Patents by Inventor Krzysztof Kryszczuk

Krzysztof Kryszczuk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8739081
    Abstract: A method and system for computing Fourier coefficients for a Fourier representation of a mask transmission function for a lithography mask. The method includes: sampling a polygon of a mask pattern of the lithography mask to obtain an indicator function which defines the polygon, performing a Fourier Transform on the indicator function to obtain preliminary Fourier coefficients, and scaling the Fourier coefficients for the Fourier representation of the mask transmission function, where at least one of the steps is carried out using a computer device.
    Type: Grant
    Filed: February 12, 2013
    Date of Patent: May 27, 2014
    Assignee: International Business Machines Corporation
    Inventors: Paul T. Hurley, Krzysztof Kryszczuk, Robin Scheibler, Davide Schipani
  • Patent number: 8402399
    Abstract: A method and system for computing Fourier coefficients for a Fourier representation of a mask transmission function for a lithography mask. The method includes: sampling a polygon of a mask pattern of the lithography mask to obtain an indicator function which defines the polygon, performing a Fourier Transform on the indicator function to obtain preliminary Fourier coefficients, and scaling the Fourier coefficients for the Fourier representation of the mask transmission function, where at least one of the steps is carried out using a computer device.
    Type: Grant
    Filed: April 8, 2011
    Date of Patent: March 19, 2013
    Assignee: International Business Machines Corporation
    Inventors: Paul T Hurley, Krzysztof Kryszczuk, Robin Scheibler, Davide Schipani
  • Patent number: 8327312
    Abstract: Printability of a very-large-scale integration design is assessed by: during a training phase, generating a training set of very-large-scale integration design shapes representative of a population of very-large-scale integration design shapes, obtaining a set of mathematical representations of respective shapes in the training set, identifying at least two classes of physical events causally linked to the printability for the very-large-scale integration design shapes, each of the classes being associated to a respective level of printability, labeling each mathematical representation of the set according to one of the identified classes, based on a lithography model, and selecting a probabilistic model function maximizing a probability of a class, given the set of mathematical representations; and during a testing phase, providing a very-large-scale integration design shape to be tested, testing the provided very-large-scale integration design shape, and labeling the provided very-large-scale integration de
    Type: Grant
    Filed: July 27, 2011
    Date of Patent: December 4, 2012
    Assignee: International Business Machines Corporation
    Inventors: Paul T. Hurley, Krzysztof Kryszczuk, Juri Ranieri, Robin Scheibler
  • Publication number: 20120030643
    Abstract: Printability of a very-large-scale integration design is assessed by: during a training phase, generating a training set of very-large-scale integration design shapes representative of a population of very-large-scale integration design shapes, obtaining a set of mathematical representations of respective shapes in the training set, identifying at least two classes of physical events causally linked to the printability for the very-large-scale integration design shapes, each of the classes being associated to a respective level of printability, labeling each mathematical representation of the set according to one of the identified classes, based on a lithography model, and selecting a probabilistic model function maximizing a probability of a class, given the set of mathematical representations; and during a testing phase, providing a very-large-scale integration design shape to be tested, testing the provided very-large-scale integration design shape, and labeling the provided very-large-scale integration de
    Type: Application
    Filed: July 27, 2011
    Publication date: February 2, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Paul T. Hurley, Krzysztof Kryszczuk, Juri Ranieri, Robin Scheibler
  • Publication number: 20110271240
    Abstract: A method and system for computing Fourier coefficients for a Fourier representation of a mask transmission function for a lithography mask. The method includes: sampling a polygon of a mask pattern of the lithography mask to obtain an indicator function which defines the polygon, performing a Fourier Transform on the indicator function to obtain preliminary Fourier coefficients, and scaling the Fourier coefficients for the Fourier representation of the mask transmission function, where at least one of the steps is carried out using a computer device.
    Type: Application
    Filed: April 8, 2011
    Publication date: November 3, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Paul T. Hurley, Krzysztof Kryszczuk, Robin Scheibler, Davide Schipani