Patents by Inventor Krishnakumar M. Jayakar

Krishnakumar M. Jayakar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • POLYCRYSTALLINE SILICON PRODUCTION
    Publication number: 20130115374
    Abstract: A chemical vapor deposition (CVD) reactor system has a reaction chamber enclosed by a reaction chamber wall with an inner surface disposed towards the interior of the chamber. At least a portion of the wall is a heat control layer that faces the chamber and that consists of a material, such as electrolytic ally deposited nickel, that has an emissivity coefficient, as measured at 300K, of 0.1 or less and a hardness of at least 3.5 Moh. Polycrystalline silicon is produced from silicon-rich gases using such a CVD reactor system.
    Type: Application
    Filed: July 19, 2011
    Publication date: May 9, 2013
    Inventors: Krishnakumar M. Jayakar, Urban Robert Kultgen, II
  • Area image sensor with transparent electrodes
    Patent number: 4994405
    Abstract: A method of making a two phase image sensor having transparent electrodes self-aligned to the barrier implants.
    Type: Grant
    Filed: November 21, 1989
    Date of Patent: February 19, 1991
    Assignee: Eastman Kodak Company
    Inventor: Krishnakumar M. Jayakar