Patents by Inventor Kouya Kojima

Kouya Kojima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11058660
    Abstract: A method of healing an external wound involves applying an external wound-healing agent to an external wound, or bringing the external wound-healing agent applied to a substrate into contact with an external wound, wherein the external wound-healing agent includes, as an active ingredient, at least one compound of a glycerol alkyl ester represented by defined Formula (I) or a diglycerol alkyl ester represented by defined Formula (II). In a further embodiment, the method involves bringing a fiber aggregate or a film into contact with an external wound, wherein the fiber aggregate or the film each includes a thermoplastic resin and at least one compound of the glycerol alkyl ester or the diglycerol alkyl ester.
    Type: Grant
    Filed: December 31, 2018
    Date of Patent: July 13, 2021
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Naosuke Kunimoto, Kenichi Suzuki, Kouya Kojima, Akira Hasegawa, Yasufumi Tsuchiya, Jun Kamada, Satoshi Yamasaki, Goro Kuwamura, Daisuke Hasegawa
  • Patent number: 10973742
    Abstract: A photocurable composition for manufacturing a dental prosthesis by stereolithography, including: a photopolymerization initiator; and a (meth)acrylic monomer component including an acrylic monomer (X) having no aromatic rings and having a ring structure other than an aromatic ring and two or more acryloyloxy groups in one molecule and having an Mw of from 200 to 800, and at least one of a (meth)acrylic monomer (A) having one or more ether bonds and two (meth)acryloyloxy groups in one molecule and having a defined Mw, a (meth)acrylic monomer (B) having a ring structure other than an aromatic ring and one (meth)acryloyloxy group in one molecule and having a defined Mw, a (meth)acrylic monomer (C) having a hydrocarbon skeleton and two (meth)acryloyloxy groups in one molecule and having a defined Mw, and a (meth)acrylic monomer (D) having one or more aromatic rings and one (meth)acryloyloxy group in one molecule and having a Mw.
    Type: Grant
    Filed: August 2, 2017
    Date of Patent: April 13, 2021
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Toshikazu Sakamaki, Kouya Kojima, Hirohisa Shiode, Mai Kimura
  • Patent number: 10562995
    Abstract: Provided is a photocurable composition including a monomer component including: a monomer (X) containing, within one molecule, two aromatic rings and two (meth)acryloyloxy groups, and having an Mw of from 400 to 580, and a monomer (H) containing, within one molecule, at least one of a hydroxyl group or a carboxy group, and a (meth)acryloyloxy group, and having an Mw of from 100 to 700; and a photopolymerization initiator. The composition has a functional group value (a) of from 0.5×10?3 to 2.0×10?3 mol/g. Functional group value (a)=(nH/MH)×PH??Formula (a) wherein nH represents the total number of hydroxyl groups and carboxy groups contained in one molecule of the (meth)acrylic monomer (H); MH represents the Mw of the (meth)acrylic monomer (H); and PH represents the mass ratio of the (meth)acrylic monomer (H) with respect to the total amount of the (meth)acrylic monomer component.
    Type: Grant
    Filed: October 4, 2016
    Date of Patent: February 18, 2020
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Toshikazu Sakamaki, Takashi Koura, Kouya Kojima, Hirohisa Shiode, Mai Kimura
  • Publication number: 20190175455
    Abstract: A photocurable composition for manufacturing a dental prosthesis by stereolithography, including: a photopolymerization initiator; and a (meth)acrylic monomer component including an acrylic monomer (X) having no aromatic rings and having a ring structure other than an aromatic ring and two or more acryloyloxy groups in one molecule and having an Mw of from 200 to 800, and at least one of a (meth)acrylic monomer (A) having one or more ether bonds and two (meth)acryloyloxy groups in one molecule and having a defined Mw, a (meth)acrylic monomer (B) having a ring structure other than an aromatic ring and one (meth)acryloyloxy group in one molecule and having a defined Mw, a (meth)acrylic monomer (C) having a hydrocarbon skeleton and two (meth)acryloyloxy groups in one molecule and having a defined Mw, and a (meth)acrylic monomer (D) having one or more aromatic rings and one (meth)acryloyloxy group in one molecule and having a Mw.
