Abstract: The present disclosure provides an extreme ultraviolet (EUV) lithography system including a radiation source and an EUV control system integrated with the radiation source. The EUV control system includes a 3-dimensional diagnostic module (3DDM) designed to collect a laser beam profile of a laser beam from the radiation source in a 3-dimensional (3D) mode, an analysis module designed to analyze the laser beam profile, a database designed to store the laser beam profile, and an EUV control module designed to adjust the radiation source. The analysis module is coupled with the database and the EUV control module. The database is coupled with the 3DDM and the analysis module. The EUV control module is coupled with the analysis module and the radiation source.

Abstract: A method for improving combustion efficiency as combusting a pure substance is disclosed. The method is started from deciding an environmental temperature of a combustion environment, setting a first temperature higher than the environmental temperature, and uniformly heating the pure substance to the first temperature so as to shorten the temperature drop between the outer surface and the inner portion of the pure substance as far as possible. Simultaneously, after a combustion-supporting gas is provided and heated to a second temperature and the combustion-supporting gas is supplied to the combustion environment, the pure substance is ignited. The steps described above can accelerate the temperature raising as combusting the pure substance, so as to be more close to complete combustion, thereby improving efficiency and reducing contaminant production.