Abstract: An active matrix display device comprising two pixel electrodes in each rectangular area defined by adjacent signal lines and adjacent scanning lines. The pixel electrodes disposed across each signal line are connected with respective switching elements, which are connected to the common scanning line and the common signal line. In this way, each pixel electrode has only one signal line formed on one side thereof. As a result, a line defect conventionally produced by a leakage between adjacent signal lines through a pixel electrode is prevented. Further, a defective pixel can be easily corrected by short-circuiting the pixel electrode with the adjacent signal line.

Abstract: An active matrix display device comprising: scanning branch lines each branching from the scanning line; and switching elements each formed on an end portion of the scanning branch line, wherein the distance between the scanning line side of the switching element and the scanning line is so provided as to enable the scanning branch line to be cut off by irradiation with light energy. Alternatively, an active matrix display device comprising: a conductive layer disposed under the signal line and the pixel electrode with an insulating film interposed therebetween; and a conductive piece formed between the pixel electrode and the insulating film.

Abstract: A method for preparing an electrochromic display device comprising first and second electrochromic layers and a solid electrolyte interposed therebetween, comprises the steps of forming a conductive film on a substrate, forming an insulating film, over the entire surface of the conductive film forming a resist at portions on the insulating film other than a display pattern and lead-in electrodes, removing the insulating film at the display pattern and the lead-in electrodes, forming the electrochromic material layers and the solid electrolyte over the entire portions other than the lead-in electrode, removing the resist and the electrochromic layers and the solid electrolyte as formed on the insulating film, and forming a second electrode on the second electrochromic layer.

Abstract: An electrochromic display comprises an electrochromic material held in two electrode carrying substrates to manifest reversible variations in the light absorption properties upon application of a predetermined voltage to the electrodes. At least one of the two substrates is dish shaped to accurately determine the distance between the electrodes formed on the two substrates. In a preferred form, grooves are formed at the periphery, or, the raised portion of the dish shaped substrate into which conductive material is introduced to facilitate the electrical connection between the dish shaped substrate and the counter substrate, whereby terminals for the dish shaped substrate are formed on the counter substrate. Another groove is formed at the periphery, or, the raised portion of the dish shaped substrate, through which an electrolyte is impregnated into the cavity defined by the two substrates.

Abstract: An electrochromic display device and method of manufacture is disclosed wherein electrochromic material is deposited in a single layer on a single film of conductive material over the whole area of glass substrate and then the electrochromic material and conductive material are successively etched through a single mask which defines a display segment pattern and remains in position throughout the whole etching process, whereby etched edge portions of the different materials are in excellent alignment and there is therefore small plate area for a reverse emf cell and good display device performance is achieved. The electrochromic material may be etched by the solution employed for developing the photoresist, whereby an etching process step is eliminated.

Abstract: Electrochromic display device employed in a liquid EC system in which an electrode and electrochromic material applied thereon are segmented to define segments corresponding to elements of a displaying pattern and electrode segment portions in excess of the area required to define the displaying pattern are coated with an insulator material, excess area portions of electrochromic material also being similarly coated if necessary, whereby there is reduced build-up of reverse EMF upon activation of the cell and longer color persistence is achieved without use of a complicated drive circuit. To simplify device manufacture for mass-production purposes electrochromic material may be applied in a single layer on an electrode and the display pattern is defined by insulator material applied on selected areas of the electrochromic material.

Abstract: A driving circuit is provided for an electro-optical display which includes an electrochromic material and a predetermined number of display segments, various combinations of display segments defining different desired display patterns. The electrochromic phenomenon is developed within the electro-optical display upon a flow of current supplied through the display segments. The driving circuit is constructed so as to supply a predetermined amount of the flow of current to the display segments during variations of the light absorption properties.

Abstract: An electro-optical display comprises an electrochromic material and a predetermined number of display segments, each combination of the display segments defining a different desired display pattern. Lead-in electrodes connected to the respective display segments for driving purposes are shaped in such a manner as to have resistance values inversely proportional to the size of the corresponding display segments.

Abstract: In an electro-optic display which utilizes the electrochromism phenomenon of a transition metal oxide, an organic solvent for an electrolyte in contact with the transition metal oxide comprises at least one member selected from the group consisting of ketones represented by the chemical formula of C.sub.n H.sub.2n+1 COC.sub.m H.sub.2m+1 wherein n = 1, 2 and m = 2 .about. 4; alkyl acetates represented by the chemical formula of CH.sub.3 COOC.sub.n H.sub.2n+1 wherein n = 2, 3; ethylene glycol monoalkoxy acetates represented by the chemical formula of CH.sub.3 COOCH.sub.2 CH.sub.2 OC.sub.n H.sub.2n+1 wherein n = 1, 2; and diethylene glycol monoalkoxy acetates represented by the chemical formula of CH.sub.3 COOCH.sub.2 CH.sub.2 OCH.sub.2 CH.sub.2 OC.sub.n H.sub.2n+1 wherein n = 1 .about. 4.

Abstract: Electrochromic display device manufacture method wherein electrochromic material is deposited in a single layer on a single film of conductive material over the whole area of glass substrate and then the electrochromic material and conductive material are successively etched through a single mask which defines a display segment pattern and remains in position throughout the whole etching process, whereby etched edge portions of the different materials are in excellent alignment and there is therefore small plate area for a reverse emf cell and good display device performance is achieved. The electrochromic material may be etched by the solution employed for developing the photoresist, whereby an etching process step is eliminated.

Abstract: A transparent insulating film having a low adsorption characteristic of organic elements such as silicon dioxide is formed on a glass substrate carrying transparent electrodes formed thereon. The surface of the transparent insulating film is rubbed to form micro-grooves aligned in a predetermined direction. Two glass substrates having internal surfaces carrying micro-grooves formed in the above-mentioned manner are spaced against and adhered to each other and sealed through the use of a glass frit or glass paste, between which liquid crystal compositions are filled.

Abstract: Electrochromic display device manufacture method wherein electrochromic material is deposited in a single layer on a single film of conductive material over the whole area of glass substrate and then the electrochromic material and conductive material are successively etched through a single mask which defines a display segment pattern and remains in position throughout the whole etching process, whereby etched edge portions of the different materials are in excellent alignment and there is therefore small plate area for a reverse emf cell and good display device performance is achieved. The electrochromic material may be etched by the solution employed for developing the photoresist, whereby an etching process step is eliminated.