    Type: Application
    Filed: August 2, 2017
    Publication date: June 13, 2019
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Toshikazu SAKAMAKI, Kouya KOJIMA, Hirohisa SHIODE, Mai KIMURA
  • Publication number: 20190133987
    Abstract: A method of healing an external wound involves applying an external wound-healing agent to an external wound, or bringing the external wound-healing agent applied to a substrate into contact with an external wound, wherein the external wound-healing agent includes, as an active ingredient, at least one compound of a glycerol alkyl ester represented by defined Formula (I) or a diglycerol alkyl ester represented by defined Formula (II). In a further embodiment, the method involves bringing a fiber aggregate or a film into contact with an external wound, wherein the fiber aggregate or the film each includes a thermoplastic resin and at least one compound of the glycerol alkyl ester or the diglycerol alkyl ester.
    Type: Application
    Filed: December 31, 2018
    Publication date: May 9, 2019
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Naosuke KUNIMOTO, Kenichi SUZUKI, Kouya KOJIMA, Akira HASEGAWA, Yasufumi TSUCHIYA, Jun KAMADA, Satoshi YAMASAKI, Goro KUWAMURA, Daisuke HASEGAWA
  • Patent number: 10206762
    Abstract: Disclosed is a material for a denture base containing a polymer component and containing an acrylic resin.
    Type: Grant
    Filed: June 20, 2018
    Date of Patent: February 19, 2019
    Assignees: Mitsui Chemicals, Inc., NITTO JUSHI KOGYO CO., LTD.
    Inventors: Osamu Kohgo, Naoyuki Kato, Maho Okumura, Ahmad Jalaludin, Kouya Kojima, Eizaburo Higuchi, Yuji Takahashi
  • Patent number: 10117731
    Abstract: Disclosed is a material for a denture base containing a polymer component having a weight average molecular weight of 1,200,000 or more and containing an acrylic resin.
    Type: Grant
    Filed: February 4, 2015
    Date of Patent: November 6, 2018
    Assignees: Mitsui Chemicals, Inc., NITTO JUSHI KOGYO CO., LTD.
    Inventors: Osamu Kohgo, Naoyuki Kato, Maho Okumura, Ahmad Jalaludin, Kouya Kojima, Eizaburo Higuchi, Yuji Takahashi
  • Publication number: 20180296306
    Abstract: Disclosed is a material for a denture base containing a polymer component and containing an acrylic resin.
    Type: Application
    Filed: June 20, 2018
    Publication date: October 18, 2018
    Inventors: Osamu KOHGO, Naoyuki KATO, Maho OKUMURA, Ahmad JALALUDIN, Kouya KOJIMA, Eizaburo HIGUCHI, Yuji TAKAHASHI
  • Publication number: 20180282455
    Abstract: Provided is a photocurable composition including a monomer component including: a monomer (X) containing, within one molecule, two aromatic rings and two (meth)acryloyloxy groups, and having an Mw of from 400 to 580, and a monomer (H) containing, within one molecule, at least one of a hydroxyl group or a carboxy group, and a (meth)acryloyloxy group, and having an Mw of from 100 to 700; and a photopolymerization initiator. The composition has a functional group value (a) of from 0.5×10?3 to 2.0×10?3 mol/g. Functional group value (a)=(nH/MH)×PH??Formula (a) wherein nH represents the total number of hydroxyl groups and carboxy groups contained in one molecule of the (meth)acrylic monomer (H); MH represents the Mw of the (meth)acrylic monomer (H); and PH represents the mass ratio of the (meth)acrylic monomer (H) with respect to the total amount of the (meth)acrylic monomer component.
    Type: Application
    Filed: October 4, 2016
    Publication date: October 4, 2018
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Toshikazu Sakamaki, Takashi Koura, Kouya Kojima, Hirohisa Shiode, Mai Kimura
  • Patent number: 10066081
    Abstract: There is provided a polymerizable composition for optical materials including (A) at least one kind of polythiols selected from 5,7-dimercaptomethyl-1,11-dimercapto-3,6,9-trithiaundecane, 4,7-dimercaptomethyl-1,11-dimercapto-3,6,9-trithiaundecane, and 4,8-dimercaptomethyl-1,11-dimercapto-3,6,9-trithiaundecane, (B) polyisocyanate, and (C) at least one kind of ultraviolet absorbers having a maximum absorption peak in a range of 350 nm to 370 nm.
