Abstract: An imaging apparatus includes a first imaging modality (1021), a second imaging modality (1022), wherein the first and second imaging modalities are in alignment with scanning zones for scanning an object or subject, and a third imaging modality (102N) which is selectively moveable between a first location (114) in which the third imaging modality is in alignment with the scanning zones for scanning the object or subject and a second location (122) in which the third imaging modality is outside of alignment with the scanning zones.

Abstract: A height measurement apparatus comprising an array of differential pressure sensors, each differential pressure sensor comprising a reference outlet and a measurement outlet, the reference outlet being a predetermined distance from a reference surface, and each differential pressure sensor further comprising an inlet configured to provide pressurized gas for the reference outlet and the measurement outlet. A flexible membrane is positioned such that a reference side of the flexible membrane is in fluid communication with the reference outlet and a measurement side of the flexible membrane is in fluid communication with the measurement outlet. The flexible membrane is configured to move when a pressure change occurs at the measurement outlet and a detector is configured to monitor the movement of the flexible membrane.

Abstract: A multi-modal imaging system (1) includes a fixed gantry (2), and a swivel gantry (8). The fixed gantry (2) supports a first imaging modality. The swivel gantry (8) connects to the fixed gantry (2) by at least three mounting points (10) and supports a second imaging modality. Selectively the swivel gantry (8) includes a swivel frame (16) and at least three mounting points (10) for mounting the fixed and swivel gantries together in an imaging configuration. The at least three mounting points (10) include at least one hinge (14) which permits the swivel gantry to swivel about the fixed gantry into a service configuration.

Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

Abstract: A multi-modal imaging system (1) includes a fixed gantry (2), and a swivel gantry (8). The fixed gantry (2) supports a first imaging modality. The swivel gantry (8) connects to the fixed gantry (2) by at least three mounting points (10) and supports a second imaging modality. Selectively the swivel gantry (8) includes a swivel frame (16) and at least three mounting points (10) for mounting the fixed and swivel gantries together in an imaging configuration. The at least three mounting points (10) include at least one hinge (14) which permits the swivel gantry to swivel about the fixed gantry into a service configuration.

Abstract: An imaging apparatus includes a first imaging modality (1021), a second imaging modality (1022), wherein the first and second imaging modalities are in alignment with scanning zones for scanning an object or subject, and a third imaging modality (102N) which is selectively moveable between a first location (114) in which the third imaging modality is in alignment with the scanning zones for scanning the object or subject and a second location (122) in which the third imaging modality is outside of alignment with the scanning zones.

Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

Abstract: A guide for guiding cables and/or hoses between two parts that are moveable relative to each other, the guide including a band having a length, width and thickness, and having a torsional stiffness about a longitudinal axis of the band, a bending stiffness about an axis in the width direction, and a shear stiffness in the thickness direction, multiple blocks fitted to the band, and a deformable member provided between two adjacent blocks, the deformable member being connected to the adjacent blocks and having a torsional stiffness about the longitudinal axis of the band, a shear stiffness in the thickness direction, and a bending stiffness about the axis in the width direction, wherein the torsional stiffness of the deformable member is substantially greater than the torsional stiffness of the band, and wherein the shear stiffness of the deformable member is substantially greater than the shear stiffness of the band.

Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

Abstract: A method of aligning an imprint template with respect to a target region of a substrate is disclosed, the method including depositing a volume of an imprintable medium within the target region; contacting an imprint template to the imprintable medium so that the imprintable medium is compressed and allowing the imprint template, the target region, or both, to move laterally with respect to each other under interfacial tension forces between the target region and the imprint template, wherein a material which is less wetting than the substrate is provided in a configuration which at least partially surrounds the target region of the substrate.

Abstract: A guide for guiding cables and/or hoses between two parts that are moveable relative to each other, the guide including a band having a length, width and thickness, and having a torsional stiffness about a longitudinal axis of the band, a bending stiffness about an axis in the width direction, and a shear stiffness in the thickness direction, multiple blocks fitted to the band, and a deformable member provided between two adjacent blocks, the deformable member being connected to the adjacent blocks and having a torsional stiffness about the longitudinal axis of the band, a shear stiffness in the thickness direction, and a bending stiffness about the axis in the width direction, wherein the torsional stiffness of the deformable member is substantially greater than the torsional stiffness of the band, and wherein the shear stiffness of the deformable member is substantially greater than the shear stiffness of the band.

Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

Abstract: The invention relates to an indentation apparatus (1) comprising a force frame (13) and a positioning frame (14). An indentation tool (5) is pressed into a work piece (7) in order to master a mould. The work piece (7) is supported by the base (6). An actuator (2) is mounted in the force frame (13). The actuator (2) and the indentation tool head (4) are connected with a rod (3). The rod (3) is fixed with flexible (swivel) joints (15) to said indentation tool (4) and said actuator (2) in order to physically decouple said force frame (13) and said positioning frame (14) from forces. Also a force sensor (9) is installed between the indentation tool (4) and the positioning frame (14). In order to keep the positioning frame unloaded, the balance force delivered by said force frame actuator (2) should be approximately equal to the indentation force. The signal of the force sensor (9) is interpreted by control electronics (10).