Patents by Inventor Krzysztof Kamil Kachel
Krzysztof Kamil Kachel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11970766Abstract: Examples of the disclosure relate to a sequential infiltration synthesis apparatus comprising: a reaction chamber constructed and arranged to accommodate at least one substrate; a first precursor flow path to provide the first precursor to the reaction chamber when a first flow controller is activated; a second precursor flow path to provide a second precursor to the reaction chamber when a second flow controller is activated; a removal flow path to allow removal of gas from the reaction chamber; a removal flow controller to create a gas flow in the reaction chamber to the removal flow path when the removal flow controller is activated; and, a sequence controller operably connected to the first, second and removal flow controllers and the sequence controller being programmed to enable infiltration of an infiltrateable material provided on the substrate in the reaction chamber. The apparatus may be provided with a heating system.Type: GrantFiled: January 17, 2023Date of Patent: April 30, 2024Assignee: ASM IP Holding B.V.Inventors: Ivo Johannes Raaijmakers, Jan Willem Maes, Werner Knaepen, Krzysztof Kamil Kachel
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Patent number: 11851755Abstract: A sequential infiltration synthesis apparatus comprising: a reaction chamber constructed and arranged to hold at least a first substrate; a precursor distribution and removal system to provide to and remove from the reaction chamber a vaporized first or second precursor; and, a sequence controller operably connected to the precursor distribution and removal system and comprising a memory provided with a program to execute infiltration of an infiltrateable material provided on the substrate when run on the sequence controller by: activating the precursor distribution and removal system to provide and maintain the first precursor for a first period T1 in the reaction chamber; activating the precursor distribution and removal system to remove a portion of the first precursor from the reaction chamber for a second period T2; and, activating the precursor distribution and removal system to provide and maintain the second precursor for a third period T3 in the reaction chamber.Type: GrantFiled: November 19, 2020Date of Patent: December 26, 2023Assignee: ASM IP Holding B.V.Inventors: Jan Willem Maes, Werner Knaepen, Krzysztof Kamil Kachel, David Kurt de Roest, Bert Jongbloed, Dieter Pierreux
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Publication number: 20230183856Abstract: Examples of the disclosure relate to a sequential infiltration synthesis apparatus comprising: a reaction chamber constructed and arranged to accommodate at least one substrate; a first precursor flow path to provide the first precursor to the reaction chamber when a first flow controller is activated; a second precursor flow path to provide a second precursor to the reaction chamber when a second flow controller is activated; a removal flow path to allow removal of gas from the reaction chamber; a removal flow controller to create a gas flow in the reaction chamber to the removal flow path when the removal flow controller is activated; and, a sequence controller operably connected to the first, second and removal flow controllers and the sequence controller being programmed to enable infiltration of an infiltrateable material provided on the substrate in the reaction chamber. The apparatus may be provided with a heating system.Type: ApplicationFiled: January 17, 2023Publication date: June 15, 2023Applicant: ASM IP Holding B.V.Inventors: Ivo Johannes Raaijmakers, Jan Willem Maes, Werner Knaepen, Krzysztof Kamil Kachel
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Patent number: 11581186Abstract: The disclosure relates to a sequential infiltration synthesis apparatus comprising: a reaction chamber constructed and arranged to accommodate at least one substrate; a first precursor flow path to provide the first precursor to the reaction chamber when a first flow controller is activated; a second precursor flow path to provide a second precursor to the reaction chamber when a second flow controller is activated; a removal flow path to allow removal of gas from the reaction chamber; a removal flow controller to create a gas flow in the reaction chamber to the removal flow path when the removal flow controller is activated; and, a sequence controller operably connected to the first, second and removal flow controllers and the sequence controller being programmed to enable infiltration of an infiltrateable material provided on the substrate in the reaction chamber. The apparatus may be provided with a heating system.Type: GrantFiled: December 15, 2016Date of Patent: February 14, 2023Assignee: ASM IP Holding B.V.Inventors: Ivo Johannes Raaijmakers, Jan Willem Maes, Werner Knaepen, Krzysztof Kamil Kachel
