Patents by Inventor Koutarou Takahashi

Koutarou Takahashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method
    Patent number: 8735048
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit represented by the following formula (1), a resist film using the composition, and a pattern forming method.
    Type: Grant
    Filed: January 27, 2011
    Date of Patent: May 27, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Takeshi Inasaki, Takayuki Ito, Tomotaka Tsuchimura, Tadateru Yatsuo, Koutarou Takahashi
  • RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATIVE CHEMICAL AMPLIFICATION RESIST COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT, RESIST FILM AND RESIST-COATED MASK BLANKS
    Publication number: 20140030640
    Abstract: A resist pattern forming method contains: in the following order, (1) forming a resist film by using a negative chemical amplification resist composition containing (A) a polymer compound having a repeating unit represented by formula (1) as defined in the specification, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and (C) a crosslinking agent capable of crosslinking the polymer compound (A) by an action of an acid; (2) exposing the resist film, so as to form an exposed resist film; and (4) developing the exposed resist film by using a developer containing an organic solvent.
    Type: Application
    Filed: September 24, 2013
    Publication date: January 30, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Toru TSUCHIHASHI, Tadateru YATSUO, Koutarou TAKAHASHI, Tomotaka TSUCHIMURA
  • ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD
    Publication number: 20120301817
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit represented by the following formula (1), a resist film using the composition, and a pattern forming method.
    Type: Application
    Filed: January 27, 2011
    Publication date: November 29, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Takeshi Inasaki, Takayuki Ito, Tomotaka Tsuchimura, Tadateru Yatsuo, Koutarou Takahashi