Patents by Inventor Kuan-Ting Lin

Kuan-Ting Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10627187
    Abstract: A shooting controller of a paintball gun includes a mechanical shooting apparatus, an electric shooting apparatus, a pneumatic apparatus, and a switching apparatus. Operating the switching apparatus may switch the paintball gun between a mechanical shooting mode and an electric shooting mode. In the mechanical shooting mode, the mechanical shooting apparatus drives the pneumatic apparatus to shoot a paintball when a trigger is pulled. In the electric shooting mode, the electric shooting apparatus drives the pneumatic apparatus to shoot a paintball when a trigger is pulled.
    Type: Grant
    Filed: October 30, 2018
    Date of Patent: April 21, 2020
    Inventor: Kuan Ting Lin
  • Publication number: 20200023028
    Abstract: The present invention is directed to therapeutic methods and compositions for treating non-small cell lung cancer in a subject comprising administering an effective amount of an extract or powder of a herbal mixture, optionally with an anti-cancer agent to said subject. The herbal mixture comprises a component of at least one species from each of the genus Astragalus, Cimicifuga Foetida rhizoma, Ophiopogon radix, Atractylodes lancea rhizoma, Panax ginseng-Red, Atractylodes rhizoma-White, Massa medicata fermentata, Citrus reticulata-Viride, Citrus reticulata, Glycyrrhiza radix, Schisandra fructus, Angelica sinensis radix, Phellodendron cortex, Alisma rhizoma, Pueraria radix, Ziziphus fructus-Red, and Zingiber officinale radix.
    Type: Application
    Filed: June 3, 2016
    Publication date: January 23, 2020
    Inventors: Tse-Hung Huang, Chi-Ying Huang, Hsuan-Min Hsu, Kuan-Ting Lin
  • Patent number: 10434877
    Abstract: A driver-assistance method and a driver-assistance apparatus are provided. In the method, a movement trajectory of wheels in surroundings of a vehicle when the vehicle moves are calculated. Multiple cameras disposed on the vehicle are used to capture images of multiple perspective views surrounding the vehicle, and the images of the perspective views are transformed into images of a top view. A synthetic image surrounding the vehicle is generated according to the images of the perspective views and the top view. Finally, the synthetic image and the movement trajectories are mapped and combined to a 3D model surrounding the vehicle and a movement image including the movement trajectories having a viewing angle from an upper rear side to a lower front side of the vehicle is provided by using the 3D model when backing up the vehicle.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: October 8, 2019
    Assignee: VIA Technologies, Inc.
    Inventors: Min-Chang Wu, Kuan-Ting Lin
  • Patent number: 10239183
    Abstract: A chemical mechanical polishing pad includes a base portion and a polishing portion. The base portion has opposite first and second side surfaces. The polishing portion extends from the first side surface away from the second side surface, has a polishing surface facing away from the base portion, and has at least one trench formed in the polishing surface. Each of the trenches has an opening defined by the polishing surface. A horizontal width of the opening of each of the trenches is equal to or smaller than that of the remaining portion of the trench. The chemical mechanical polishing pad is made by laminating a plurality of polymer layers.
    Type: Grant
    Filed: February 1, 2017
    Date of Patent: March 26, 2019
    Assignee: SLH TECHNOLOGY CO., LTD.
    Inventors: Chien-Hung Sung, Kuan-Ting Lin
  • Publication number: 20190035660
    Abstract: A purging device includes an intake module, an exhausting module, a first purge gas supplying module, a second purge gas supplying module, a control valve and a processing module. The processing module is electrically connected to the control valve, and is operable so as to control the control valve to allow flow of a first purge gas from the first purge gas supplying module into the intake module, while preventing flow of a second purge gas from the second purge gas supplying module into the intake module, or allow flow of the second purge gas from the second purge gas supplying module into the intake module, while preventing flow of the first purge gas from the first purge gas supplying module into the intake module.
    Type: Application
    Filed: June 4, 2018
    Publication date: January 31, 2019
    Inventors: Kuan-Ting LIN, Wang-Chang WANG
  • Patent number: 9992481
    Abstract: A method and an apparatus for processing surrounding images of a vehicle are provided. In the method, plural cameras disposed on the vehicle are used to capture images of plural perspective views surrounding the vehicle. The images of the perspective views are transformed into images of a top view. An interval consisted of at least a preset number of consecutive empty pixels is found from one column of pixels in each image of the top view, and the images of the perspective views and the top view are divided into floor side images and wall side images according to the height of the interval in the image. The divided floor side images and wall side images are stitched to generate a synthetic image surrounding the vehicle.
