Patents by Inventor Kuang Hsiung CHENG

Kuang Hsiung CHENG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ultraviolet light emitting diode array light source for photolithography and method
    Patent number: 9128387
    Abstract: A light source includes a plurality of ultraviolet (UV) light emitting diodes (LEDs) and an LED phase shift controller coupled to the plurality of UV LEDs adapted to control the phase shift of each UV LED in the plurality of UV LEDs. The plurality of UV LEDs forms a UV LED array. An ultraviolet lithography system can include a light source as described above. The system can further include a mirror assembly in a light path of the light source, the mirror assembly having a polarization mirror with an interference coating. A method provides a light source for an ultraviolet lithography system including the element of providing an plurality of UV LEDs that emit UV light and the element of controlling a phase shift of the plurality of UV LEDs with an LED phase shift controller coupled to each UV LED or arrays of the UV LEDs in the plurality of UV LEDs.
    Type: Grant
    Filed: May 14, 2013
    Date of Patent: September 8, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jaw-Lih Shih, Hong-Hsing Chou, Yeh-Chieh Wang, Hsin-Kuo Chang, Chung-Nan Chen, Kuang Hsiung Cheng
  • ULTRAVIOLET LIGHT EMITTING DIODE ARRAY LIGHT SOURCE FOR PHOTOLITHOGRAPHY AND METHOD
    Publication number: 20140340665
    Abstract: A light source includes a plurality of ultraviolet (UV) light emitting diodes (LEDs) and an LED phase shift controller coupled to the plurality of UV LEDs adapted to control the phase shift of each UV LED in the plurality of UV LEDs. The plurality of UV LEDs forms a UV LED array. An ultraviolet lithography system can include a light source as described above. The system can further include a mirror assembly in a light path of the light source, the mirror assembly having a polarization mirror with an interference coating. A method provides a light source for an ultraviolet lithography system including the element of providing an plurality of UV LEDs that emit UV light and the element of controlling a phase shift of the plurality of UV LEDs with an LED phase shift controller coupled to each UV LED or arrays of the UV LEDs in the plurality of UV LEDs.
    Type: Application
    Filed: May 14, 2013
    Publication date: November 20, 2014
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Jaw-Lih SHIH, Hong-Hsing CHOU, Yeh-Chieh WANG, Hsin-Kuo CHANG, Chung-Nan CHEN, Kuang Hsiung CHENG