Patents by Inventor Kovilvila Ramachandran

Kovilvila Ramachandran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Magnetron sputtering apparatus
    Patent number: 4505798
    Abstract: Magnetron sputtering apparatus is described in which the target cathode is constructed of one material, for example chromium, with one or more other materials deposited thereon.A disc of chromium with nickel sectors is described as one target cathode to give a nickel to chromium ratio of 10 to 90 while rectangular and cylindrical targets are also described.
    Type: Grant
    Filed: November 17, 1983
    Date of Patent: March 19, 1985
    Assignee: Canadian Patents and Development Limited
    Inventors: Kovilvila Ramachandran, Enrico Giani
  • Sputtering apparatus and method
    Patent number: 4498969
    Abstract: A apparatus and method is described for the magnetron sputtering of a workpiece to deposit a thin metallic film. A rotating magnetic field is provided in the vicinity of the workpiece to produce higher yield from a given cathode target.
    Type: Grant
    Filed: November 17, 1983
    Date of Patent: February 12, 1985
    Assignee: Canadian Patents and Development Limited-Societe Candienne des Brevets et D'Exploitation (Limitee
    Inventor: Kovilvila Ramachandran