    Type: Grant
    Filed: July 19, 2016
    Date of Patent: June 5, 2018
    Assignee: VIA Technologies, Inc.
    Inventors: Kuan-Ting Lin, Yi-Jheng Wu
  • Publication number: 20180043499
    Abstract: A chemical mechanical polishing pad includes a base portion and a polishing portion. The base portion has opposite first and second side surfaces. The polishing portion extends from the first side surface away from the second side surface, has a polishing surface facing away from the base portion, and has at least one trench formed in the polishing surface. Each of the trenches has an opening defined by the polishing surface. A horizontal width of the opening of each of the trenches is equal to or smaller than that of the remaining portion of the trench. The chemical mechanical polishing pad is made by laminating a plurality of polymer layers.
    Type: Application
    Filed: February 1, 2017
    Publication date: February 15, 2018
    Inventors: Chien-Hung SUNG, Kuan-Ting LIN
  • Publication number: 20170324948
    Abstract: A method and an apparatus for processing surrounding images of a vehicle are provided. In the method, plural cameras disposed on the vehicle are used to capture images of plural perspective views surrounding the vehicle. The images of the perspective views are transformed into images of a top view. An interval consisted of at least a preset number of consecutive empty pixels is found from one column of pixels in each image of the top view, and the images of the perspective views and the top view are divided into floor side images and wall side images according to the height of the interval in the image. The divided floor side images and wall side images are stitched to generate a synthetic image surrounding the vehicle.
    Type: Application
    Filed: July 19, 2016
    Publication date: November 9, 2017
    Inventors: Kuan-Ting Lin, Yi-Jheng Wu
  • Publication number: 20170324943
    Abstract: A driver-assistance method and a driver-assistance apparatus are provided. In the method, a movement trajectory of wheels in surroundings of a vehicle when the vehicle moves are calculated. Multiple cameras disposed on the vehicle are used to capture images of multiple perspective views surrounding the vehicle, and the images of the perspective views are transformed into images of a top view. A synthetic image surrounding the vehicle is generated according to the images of the perspective views and the top view. Finally, the synthetic image and the movement trajectories are mapped and combined to a 3D model surrounding the vehicle and a movement image including the movement trajectories having a viewing angle from an upper rear side to a lower front side of the vehicle is provided by using the 3D model when backing up the vehicle.
    Type: Application
    Filed: April 24, 2017
    Publication date: November 9, 2017
    Applicant: VIA Technologies, Inc.
    Inventors: Min-Chang Wu, Kuan-Ting Lin
  • Publication number: 20110148526
    Abstract: The present invention relates a low noise amplifier with adaptive frequency responses and method of altering frequency responses thereof. The low noise amplifier comprises an inductive degeneration circuit, N cascode circuits and N switches. The inductive degeneration circuit has an input impedance and a frequency response characteristic. Each of the cascode circuits is connected in parallel to the inductive degeneration circuit. Each of the switches is connected to a corresponding cascode circuit respectively. Each of the cascode circuit is turned ON or OFF by enabling or disabling the corresponding switches to alter the frequency response characteristic.
    Type: Application
    Filed: June 30, 2010
    Publication date: June 23, 2011
    Applicant: National Taiwan University
    Inventors: Shey-Shi Lu, Yu-Hsiang Wang, Kuan-Ting Lin
  • Publication number: 20110068283
    Abstract: The invention provides electromagnetic wave absorption components and device. The electromagnetic wave absorption component includes an electromagnetic shield constituted by at least one material selected from the group consisting of a carbon nanocoil and a carbon fiber, and a solidified layer formed of a mixture of a solidifiable material and the electromagnetic shield after solidification. Another embodiment of the electromagnetic wave absorption component includes an electromagnetic shield constituted by at least one material selected from the group consisting of a carbon nanocoil and a carbon fiber, and a solidified layer, formed by solidifying a solidifiable material, applicable to encapsulating the electromagnetic shield. Further, the electromagnetic wave absorption device is formed by stacking at least two of the above-mentioned electromagnetic wave absorption components.
