Patents by Inventor Ku-Ning Chang

Ku-Ning Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11069419
    Abstract: The present disclosure, in some embodiments, relates to a method of forming an integrated chip. The method includes forming a test line letter structure having one or more sidewalls continuously extending along a path that defines a shape of an alpha-numeric character from a top-view. The test line letter structure is formed by forming a first polysilicon structure over a substrate and forming a second polysilicon structure over the substrate at a location laterally separated from first polysilicon structure by a dielectric layer.
    Type: Grant
    Filed: September 5, 2018
    Date of Patent: July 20, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Jui-Tsung Lien, Fang-Lan Chu, Hong-Da Lin, Wei Cheng Wu, Ku-Ning Chang, Yu-Chen Wang
  • Publication number: 20190019567
    Abstract: The present disclosure, in some embodiments, relates to a method of forming an integrated chip. The method includes forming a test line letter structure having one or more sidewalls continuously extending along a path that defines a shape of an alpha-numeric character from a top-view. The test line letter structure is formed by forming a first polysilicon structure over a substrate and forming a second polysilicon structure over the substrate at a location laterally separated from first polysilicon structure by a dielectric layer.
    Type: Application
    Filed: September 5, 2018
    Publication date: January 17, 2019
    Inventors: Jui-Tsung Lien, Fang-Lan Chu, Hong-Da Lin, Wei Cheng Wu, Ku-Ning Chang, Yu-Chen Wang
  • Patent number: 10163522
    Abstract: The present disclosure relates to a substrate having test line letters that are used to identify a test line on an integrated chip, while avoiding contamination of high-k metal gate processes, and a method of formation. In some embodiments, the substrate has a semiconductor substrate. A test line letter structure is arranged over the semiconductor substrate and has one or more trenches vertically extending between an upper surface of the test letter structure and a lower surface of the test line letter structure. The one or more trenches are arranged within the test line letter structure to form an opening in the upper surface of the test line structure that has a shape of an alpha-numeric character.
    Type: Grant
    Filed: October 15, 2015
    Date of Patent: December 25, 2018
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jui-Tsung Lien, Fang-Lan Chu, Hong-Da Lin, Wei Cheng Wu, Ku-Ning Chang, Yu-Chen Wang
  • Patent number: 9983257
    Abstract: The present disclosure relates to a substrate having test line letters that are used to identify a test line on an integrated chip, while avoiding contamination of high-k metal gate processes, and a method of formation. In some embodiments, an integrated chip is disclosed. The integrated chip has a semiconductor substrate. A test line letter is arranged over the semiconductor substrate. The test line letter comprises a positive relief that protrudes outward from the semiconductor substrate in the shape of an alpha-numeric character. One or more dummy structures are arranged over the semiconductor substrate. The one or more dummy structures are proximate to a boundary of the test line letter.
    Type: Grant
    Filed: October 15, 2015
    Date of Patent: May 29, 2018
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wei Cheng Wu, Jui-Tsung Lien, Fang-Lan Chu, Hong-Da Lin, Ku-Ning Chang, Yu-Chen Wang
  • Publication number: 20170110202
    Abstract: The present disclosure relates to a substrate having test line letters that are used to identify a test line on an integrated chip, while avoiding contamination of high-k metal gate processes, and a method of formation. In some embodiments, an integrated chip is disclosed. The integrated chip has a semiconductor substrate. A test line letter is arranged over the semiconductor substrate. The test line letter comprises a positive relief that protrudes outward from the semiconductor substrate in the shape of an alpha-numeric character. One or more dummy structures are arranged over the semiconductor substrate. The one or more dummy structures are proximate to a boundary of the test line letter.
    Type: Application
    Filed: October 15, 2015
    Publication date: April 20, 2017
    Inventors: Wei Cheng Wu, Jui-Tsung Lien, Fang-Lan Chu, Hong-Da Lin, Ku-Ning Chang, Yu-Chen Wang
  • Publication number: 20170110201
    Abstract: The present disclosure relates to a substrate having test line letters that are used to identify a test line on an integrated chip, while avoiding contamination of high-k metal gate processes, and a method of formation. In some embodiments, the substrate has a semiconductor substrate. A test line letter structure is arranged over the semiconductor substrate and has one or more trenches vertically extending between an upper surface of the test letter structure and a lower surface of the test line letter structure. The one or more trenches are arranged within the test line letter structure to form an opening in the upper surface of the test line structure that has a shape of an alpha-numeric character.
    Type: Application
    Filed: October 15, 2015
    Publication date: April 20, 2017
    Inventors: Jui-Tsung Lien, Fang-Lan Chu, Hong-Da Lin, Wei Cheng Wu, Ku-Ning Chang, Yu-Chen Wang
  • Patent number: 8663451
    Abstract: The present invention provides a linker for joining an electrode and a capture probe on a biochip, and a biochip comprising the linker. The impedance baseline of the linker of the present invention is three orders lower than the conventional long chain thiol linker when adopting in a fadaraic impedance biochip construction. With lower impedance baseline, the device designed to measure the signal of the biochip of the present invention could be further simplied on the electrical circuit design and be made in lower cost, compacter size and get the potential to be used in point-of-care applications. The present invention also provides a method of quantitatively detecting a concentration of a target analyte in a fluid sample by adopting the biochip and the linker of present invention.
    Type: Grant
    Filed: June 16, 2011
    Date of Patent: March 4, 2014
    Assignee: National Taiwan University
    Inventors: Chih-Kung Lee, Adam Shih-Yuan Lee, Ching-Sung Chen, Ku-Ning Chang, Ying-Hua Chen, Bryan Yong-Jay Lee
  • Publication number: 20120067742
    Abstract: The present invention provides a linker for joining an electrode and a capture probe on a biochip, and a biochip comprising the linker. The impedance baseline of the linker of the present invention is three orders lower than the conventional long chain thiol linker when adopting in a fadaraic impedance biochip construction. With lower impedance baseline, the device designed to measure the signal of the biochip of the present invention could be further simplied on the electrical circuit design and be made in lower cost, compacter size and get the potential to be used in point-of-care applications. The present invention also provides a method of quantitatively detecting a concentration of a target analyte in a fluid sample by adopting the biochip and the linker of present invention.
    Type: Application
    Filed: June 16, 2011
    Publication date: March 22, 2012
    Applicant: NATIONAL TAIWAN UNIVERSITY
    Inventors: Chih-Kung Lee, Adam Shih-Yuan Lee, Ching-Sung Chen, Ku-Ning Chang, Ying-Hua Chen, Bryan Yong-Jay Lee