    Type: Grant
    Filed: December 12, 2014
    Date of Patent: September 4, 2018
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Naoyuki Kakinuma, Toshiya Hashimoto, Kouya Kojima
  • Patent number: 9933635
    Abstract: The optical material of the present invention contains one or more kinds of ultraviolet absorber (a) having a maximum absorption peak within a range of equal to or greater than 350 nm and equal to or less than 370 nm, in which a light transmittance of the optical material having a thickness of 2 mm satisfies the following characteristics (1) to (3), (1) a light transmittance at a wavelength of 410 nm is equal to or less than 10%, (2) a light transmittance at a wavelength of 420 nm is equal to or less than 70%, and (3) a light transmittance at a wavelength of 440 nm is equal to or greater than 80%.
    Type: Grant
    Filed: February 27, 2014
    Date of Patent: April 3, 2018
    Assignee: MITSUI CHEMICALS INC.
    Inventors: Toshiya Hashimoto, Naoyuki Kakinuma, Kouya Kojima
  • Patent number: 9857503
    Abstract: An optical material of the present invention has the following characteristics (1) to (4) in a transmittance curve which is measured at a thickness of 2 mm of the optical material. (1) the transmittance curve has a maximum transmittance value at 400 nm to 440 nm and the maximum transmittance thereof is 50% or more. (2) the transmittance curve has a minimum transmittance value at 471 nm to 500 nm. (3) The transmittance at 540 nm is 60% or more. (4) The minimum transmittance value at 471 nm to 500 nm is seven-tenths or less of the maximum transmittance at 400 nm to 440 nm and is seven-tenths or less of the transmittance at 540 nm.
    Type: Grant
    Filed: September 10, 2014
    Date of Patent: January 2, 2018
    Assignees: MITSUI CHEMICALS, INC., YAMAMOTO CHEMICALS, INC.
    Inventors: Kouya Kojima, Toshiya Hashimoto, Naoyuki Kakinuma, Satoshi Kinoshita, Hiroyuki Sasaki
  • Publication number: 20170209406
    Abstract: An external wound-healing agent includes, as an active ingredient, at least one compound of a glycerol alkyl ester represented by Formula (I) or a diglycerol alkyl ester represented by Formula (II).
    Type: Application
    Filed: July 15, 2015
    Publication date: July 27, 2017
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Naosuke Kunimoto, Kenichi Suzuki, Kouya Kojima, Akira Hasegawa, Yasufumi Tsuchiya, Jun Kamada, Satoshi Yamasaki, Goro Kuwamura, Daisuke Hasegawa
  • Patent number: 9708260
    Abstract: A method for producing meta-xylylenediamines includes a reaction step in which monohalogenated benzenes, formaldehydes, and an amide compound having a primary amide group or a secondary amide group are allowed to react in the presence of an acidic liquid, a dehalogenation step in which the halogen atom derived from the monohalogenated benzenes is replaced with a hydrogen atom, and a deprotection step in which the primary amide group or the secondary amide group derived from the amide compound is converted to an amino group. In the reaction step, the acidic liquid contains inorganic acid, the equivalent ratio of the hydrogen atom of the inorganic acid relative to the monohalogenated benzenes is more than 16; the acidic liquid has an inorganic acid concentration of more than 80 mass %; and the reaction temperature is more than 40° C.
    Type: Grant
    Filed: August 11, 2014
    Date of Patent: July 18, 2017
    Assignee: MITSUI CHEMICALS INC.
    Inventors: Kouya Kojima, Hidetaka Tsukada, Mamoru Takashina, Chitoshi Shimakawa, Naoyuki Kakinuma
  • Patent number: 9670148
    Abstract: A method for producing meta-xylylenediisocyanates includes a reaction step in which monohalogenated benzenes, formaldehydes, and an amide compound represented by general formula (1) below are allowed to react in the presence of an acidic liquid to produce a bisamide compound; a dehalogenation step in which in the bisamide compound, the halogen atom derived from the monohalogenated benzenes is replaced with a hydrogen atom; and a thermal decomposition step in which the bisamide compound from which the halogen atom is eliminated is subjected to thermal decomposition. In the reaction step, the acidic liquid contains inorganic acid, the equivalent ratio of the hydrogen atom of the inorganic acid relative to the monohalogenated benzenes is more than 14, the acidic liquid has an inorganic acid concentration of more than 90 mass %, and the reaction temperature is more than 10° C. General formula (1): wherein R1 represents an alkoxy group or an amino group.