    Type: Application
    Filed: January 28, 2010
    Publication date: March 24, 2011
    Applicant: NATIONAL TAIWAN UNIVERSITY
    Inventors: Shey-Shi Lu, Ying-Jay Yang, Shuo-Hung Chang, Jian-Yu Hsieh, Kuan-Ting Lin, Tao Wang, Chih-Chung Su, Cheng-Hung Li, Neng-Kai Chang
  • Patent number: 6596576
    Abstract: A method of fabricating a semiconductor device having a gate structure comprising SiO2 and Si3N4 that exhibits reduced hydrogen diffusion during low temperature chemical vapor deposition of silicon nitride. In the method, a silicon dioxide (SiO2) layer is deposited on a wafer after a gate structure is fabricated. A barrier layer is formed on the silicon dioxide (SiO2) layer. Then a silicon nitride layer is formed over it by low temperature chemical vapor deposition. The barrier layer reduces, and may even altogether prevent, diffusion of the hydrogen absorbed by the silicon nitride layer into the gate oxide and channel during the low temperature chemical vapor deposition of silicon nitride.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: July 22, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Tzy-Tzan Fu, Kuan-Ting Lin, Chao-Sheng Chou
  • Patent number: 6566183
    Abstract: The invention provides a method of making a transistor. A gate dielectric layer is formed on a semiconductor substrate. A gate is formed on the dielectric layer, the gate having an exposed upper surface and exposed side surfaces. A first silicon nitride layer having a first thickness is deposited over the gate, for example over an oxide layer on the gate, at a first deposition rate. A second silicon nitride layer having a second thickness is deposited over the first silicon nitride layer at a second deposition rate, the second thickness being more that the first thickness and the second deposition rate being more than the first deposition rate. The first silicon nitrogen layer then has a lower hydrogen concentration. At least the second silicon nitride layer (or a silicon oxide layer in the case of an ONO spacer) is etched to leave spacers next to the side surfaces while exposing the upper surface of the gate and areas of the substrate outside the spacers.
    Type: Grant
    Filed: December 12, 2001
    Date of Patent: May 20, 2003
    Inventors: Steven A. Chen, Lee Luo, Kegang Huang, Tzy-Tzan Fu, Kuan-Ting Lin, Hung-Chuan Chen
  • Publication number: 20030045081
    Abstract: A stacked silicon gate structure for a MOSFET may be formed in a CVD chamber. The stacked structure includes a first polycrystalline silicon layer, a microcrystalline layer, and second polycrystalline silicon layer. The microcrystalline layer has a randomly orientated crystal structure with a smaller average crystal grain size than the first and second polycrystalline silicon layers. The microcrystalline layer is capable of maintaining its original crystal structure even while undergoing high temperature process substantially without further recrystallization. This allows the microcrystalline layer to suppress migration of dopants in the second polycrystalline silicon layer into the first polycrystalline silicon layer and thereby prevent a shift in the threshold voltage that would otherwise result from such dopant penetration.
    Type: Application
    Filed: June 25, 2002
    Publication date: March 6, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Kuan-Ting Lin, Shih-Che Lin
  • Publication number: 20020146879
    Abstract: A method of fabricating a semiconductor device having a gate structure comprising SiO2 and Si3N4 that exhibits reduced hydrogen diffusion during low temperature chemical vapor deposition of silicon nitride. In the method, a silicon dioxide (SiO2) layer is deposited on a wafer after a gate structure is fabricated. A barrier layer is formed on the silicon dioxide (SiO2) layer. Then a silicon nitride layer is formed over it by low temperature chemical vapor deposition. The barrier layer reduces, and may even altogether prevent, diffusion of the hydrogen absorbed by the silicon nitride layer into the gate oxide and channel during the low temperature chemical vapor deposition of silicon nitride.
    Type: Application
    Filed: December 21, 2001
    Publication date: October 10, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Tzy-Tzan Fu, Kuan-Ting Lin, Chao-Sheng Chou
  • Publication number: 20010006364
    Abstract: The invention discloses the design of a low profile transformer, which is smaller in size and lighter in weight. The low profile transformer will meet the isolation safety standard and is manufactured with low cost. Furthermore, a variety of cores could be applied to the low profile transformer for a wide range of electrical current loading.
    Type: Application
    Filed: December 7, 2000
    Publication date: July 5, 2001
    Inventors: Kuan-Ting Lin, Yeh Ming, Heng-Cheng Chou, Ren-Jye Huang, Hui-Hua Teng, Jau-Jen Du, Chien-Chia Lin