Abstract: The present invention relates to a projection exposure apparatus that forms predetermined patterns onto a substrate. The projection exposure apparatus for forming patterns onto a substrate, which includes a mask-stage for holding a photo-mask having predetermined patterns thereon, a light source for emitting a light ray containing spectral lines including g, h, i and j-lines, a wavelength selector for selecting a light ray containing predetermined spectral lines from the light ray emitted from the light source, an illumination optical system for irradiating the photo-mask with the selected light ray, an Offner type projection system for projecting the light having passed through the photo-mask onto the substrate, a substrate stage including a vacuum portion for holding the substrate, the substrate stage for positioning the substrate, and a light-shielding body for partially blocking the light irradiated to the substrate.