Abstract: Various apparatus provide for spraying high velocity droplets of liquid into a low velocity gas stream. Finely atomized droplets may quickly transfer their momentum to the gas, resulting in deceleration of the spray and acceleration of the gas. A high velocity spray of atomized liquid may transfer a substantial fraction of its kinetic energy to the gas before contacting a surface, in some aspects, suspended particles in the gas phase may be removed by high velocity liquid droplets passing through the gas. Certain aspects provide for controlling a gas flow by controlling the relative amounts of upstream and downstream momenta transferred to the gas by one or more liquid sprays.

Abstract: Various apparatus provide for spraying high velocity droplets of liquid into a low velocity gas stream. Finely atomized droplets may quickly transfer their momentum to the gas, resulting in deceleration of the spray and acceleration of the gas. A high velocity spray of atomized liquid may transfer a substantial fraction of its kinetic energy to the gas before contacting a surface, in some aspects, suspended particles in the gas phase may be removed by high velocity liquid droplets passing through the gas. Certain aspects provide for controlling a gas flow by controlling the relative amounts of upstream and downstream momenta transferred to the gas by one or more liquid sprays.

Abstract: A low-maintenance scrubber inlet device is provided for delivering effluent gases to gas scrubbers. The scrubber inlet device may comprise an interior volume configured to receive effluent gases and direct the effluent gases into the scrubber while maintaining the temperature of the effluent gases. In some instances, a heated gas is introduced to maintain the effluent gas temperature. The scrubber interface device is configured to deliver the effluent gas stream from the inlet manifold to the gas scrubbing system, and to have a very low susceptibility to clogging.

Abstract: An effluent gas scrubber and a method of scrubbing effluent gases are provided. An inlet port receives an effluent gas. The gas passes through successive chambers in which it is sprayed with a scrubbing fluid. An oxidizer within the scrubbing fluid is effective to oxidize non-water soluble gases within the effluent gas. An oxidation-reduction potential probe measures the oxidation-reduction potential of the scrubbing fluid and adds the oxidizer to the scrubbing fluid as needed. A pH probe measures the pH of the scrubbing fluid and adds a base to the scrubbing fluid as needed to maintain the pH at or above a threshold such as pH 7, or pH 12.

Abstract: A low-maintenance scrubber inlet device is provided for delivering effluent gases to gas scrubbers. The scrubber inlet device comprises a scrubber interface device in fluid communication with an inlet manifold. The inlet manifold is configured to receive effluent gases and direct the effluent gases into the scrubber interface device while maintaining the temperature of the effluent gases. In some instances, a heated gas is introduced into the inlet manifold to maintain the effluent gas temperature. The scrubber interface device is configured to deliver the effluent gas stream from the inlet manifold to the gas scrubbing system, and to have a very low susceptibility to clogging.

Abstract: An effluent gas scrubber and a method of scrubbing effluent gases are provided. An inlet port receives an effluent gas. The gas passes through successive chambers in which it is sprayed with a scrubbing fluid. An oxidizer within the scrubbing fluid is effective to oxidize non-water soluble gases within the effluent gas. An oxidation-reduction potential probe measures the oxidation-reduction potential of the scrubbing fluid and adds the oxidizer to the scrubbing fluid as needed. A pH probe measures the pH of the scrubbing fluid and adds a base to the scrubbing fluid as needed to maintain the pH at or above a threshold such as pH 7, or pH 12.

Abstract: An effluent gas scrubber and a method of scrubbing effluent gases are provided. An inlet port receives an effluent gas. The gas passes through successive chambers in which it is sprayed with a scrubbing fluid. An oxidizer within the scrubbing fluid is effective to oxidize non-water soluble gases within the effluent gas. An oxidation-reduction potential probe measures the oxidation-reduction potential of the scrubbing fluid and adds the oxidizer to the scrubbing fluid as needed. A pH probe measures the pH of the scrubbing fluid and adds a base to the scrubbing fluid as needed to maintain the pH at or above a threshold such as pH 7, or pH 12.

Abstract: A low-maintenance scrubber inlet device is provided for delivering effluent gases to gas scrubbers. The scrubber inlet device may comprise an interior volume configured to receive effluent gases and direct the effluent gases into the scrubber while maintaining the temperature of the effluent gases. In some instances, a heated gas is introduced to maintain the effluent gas temperature. The scrubber interface device is configured to deliver the effluent gas stream from the inlet manifold to the gas scrubbing system, and to have a very low susceptibility to clogging.

Abstract: An effluent gas scrubber and a method of scrubbing effluent gases are provided. An inlet port receives an effluent gas. The gas passes through successive chambers in which it is sprayed with a scrubbing fluid. An oxidizer within the scrubbing fluid is effective to oxidize non-water soluble gases within the effluent gas. An oxidation-reduction potential probe measures the oxidation-reduction potential of the scrubbing fluid and adds the oxidizer to the scrubbing fluid as needed. A pH probe measures the pH of the scrubbing fluid and adds a base to the scrubbing fluid as needed to maintain the pH at or above a threshold such as pH 7, or pH 12.