Patents by Inventor Koutarou Miyatani

Koutarou Miyatani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for supercritical carbon dioxide processing of fluoro-carbon films
    Patent number: 7307019
    Abstract: A method for treating a fluoro-carbon dielectric film for integration of the dielectric film into a semiconductor device. The method includes providing a substrate having a fluoro-carbon film deposited thereon, the film having an exposed surface containing contaminants, and treating the exposed surface with a supercritical carbon dioxide fluid to clean the exposed surface of the contaminants and provide surface termination. The supercritical carbon dioxide treatment improves adhesion and electrical properties of film structures containing a metal-containing film formed on the surface of the fluoro-carbon dielectric film.
    Type: Grant
    Filed: September 29, 2004
    Date of Patent: December 11, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Kohei Kawamura, Akira Asano, Koutarou Miyatani, Joseph T. Hillman, Bentley Palmer
  • A METHOD FOR SUPERCRITICAL CARBON DIOXIDE PROCESSING OF FLUORO-CARBON FILMS
    Publication number: 20060068583
    Abstract: A method for treating a fluoro-carbon dielectric film for integration of the dielectric film into a semiconductor device. The method includes providing a substrate having a fluoro-carbon film deposited thereon, the film having an exposed surface containing contaminants, and treating the exposed surface with a supercritical carbon dioxide fluid to clean the exposed surface of the contaminants and provide surface termination. The supercritical carbon dioxide treatment improves adhesion and electrical properties of film structures containing a metal-containing film formed on the surface of the fluoro-carbon dielectric film.
    Type: Application
    Filed: September 29, 2004
    Publication date: March 30, 2006
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Kohei Kawamura, Akira Asano, Koutarou Miyatani, Joseph Hillman, Bentley Palmer