Patents by Inventor Kousuke ISOBE

Kousuke ISOBE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multi-block copolymer composition obtained by modification treatment, and film
    Patent number: 11492452
    Abstract: A main purpose of the present invention is to provide a multi-block copolymer composition having good elasticity and excellent stress relaxation properties, as well as small tension set. The present invention achieves the purpose by providing a multi-block copolymer composition obtained by a modification treatment, the composition including a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond to a block copolymer A; wherein the block copolymer A includes a block copolymer A1 having a specific primary structure and a block copolymer A2 having a specific primary structure, and the mass ratio (A1/A2) of the block copolymer A1 and the block copolymer A2 is 100/0 to 50/50.
    Type: Grant
    Filed: August 23, 2018
    Date of Patent: November 8, 2022
    Assignees: ZEON CORPORATION, NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
    Inventors: Kousuke Isobe, Sadaharu Hashimoto, Atsushi Nozawa, Atsushi Noro, Takato Kajita, Yushu Matsushita
  • Block copolymer composition obtained by modification treatment, method for producing same, modified block copolymer composition used for same, and method for producing said modified block copolymer composition
    Patent number: 11466150
    Abstract: A main object of the present invention is to provide a block copolymer composition which has good elasticity, while having excellent stress relaxation properties. The object is achieved by providing a block copolymer composition obtained by a modification treatment, the block copolymer composition comprising a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond into a block copolymer A including at least one aromatic vinyl polymer block and at least one conjugated diene polymer block.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: October 11, 2022
    Assignees: ZEON CORPORATION, NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
    Inventors: Kousuke Isobe, Sadaharu Hashimoto, Atsushi Nozawa, Ryoji Kameyama, Atsushi Noro, Takato Kajita, Yushu Matsushita
  • Block copolymer composition including ionic group, and film
    Patent number: 11459417
    Abstract: The present invention provides a block copolymer composition comprising a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond into a block copolymer A including at least one aromatic vinyl polymer block and at least one conjugated diene polymer block, wherein: the block copolymer B includes an ionic group as the functional group capable of forming a non-covalent bond.
    Type: Grant
    Filed: April 25, 2019
    Date of Patent: October 4, 2022
    Assignees: ZEON CORPORATION, NATIONAL UNIVERSITY CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM
    Inventors: Kousuke Isobe, Sadaharu Hashimoto, Atsushi Noro, Takato Kajita, Haruka Tanaka, Yushu Matsushita
  • BLOCK COPOLYMER COMPOSITION INCLUDING IONIC GROUP, AND FILM
    Publication number: 20210230336
    Abstract: The present invention provides a block copolymer composition comprising a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond into a block copolymer A including at least one aromatic vinyl polymer block and at least one conjugated diene polymer block, wherein: the block copolymer B includes an ionic group as the functional group capable of forming a non-covalent bond.
    Type: Application
    Filed: April 25, 2019
    Publication date: July 29, 2021
    Applicants: ZEON CORPORATION, NATIONAL UNIVERSITY CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM
    Inventors: Kousuke ISOBE, Sadaharu HASHIMOTO, Atsushi NORO, Takato KAJITA, Haruka TANAKA, Yushu MATSUSHITA
  • MULTI-BLOCK COPOLYMER COMPOSITION OBTAINED BY MODIFICATION TREATMENT, AND FILM
    Publication number: 20200255607
    Abstract: A main purpose of the present invention is to provide a multi-block copolymer composition having good elasticity and excellent stress relaxation properties, as well as small tension set. The present invention achieves the purpose by providing a multi-block copolymer composition obtained by a modification treatment, the composition including a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond to a block copolymer A; wherein the block copolymer A includes a block copolymer A1 having a specific primary structure and a block copolymer A2 having a specific primary structure, and the mass ratio (A1/A2) of the block copolymer A1 and the block copolymer A2 is 100/0 to 50/50.
    Type: Application
    Filed: August 23, 2018
    Publication date: August 13, 2020
    Applicants: ZEON CORPORATION, NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
    Inventors: Kousuke ISOBE, Sadaharu HASHIMOTO, Atsushi NOZAWA, Atsushi NORO, Takato KAJITA, Yushu MATSUSHITA
  • BLOCK COPOLYMER COMPOSITION OBTAINED BY MODIFICATION TREATMENT, METHOD FOR PRODUCING SAME, MODIFIED BLOCK COPOLYMER COMPOSITION USED FOR SAME, AND METHOD FOR PRODUCING SAID MODIFIED BLOCK COPOLYMER COMPOSITION
    Publication number: 20200062948
    Abstract: A main object of the present invention is to provide a block copolymer composition which has good elasticity, while having excellent stress relaxation properties. The object is achieved by providing a block copolymer composition obtained by a modification treatment, the block copolymer composition comprising a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond into a block copolymer A including at least one aromatic vinyl polymer block and at least one conjugated diene polymer block.
    Type: Application
    Filed: May 1, 2018
    Publication date: February 27, 2020
    Applicants: ZEON CORPORATION, NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
    Inventors: Kousuke ISOBE, Sadaharu HASHIMOTO, Atsushi NOZAWA, Ryoji KAMEYAMA, Atsushi NORO, Takato KAJITA, Yushu MATSUSHITA