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Publication number: 20220389578Abstract: A sequential infiltration synthesis apparatus comprising: a reaction chamber constructed and arranged to hold at least a first substrate; a precursor distribution and removal system to provide to and remove from the reaction chamber a vaporized first or second precursor; and, a sequence controller operably connected to the precursor distribution and removal system and comprising a memory provided with a program to execute infiltration of an infiltrateable material provided on the substrate when run on the sequence controller by: activating the precursor distribution and removal system to provide and maintain the first precursor for a first period T1 in the reaction chamber; activating the precursor distribution and removal system to remove a portion of the first precursor from the reaction chamber for a second period T2; and, activating the precursor distribution and removal system to provide and maintain the second precursor for a third period T3 in the reaction chamber.Type: ApplicationFiled: August 11, 2022Publication date: December 8, 2022Inventors: Jan Willem Maes, Werner Knaepen, Krzysztof Kamil Kachel, David Kurt De Roest, Bert Jongbloed, Dieter Pierreux
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Patent number: 11447861Abstract: A sequential infiltration synthesis apparatus comprising: a reaction chamber constructed and arranged to hold at least a first substrate; a precursor distribution and removal system to provide to and remove from the reaction chamber a vaporized first or second precursor; and, a sequence controller operably connected to the precursor distribution and removal system and comprising a memory provided with a program to execute infiltration of an infiltrateable material provided on the substrate when run on the sequence controller by: activating the precursor distribution and removal system to provide and maintain the first precursor for a first period T1 in the reaction chamber; activating the precursor distribution and removal system to remove a portion of the first precursor from the reaction chamber for a second period T2; and, activating the precursor distribution and removal system to provide and maintain the second precursor for a third period T3 in the reaction chamber.Type: GrantFiled: December 15, 2016Date of Patent: September 20, 2022Assignee: ASM IP Holding B.V.Inventors: Jan Willem Maes, Werner Knaepen, Krzysztof Kamil Kachel, David Kurt De Roest, Bert Jongbloed, Dieter Pierreux
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Publication number: 20210247693Abstract: The method relates to a method of forming an enhanced unexposed photoresist layer from an unexposed photoresist layer on a substrate by increasing the sensitivity of the unexposed photoresist to exposure radiation. The method comprises: providing the substrate with the unexposed photoresist layer in a reaction chamber; providing a first precursor comprising a portion of a photosensitizer sensitive to exposure radiation in the reaction chamber; and, infiltrating the unexposed photoresist layer on the substrate with the first precursor.Type: ApplicationFiled: April 15, 2021Publication date: August 12, 2021Inventors: Jan Willem Maes, Krzysztof Kamil Kachel, David Kurt de Roest
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Patent number: 11022879Abstract: The method relates to a method of forming an enhanced unexposed photoresist layer from an unexposed photoresist layer on a substrate by increasing the sensitivity of the unexposed photoresist to exposure radiation. The method comprises: providing the substrate with the unexposed photoresist layer in a reaction chamber; providing a first precursor comprising a portion of a photosensitizer sensitive to exposure radiation in the reaction chamber; and, infiltrating the unexposed photoresist layer on the substrate with the first precursor.Type: GrantFiled: October 22, 2018Date of Patent: June 1, 2021Assignee: ASM IP Holding B.V.Inventors: Jan Willem Maes, Krzysztof Kamil Kachel, David Kurt de Roest
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Publication number: 20210071298Abstract: A sequential infiltration synthesis apparatus comprising: a reaction chamber constructed and arranged to hold at least a first substrate; a precursor distribution and removal system to provide to and remove from the reaction chamber a vaporized first or second precursor; and, a sequence controller operably connected to the precursor distribution and removal system and comprising a memory provided with a program to execute infiltration of an infiltrateable material provided on the substrate when run on the sequence controller by: activating the precursor distribution and removal system to provide and maintain the first precursor for a first period T1 in the reaction chamber; activating the precursor distribution and removal system to remove a portion of the first precursor from the reaction chamber for a second period T2; and, activating the precursor distribution and removal system to provide and maintain the second precursor for a third period T3 in the reaction chamber.Type: ApplicationFiled: November 19, 2020Publication date: March 11, 2021Inventors: Jan Willem Maes, Werner Knaepen, Krzysztof Kamil Kachel, David Kurt de Roest, Bert Jongbloed, Dieter Pierreux
