Abstract: A MOS capacitor includes a substrate having a capacitor forming region thereon, an ion well having a first conductivity type in the substrate, a counter doping region having a second conductivity type in the ion well within the capacitor forming region, a capacitor dielectric layer on the ion well within the capacitor forming region, a gate electrode on the capacitor dielectric layer, a source doping region having the second conductivity type on a first side of the gate electrode within the capacitor forming region, and a drain doping region having the second conductivity type on a second side of the gate electrode within the capacitor forming region.

Abstract: A memory device includes: an interconnect structure, a staircase structure, a dielectric layer and a stop structure. The interconnect structure is located above a substrate. The staircase structure is located above the interconnect structure. The dielectric layer is located above the interconnect structure and covers the staircase structure. The stop structure is located between the interconnect structure and the staircase structure, and between the interconnect structure and the dielectric layer, and the stop structure has an opening exposing the interconnect structure. The first contact extends through the dielectric layer and the opening, and is connected to the interconnect of the interconnect structure. The middle width of the opening is not equal to the top width of the opening, or the middle width of the opening is not equal to the bottom width of the opening. The memory device may be 3D NAND flash memory with high capacity and high performance.

Abstract: An air guide module includes a casing and a first flexible air guide structure. The casing includes a first fixing portion. The first flexible air guide structure includes a first flexible cover and a second fixing portion connected to the first flexible cover. The first flexible air guide structure is fixed to the first fixing portion of the casing through the second fixing portion. The first flexible cover and a part of the casing form a heat dissipation channel. The first flexible cover is deflected relative to the casing when an airflow passes through the heat dissipation channel.

Abstract: A MOS capacitor includes a substrate having a capacitor forming region thereon, an ion well having a first conductivity type in the substrate, a counter doping region having a second conductivity type in the ion well within the capacitor forming region, a capacitor dielectric layer on the ion well within the capacitor forming region, a gate electrode on the capacitor dielectric layer, a source doping region having the second conductivity type on a first side of the gate electrode within the capacitor forming region, and a drain doping region having the second conductivity type on a second side of the gate electrode within the capacitor forming region.

Abstract: A MOS capacitor includes a substrate having a capacitor forming region thereon, an ion well having a first conductivity type in the substrate, a counter doping region having a second conductivity type in the ion well within the capacitor forming region, a capacitor dielectric layer on the ion well within the capacitor forming region, a gate electrode on the capacitor dielectric layer, a source doping region having the second conductivity type on a first side of the gate electrode within the capacitor forming region, and a drain doping region having the second conductivity type on a second side of the gate electrode within the capacitor forming region.