Patents by Inventor Koyumi SASA

Koyumi SASA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of etching metal layer
    Patent number: 9150969
    Abstract: In a method of etching a metal layer of an object to be processed, the metal layer is etched by ion sputtering etching while forming a protective film containing carbon on a surface of a mask of the object. The object is exposed to an oxygen plasma after etching the metal layer. The object is exposed to hexafluoroacetylacetone after exposing the object to the oxygen plasma.
    Type: Grant
    Filed: March 4, 2014
    Date of Patent: October 6, 2015
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Eiichi Nishimura, Fumiko Yamashita, Koyumi Sasa
  • METHOD OF ETCHING METAL LAYER
    Publication number: 20140251945
    Abstract: In a method of etching a metal layer of an object to be processed, the metal layer is etched by ion sputtering etching while forming a protective film containing carbon on a surface of a mask of the object. The object is exposed to an oxygen plasma after etching the metal layer. The object is exposed to hexafluoroacetylacetone after exposing the object to the oxygen plasma.
    Type: Application
    Filed: March 4, 2014
    Publication date: September 11, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Eiichi NISHIMURA, Fumiko YAMASHITA, Koyumi SASA