Patents by Inventor Kousuke Ohyama

Kousuke Ohyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RESIST COMPOSITION AND PATTERN FORMING PROCESS
    Publication number: 20240210830
    Abstract: A resist composition is provided comprising (A) a polymer comprising repeat units having an acid labile group, (B) an organic solvent, and (C) an onium salt having formula: Zq+Xq? wherein Zq+ is a sulfonium, iodonium or ammonium cation, and Xq? is an anion. When processed by high-energy radiation lithography, the resist composition exhibits satisfactory sensitivity. LWR and maximum resolution and is resistant to pattern collapse.
    Type: Application
    Filed: November 10, 2023
    Publication date: June 27, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Kazuhiro Katayama, Tatsuya Yamahira, Yutaro Otomo, Kousuke Ohyama
  • RESIST MATERIAL AND PATTERN FORMING METHOD
    Publication number: 20230296980
    Abstract: An object of the present invention is to provide a resist material and a pattern forming method with which the edge roughness and dimension variation become small, superior resolution can be obtained, pattern shape becomes preferable after exposure, and further preferable storage stability can be obtained.
    Type: Application
    Filed: March 9, 2023
    Publication date: September 21, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yutaro OTOMO, Tomohiro Kobayashi, Gentaro Hida, Kousuke Ohyama, Masayoshi Sagehashi, Masahiro Fukushima
  • POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
    Publication number: 20230161252
    Abstract: A positive resist composition is provided comprising a base polymer end-capped with a salt consisting of an ammonium cation linked to a sulfide group and a fluorinated anion. Because of controlled acid diffusion, a resist film of the composition forms a pattern of good profile with a high resolution and reduced edge roughness or dimensional variation.
    Type: Application
    Filed: November 16, 2022
    Publication date: May 25, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Shun Kikuchi, Kousuke Ohyama
  • POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
    Publication number: 20230161255
    Abstract: A positive resist composition is provided comprising a base polymer end-capped with an ammonium salt of an iodized acid, linked to a sulfide group. Because of controlled acid diffusion, a resist film of the composition forms a pattern of good profile with a high resolution and reduced edge roughness or dimensional variation.
    Type: Application
    Filed: November 16, 2022
    Publication date: May 25, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Shun Kikuchi, Kousuke Ohyama
  • POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
    Publication number: 20230152696
    Abstract: A positive resist composition is provided comprising a base polymer end-capped with a sulfonium salt containing a carboxylate anion having a sulfide group linked thereto. Because of controlled acid diffusion, a resist film of the composition forms a pattern of good profile with a high resolution and reduced edge roughness or dimensional variation.
    Type: Application
    Filed: November 14, 2022
    Publication date: May 18, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Kousuke Ohyama, Shun Kikuchi
  • ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20220127225
    Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition forms a pattern having minimal defects and excellent lithography performance factors such as CDU, LWR and DOF.
    Type: Application
    Filed: October 6, 2021
    Publication date: April 28, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Satoshi Watanabe, Kousuke Ohyama