Patents by Inventor Koutarou Koizumi

Koutarou Koizumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Removal method of organic matter and system for the same
    Patent number: 5747387
    Abstract: According to the present invention, the surface of the sample is cleaned with water immediately after ashing of the resist the quality of which has been changed through ion implantation by ozone-containing gas, or ozone-containing gas and ultraviolet ray, or the sample is cleaned with water without being exposed to the atmosphere after ashing, thereby allowing the number of residues to be reduced to 1/100, decreasing the load in cleaning process by solution, cutting down the semiconductor device production cost and improving the semiconductor device productivity.
    Type: Grant
    Filed: August 25, 1995
    Date of Patent: May 5, 1998
    Assignees: Hitachi, Ltd., Hitachi Microcomputer System Ltd.
    Inventors: Koutarou Koizumi, Sukeyoshi Tsunekawa, Kazuhiko Kawai, Maki Shimoda, Katsuhiko Itoh, Haruo Itoh, Akio Saito