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Publication number: 20190368040Abstract: An infiltration apparatus is disclosed.Type: ApplicationFiled: June 1, 2018Publication date: December 5, 2019Inventors: Krzysztof Kamil Kachel, Elina Färm
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Publication number: 20190163056Abstract: The method relates to a method of forming an enhanced unexposed photoresist layer from an unexposed photoresist layer on a substrate by increasing the sensitivity of the unexposed photoresist to exposure radiation. The method comprises: providing the substrate with the unexposed photoresist layer in a reaction chamber; providing a first precursor comprising a portion of a photosensitizer sensitive to exposure radiation in the reaction chamber; and, infiltrating the unexposed photoresist layer on the substrate with the first precursor.Type: ApplicationFiled: October 22, 2018Publication date: May 30, 2019Inventors: Jan Willem Maes, Krzysztof Kamil Kachel, David Kurt de Roest
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Publication number: 20180174826Abstract: The disclosure relates to a sequential infiltration synthesis apparatus comprising: a reaction chamber constructed and arranged to accommodate at least one substrate; a first precursor flow path to provide the first precursor to the reaction chamber when a first flow controller is activated; a second precursor flow path to provide a second precursor to the reaction chamber when a second flow controller is activated; a removal flow path to allow removal of gas from the reaction chamber; a removal flow controller to create a gas flow in the reaction chamber to the removal flow path when the removal flow controller is activated; and, a sequence controller operably connected to the first, second and removal flow controllers and the sequence controller being programmed to enable infiltration of an infiltrateable material provided on the substrate in the reaction chamber. The apparatus may be provided with a heating system.Type: ApplicationFiled: December 15, 2016Publication date: June 21, 2018Inventors: Ivo Johannes Raaijmakers, Jan Willem Maes, Werner Knaepen, Krzysztof Kamil Kachel
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Publication number: 20180171475Abstract: A sequential infiltration synthesis apparatus comprising: a reaction chamber constructed and arranged to hold at least a first substrate; a precursor distribution and removal system to provide to and remove from the reaction chamber a vaporized first or second precursor; and, a sequence controller operably connected to the precursor distribution and removal system and comprising a memory provided with a program to execute infiltration of an infiltrateable material provided on the substrate when run on the sequence controller by: activating the precursor distribution and removal system to provide and maintain the first precursor for a first period T1 in the reaction chamber; activating the precursor distribution and removal system to remove a portion of the first precursor from the reaction chamber for a second period T2; and, activating the precursor distribution and removal system to provide and maintain the second precursor for a third period T3 in the reaction chamber.Type: ApplicationFiled: December 15, 2016Publication date: June 21, 2018Inventors: Jan Willem Maes, Werner Knaepen, Krzysztof Kamil Kachel, David Kurt De Roest, Bert Jongbloed, Dieter Pierreux
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Patent number: 9916980Abstract: A method of forming a layer on a substrate is provided by providing the substrate with a hardmask material. The hardmask material is infiltrated with infiltration material during N infiltration cycles by: a) providing a first precursor to the hardmask material on the substrate in the reaction chamber for a first period T1; b) removing a portion of the first precursor for a second period T2; and, c) providing a second precursor to the hardmask material on the substrate for a third period T3, allowing the first and second precursor to react with each other forming the infiltration material.Type: GrantFiled: December 15, 2016Date of Patent: March 13, 2018Assignee: ASM IP Holding B.V.Inventors: Werner Knaepen, Jan Willem Maes, Bert Jongbloed, Krzysztof Kamil Kachel, Dieter Pierreux, David Kurt De Roest