Abstract: A vibration damping device including a vibration-damping device main unit inserted into a mounting space of a bracket from a lateral side and securely supported by the bracket. The bracket includes engaging pieces on respective opposed inside faces of the mounting space, and engaging action of the engaging pieces with respect to respective detent engaging faces formed on a fixture member of the vibration-damping device main unit prevents the vibration-damping device main unit from becoming dislodged from the mounting space of the bracket. Opposed walls of the mounting space are each penetrated by an aperture window, and inspection flat surfaces are separately provided to an outside surface of each engaging piece visible from an outside through the aperture window and a corresponding external side surface of the bracket that is off the aperture window. The inspection flat surfaces are parallel to each other.

Abstract: A substrate is provided with a transparent electrode in which the pattern is hardly visible even when the transparent electrode layer has been patterned, and a method for manufacturing thereof is provided. On at least one of the surfaces of a transparent film, a first, second, and third dielectric material layer, and a patterned transparent electrode layer are included, in this order, each preferably having a film thickness and refractive index within a specific range. The first and third dielectric material layers are silicon oxide layers containing SiOx and SiOv as main components, respectively. The second dielectric material layer is a metal oxide layer containing a metal oxide. The transparent electrode layer is a conductive metal oxide layer containing an indium-tin composite oxide as a main component. The refractive indexes of the first (n1), second (n2), and third (n3) dielectric material layers satisfy the relationship n3<n1<n2.

Abstract: The substrate with a transparent electrode includes a first dielectric material layer mainly composed of SiOx, a second dielectric material layer mainly composed of a metal oxide, a third dielectric material layer mainly composed of SiOy, and a transparent electrode layer, in this order on a transparent film substrate. The transparent electrode layer is patterned to have an electrode layer-formed part and an electrode layer non-formed part. The transparent electrode layer is a layer mainly composed of an indium-tin composite oxide and having a thickness of 20 nm to 35 nm. The refractive index n1 of the first dielectric material layer, the refractive index n2 of the second dielectric material layer, and the refractive index n3 of the third dielectric material layer satisfy n3<n1<n2. The first dielectric material layer, the second dielectric material layer and the third dielectric material layer each have specific thicknesses.

Abstract: A substrate is provided with a transparent electrode in which the pattern is hardly visible even when the transparent electrode layer has been patterned, and a method for manufacturing thereof is provided. On at least one of the surfaces of a transparent film, a first, second, and third dielectric material layer, and a patterned transparent electrode layer are included, in this order, each preferably having a film thickness and refractive index within a specific range. The first and third dielectric material layers are silicon oxide layers containing SiOx and SiOv as main components, respectively. The second dielectric material layer is a metal oxide layer containing a metal oxide. The transparent electrode layer is a conductive metal oxide layer containing an indium-tin composite oxide as a main component. The refractive indexes of the first (n1), second (n2), and third (n3) dielectric material layers satisfy the relationship n3<n1<n2.

Abstract: The substrate with a transparent electrode includes a first dielectric material layer mainly composed of SiOx, a second dielectric material layer mainly composed of a metal oxide, a third dielectric material layer mainly composed of SiOy, and a transparent electrode layer, in this order on a transparent film substrate. The transparent electrode layer is patterned to have an electrode layer-formed part and an electrode layer non-formed part. The transparent electrode layer is a layer mainly composed of an indium-tin composite oxide and having a thickness of 20 nm to 35 nm. The refractive index n1 of the first dielectric material layer, the refractive index n2 of the second dielectric material layer, and the refractive index n3 of the third dielectric material layer satisfy n3<n1<n2. The first dielectric material layer, the second dielectric material layer and the third dielectric material layer each have specific thicknesses.

Abstract: A transparent electroconductive film includes a transparent substrate, at least one transparent electroconductive oxide layer deposited on the transparent substrate, and a plurality of hydrogen-containing carbon layers deposited on the transparent electroconductive oxide layer. At least one of the transparent electroconductive oxide layers contains zinc oxide. The hydrogen-containing carbon layers may be more than one, in which at least one of the hydrogen-containing carbon layers has a refractive index of 1.25 to 1.85. More preferably, the transparent electroconductive film satisfies a relationship of T1/T0?1.02 for light having a wavelength of 550 nm where T0 represents a light transmittance of the transparent substrate on which the at least one transparent electroconductive oxide layer is deposited and T1 represents a light transmittance of the transparent substrate on which the at least one transparent electroconductive oxide layer and the plurality of hydrogen-containing carbon layers are deposited.

Abstract: The present invention provides a novel acrylic block copolymer rich in flexibility and excellent in mechanical strength, moldability, oil resistance, heat resistance, thermal decomposition resistance, weather resistance, and compression set, and further rich in reactivity. The present invention also provides compositions, seal products, and automobile, electric, and electronic parts, all of which include the acrylic block copolymer. The acrylic block copolymer includes a methacrylic polymer block (a) and an acrylic polymer block (b), at least one of the polymer blocks containing, in its main chain, at least one acid anhydride group (c) represented by formula (1): (wherein R1s each represent hydrogen or a methyl group and may be the same or different, n represents an integer of 0 to 3, and m represents an integer of 0 or 1).

Abstract: The present invention provides a novel acrylic block copolymer rich in flexibility and excellent in mechanical strength, moldability, oil resistance, heat resistance, thermal decomposition resistance, weather resistance, and compression set, and further rich in reactivity. The present invention also provides compositions, seal products, and automobile, electric, and electronic parts, all of which include the acrylic block copolymer. The acrylic block copolymer includes a methacrylic polymer block (a) and an acrylic polymer block (b), at least one of the polymer blocks containing, in its main chain, at least one acid anhydride group (c) represented by formula (1): (wherein R1s each represent hydrogen or a methyl group and may be the same or different, n represents an integer of 0 to 3, and m represents an integer of 0 or 1).

Abstract: The present invention provides a process for producing a uranium oxide by dissolving a yellow cake in sulfuric acid or hydrochloric acid, bringing the obtained solution into contact with a chelating resin of diaminocarboxylic acid type and subjecting the product to neutralizing precipitation followed by heat treatment. By the contact of the solution with the chelating resin, iron, copper, molybdenum and vanadium among the metallic impurities are removed and in the subsequent neutralizing precipitation step, other metallic impurities such as aluminum, calcium, magnesium, sodium and potassium are removed. This process can easily produce uranium oxide having a high purity using a simple apparatus.

Abstract: A novel method is disclosed which enables gallium and/or indium to be selectively separated and concentrated from a solution containing them in very low concentrations together with many other metal ions in rather high concentrations. The solution is passed through a bed of a chelating ion exchange resin having an amino carboxylic acid group either immediately or after the pH adjustment. Gallium and/or indium adsorbed on the chelate resin is desorbed by eluting with a mineral acid. The eluate, after the pH adjustment, is passed through another bed of a chelating ion exchange resin having an amino carboxylic acid group, and the resin is treated with a mineral acid to elute the metal ions adsorbed on the resin to thereby recover gallium and/or indium in the form of a concentrated solution.