Patents by Inventor Koutaro Tanaka

Koutaro Tanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11911846
    Abstract: Provided is a work processing apparatus configured so that limitations on the contents of processing for a work piece or the type of work piece can be reduced and processing for a wider range of processing contents and work piece can be performed. In a work processing apparatus 100, a work table 101 is, through a table displacement mechanism 103, supported on a rotation base 120 to be rotatably driven by a table rotary drive motor 125, and a weight holding tool 110 is supported on the rotation base 120 through a weight displacement mechanism 114. The table displacement mechanism 103 includes a rack-and-pinion mechanism configured to displace the work table 101 in an X-axis direction as viewed in the figure. At the table displacement mechanism 103, a power inputter 108 configured to input drive force from a table displacement mechanism drive apparatus 130 is provided.
    Type: Grant
    Filed: September 27, 2019
    Date of Patent: February 27, 2024
    Assignee: ENSHU LIMITED
    Inventors: Koutaro Matsumoto, Kenzo Tanaka, Takeshi Muraki, Kazushige Morozumi, Yoshimichi Uda, Daiki Ishizuka
  • Patent number: 7820558
    Abstract: A film with small hysteresis and high voltage resistance is obtained by reducing the carbon content in a gate insulating film on a SiC substrate. Specifically, the carbon content in the gate insulating film is set to 1×1020 atoms/cm3 or less. For this, using a plasma processing apparatus, a silicon oxide film is formed on the SiC substrate and then the formed silicon oxide film is reformed by exposure to radicals containing nitrogen atoms. Thus, the gate insulating film excellent in electrical properties is obtained.
    Type: Grant
    Filed: June 21, 2007
    Date of Patent: October 26, 2010
    Assignees: Tohoku University, Foundation for Advancement of International Science
    Inventors: Tadahiro Ohmi, Akinobu Teramoto, Koutaro Tanaka
  • Publication number: 20080135954
    Abstract: A film with small hysteresis and high voltage resistance is obtained by reducing the carbon content in a gate insulating film on a SiC substrate. Specifically, the carbon content in the gate insulating film is set to 1×1020 atoms/cm3 or less. For this, using a plasma processing apparatus, a silicon oxide film is formed on the SiC substrate and then the formed silicon oxide film is reformed by exposure to radicals containing nitrogen atoms. Thus, the gate insulating film excellent in electrical properties is obtained.
    Type: Application
    Filed: June 21, 2007
    Publication date: June 12, 2008
    Inventors: Tadahiro Ohmi, Akinobu Teramoto, Koutaro Tanaka
  • Patent number: 4939384
    Abstract: A flip-flop circuit comprises two basic flip-flop circuits, four field effect transistors, and four amplifiers. The two basic flip-flop circuits respectively composed of a first and a second inverter circuits, and an output terminal of the first inverter circuit is connected to an input terminal of the second inverter circuit and an output terminal of the second inverter circuit is connected to the input terminal of the first inverter circuit. The field effect transistors have sources respectively connected to input terminals of the two basic flip-flop circuits, and gates to which clock pulses and inverse clock pulses are applied. The amplifiers respectively composed of an inverter circuit are connected to output terminals of the two basic flip-flop circuits.
    Type: Grant
    Filed: October 3, 1988
    Date of Patent: July 3, 1990
    Assignee: Oki Electric Industry Co., Ltd
    Inventors: Makoto Shikata, Koutaro Tanaka, Masahiro Akiyama, Yasushi Kawakami