Filed: May 19, 2004
    Publication date: November 3, 2005
    Inventors: Kenji Maruyama, Masaki Kurihara, Ken Miyagi, Satoshi Niikura, Satoshi Shimatani, Masahiro Masujima, Kazuyuki Nitta, Toshihiro Yamaguchi, Kousuke Doi
  • Patent number: 6939926
    Abstract: A phenol novolak resin has a peak intensity ratio of ortho-ortho bond (o-o)/ortho-para bond (o-p)/para-para bond (p-p) in a resin structure not substantially varying in each molecular weight fraction and has a weight average molecular weight (Mw) of 3000 to 20000 in terms of polystyrene, which peak intensity ratio is detected by 13C-NMR analysis. The phenol novolak resin can form both dense pattern and isolation pattern with good shapes in the formation of a fine resist pattern of not more than 0.35 ?m and has satisfactory sensitivity, definition, and focal depth range properties, and has a resin composition being uniform in each molecular weight fraction. A process for producing the phenol novolak resin, and a positive photoresist composition using the resin are also provided.
    Type: Grant
    Filed: February 9, 2004
    Date of Patent: September 6, 2005
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Ken Miyagi, Yasuhide Ohuchi, Atsuko Hirata, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama
  • Patent number: 6884566
    Abstract: A novel copolymer includes a repeating unit (B) derived from an unsaturated carboxylic anhydride, a repeating unit (C) represented by Formula (II), and a repeating unit (D) represented by Formula (III).
    Type: Grant
    Filed: October 16, 2003
    Date of Patent: April 26, 2005
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Tsuyoshi Nakamura, Taeko Ikegawa, Atsushi Sawano, Kousuke Doi, Hidekatsu Kohara
  • Patent number: 6869742
    Abstract: A positive photoresist composition includes (A) an alkali-soluble novolak resin containing 1,2-naphthoquinonediazidosulfonyl groups substituting for part of hydrogen atoms of phenolic hydroxyl groups, (B) an ester of, for example, a compound represented by the following formula with a naphthoquinonediazidosulfonyl compound, and (C) a sensitizer:
    Type: Grant
    Filed: April 1, 2002
    Date of Patent: March 22, 2005
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Jyunichi Mizuta, Kouji Yonemura, Akira Katano, Satoshi Niikura, Kousuke Doi
  • Publication number: 20050058190
    Abstract: An object of this invention is to realize a pulse pattern generating apparatus that outputs a test signal of high waveform quality even when the shape of an eye pattern is changed. This invention is an improvement of a pulse pattern generating apparatus that generates a test signal of a predetermined pattern by using plural digital-analog converters and outputs the test signal to a test subject.
    Type: Application
    Filed: July 23, 2004
    Publication date: March 17, 2005
    Applicant: YOKOGAWA ELECTRIC CORPORATION
    Inventors: Chie Sato, Shinji Kobayashi, Hirotoshi Kodaka, Ikurou Aoki, Kousuke Doi, Akira Toyama, Morio Wada, Hiroyuki Matsuura, Hiroshi Sugawara, Masamichi Ohashi, Hironori Okita, Yasukazu Akasaka, Tsuyoshi Yakihara, Akira Miura
  • Publication number: 20040167312
    Abstract: A phenol novolak resin has a peak intensity ratio of ortho-ortho bond (o-o)/ortho-para bond (o-p)/para-para bond (p-p) in a resin structure not substantially varying in each molecular weight fraction and has a weight average molecular weight (Mw) of 3000 to 20000 in terms of polystyrene, which peak intensity ratio is detected by 13C-NMR analysis. The phenol novolak resin can form both dense pattern and isolation pattern with good shapes in the formation of a fine resist pattern of not more than 0.35 &mgr;m and has satisfactory sensitivity, definition, and focal depth range properties, and has a resin composition being uniform in each molecular weight fraction. A process for producing the phenol novolak resin, and a positive photoresist composition using the resin are also provided.
    Type: Application
    Filed: February 9, 2004
    Publication date: August 26, 2004
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Ken Miyagi, Yasuhide Ohuchi, Atsuko Hirata, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama
  • Publication number: 20040137359
    Abstract: A composition includes (A) an alkali-soluble resin, (B) a quinonediazide ester of a compound represented by the following formula: 1
    Type: Application
    Filed: December 23, 2003
    Publication date: July 15, 2004
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Masaki Kurihara, Takako Suzuki, Kenji Maruyama, Satoshi Niikura, Kousuke Doi
  • Patent number: 6762005
    Abstract: A composition includes (A) an alkali-soluble resin having Mw of 1500 to 10000, (B) a quinonediazide ester of, for example, the following formula, and (C) a phenolic compound containing an acid-decomposable group. When a resin film 1 &mgr;m thick is prepared from the alkali-soluble resin (A), the resin film is completely dissolved in 2.38% by weight tetramethylammonium hydroxide aqueous solution at 23° C. within ten seconds.
    Type: Grant
    Filed: November 15, 2002
    Date of Patent: July 13, 2004
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akira Katano, Yusuke Nakagawa, Shinichi Kono, Kousuke Doi
  • Patent number: 6756178
    Abstract: A composition includes (A) a novolak resin containing at least 20% by mole of a m-cresol repeating unit and having a 1-ethoxyethyl group substituting for part of hydrogen atoms of phenolic hydroxyl groups, (B) a quinonediazide ester of, for example, the following formula, and (C) 1,1-bis(4-hydroxyphenyl)cyclohexane.
    Type: Grant
    Filed: November 15, 2002
    Date of Patent: June 29, 2004
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akira Katano, Yusuke Nakagawa, Shinichi Kono, Kousuke Doi