Abstract: The present invention provides a method of manufacturing solid-state imaging devices comprising the steps of: forming a large number of solid-state image sensing devices over a wafer; forming, in positions matching said solid-state image sensing devices on the under face of a transparent flat plate to be joined to said wafer, frame-shaped spacers of a prescribed thickness each in a shape of surrounding an individual solid imaging element; aligning said wafer and said transparent flat plate opposite each other; supporting with a fixed table substantially the whole of one of the under face of said wafer and the upper face of said transparent flat plate, supporting substantially the other face with a pressing member via an elastic member, and thereby joining said wafer and said transparent flat plate via said spacers by the pressing member; and splitting said wafer and said transparent flat plate individual solid-state image sensing devices.