Patents by Inventor Krishnamur Venkataraman

Krishnamur Venkataraman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming ultra fine deep dielectric isolation
    Patent number: 4274909
    Abstract: A method is shown for forming ultra fine, deep dielectric isolation in a silicon body. The method involves forming a first layer of material on the silicon body over a first set of alternately designated device regions. A conformal coating is deposited over the first layer and on the silicon body included in a second set of alternately designated device regions and the designated isolation regions. The thickness of the conformal coating is chosen to be substantially the width of the planned isolation between device regions. A second layer is then deposited over the conformal coating. The first layer and conformal coating are composed of different materials.
    Type: Grant
    Filed: March 17, 1980
    Date of Patent: June 23, 1981
    Assignee: International Business Machines Corporation
    Inventors: Krishnamur Venkataraman, Bob H. Yun