    Type: Grant
    Filed: August 11, 2014
    Date of Patent: June 6, 2017
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Kouya Kojima, Hidetaka Tsukada, Mamoru Takashina, Chitoshi Shimakawa, Naoyuki Kakinuma
  • Publication number: 20170071708
    Abstract: Disclosed is a material for a denture base containing a polymer component having a weight average molecular weight of 1,200,000 or more and containing an acrylic resin.
    Type: Application
    Filed: February 4, 2015
    Publication date: March 16, 2017
    Inventors: Osamu KOHGO, Naoyuki KATO, Maho OKUMURA, Ahmad JALALUDIN, Kouya KOJIMA, Eizaburo HIGUCHI, Yuji Martinez TAKAHASHI
  • Publication number: 20160313575
    Abstract: There is provided a polymerizable composition for optical materials including polyisocyanate (A), polythiol (B), an acidic phosphoric ester (C) represented by the following General Formula (1), and one or more kinds of ultraviolet absorbers (D) having a maximum absorption peak in a range of 350 nm to 370 nm, in which in a case where the total molar number of isocyanate groups in the polyisocyanate (A) is 100 mol %, a secondary isocyanate group is included in 20 mol % or more and the acidic phosphoric ester (C) is included in an amount of 100 ppm to 700 ppm with respect to the total weight of the polyisocyanate (A) and the polythiol (B).
    Type: Application
    Filed: December 12, 2014
    Publication date: October 27, 2016
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Naoyuki KAKINUMA, Toshiya HASHIMOTO, Kouya KOJIMA
  • Publication number: 20160304701
    Abstract: There is provided a polymerizable composition for optical materials including (A) at least one kind of polythiols selected from 5,7-dimercaptomethyl-1,11-dimercapto-3,6,9-trithiaundecane, 4,7-dimercaptomethyl-1,11-dimercapto-3,6,9-trithiaundecane, and 4,8-dimercaptomethyl-1,11-dimercapto-3,6,9-trithiaundecane, (B) polyisocyanate, and (C) at least one kind of ultraviolet absorbers having a maximum absorption peak in a range of 350 nm to 370 nm.
    Type: Application
    Filed: December 12, 2014
    Publication date: October 20, 2016
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Naoyuki KAKINUMA, Toshiya HASHIMOTO, Kouya KOJIMA
  • Publication number: 20160216407
    Abstract: An optical material of the present invention has the following characteristics (1) to (4) in a transmittance curve which is measured at a thickness of 2 mm of the optical material. (1) the transmittance curve has a maximum transmittance value at 400 nm to 440 nm and the maximum transmittance thereof is 50% or more. (2) the transmittance curve has a minimum transmittance value at 471 nm to 500 nm. (3) The transmittance at 540 nm is 60% or more. (4) The minimum transmittance value at 471 nm to 500 nm is seven-tenths or less of the maximum transmittance at 400 nm to 440 nm and is seven-tenths or less of the transmittance at 540 nm.
    Type: Application
    Filed: September 10, 2014
    Publication date: July 28, 2016
    Applicants: MITSUI CHEMICALS, INC., YAMAMOTO CHEMICALS, INC.
    Inventors: Kouya KOJIMA, Toshiya HASHIMOTO, Naoyuki KAKINUMA, Satoshi KINOSHITA, Hiroyuki SASAKI
  • Publication number: 20160185722
    Abstract: A method for producing meta-xylylenediamines includes a reaction step in which monohalogenated benzenes, formaldehydes, and an amide compound having a primary amide group or a secondary amide group are allowed to react in the presence of an acidic liquid, a dehalogenation step in which the halogen atom derived from the monohalogenated benzenes is replaced with a hydrogen atom, and a deprotection step in which the primary amide group or the secondary amide group derived from the amide compound is converted to an amino group. In the reaction step, the acidic liquid contains inorganic acid, the equivalent ratio of the hydrogen atom of the inorganic acid relative to the monohalogenated benzenes is more than 16; the acidic liquid has an inorganic acid concentration of more than 80 mass %; and the reaction temperature is more than 40° C.
    Type: Application
    Filed: August 11, 2014
    Publication date: June 30, 2016
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Kouya KOJIMA, Hidetaka TSUKADA, Mamoru TAKASHINA, Chitoshi SHIMAKAWA, Naoyuki KAKINUMA