Abstract: In a method of manufacturing a photo mask, a resist layer is formed over a mask blank, which includes a mask substrate, a phase shift layer disposed on the mask substrate and a light blocking layer disposed on the phase shift layer. A resist pattern is formed by using a lithographic operation. The light blocking layer is patterned by using the resist pattern as an etching mask. The phase shift layer is patterned by using the patterned light blocking layer as an etching mask. A border region of the mask substrate is covered with an etching hard cover, while a pattern region of the mask substrate is opened. The patterned light blocking layer in the pattern region is patterned through the opening of the etching hard cover. A photo-etching operation is performed on the pattern region to remove residues of the light blocking layer.

Abstract: A treadmill with a safety monitoring function includes a running unit and a detection unit. The running unit includes a driving roller and a running belt for a runner to stand and run thereon. The detection unit includes a sensor for detecting whether the runner exists at a predefined height on the running belt. The detection unit can be moved to change the predefined height. A safety monitoring function for a treadmill includes adjusting a height of the sensor, detecting whether the runner exists at the predefined height above the running belt, and generating a first monitoring output. Through detecting whether the runner exists at the predefined height, it determines whether the driving roller can be driven by the driving unit to prevent accidental activation by a child. Since the detection unit can be moved to change the predefined height, it allows the use by runners of different body shapes.