Patents by Inventor Kuang-Hao Lay

Kuang-Hao Lay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Interpolation of irregular data in a finite-dimensional metric space in lithographic simulation
    Patent number: 8358828
    Abstract: A method, system, and computer program product for preprocessing a pattern in a library of patterns and querying a preprocessed library of patterns are disclosed. Embodiments for querying a preprocessed library of patterns are disclosed for determining a distance between the representation for the first pattern and the representation for the second pattern, determining whether the distance between the representation for the first pattern and the representation for the second pattern is within the range for the first pattern, and transforming the second pattern with the transformation matrix to provide information about the second pattern.
    Type: Grant
    Filed: December 28, 2007
    Date of Patent: January 22, 2013
    Assignee: Cadence Design Systems, Inc.
    Inventors: Srini Doddi, Junjiang Lei, Kuang-Hao Lay, Weiping Fang
  • Intelligent pattern signature based on lithography effects
    Patent number: 8291351
    Abstract: The present invention is directed to an improved method, system, and computer program product for accessing and analyzing patterns in the integrated circuit design. The method, system or computer program product includes generating an intelligent signature for a pattern. The derived pattern signature is an intelligent pattern identifier because it retains only essential information about a pattern that corresponds to lithography printable portions of the pattern. Accordingly, one pattern signature can represent a group of design patterns that are equivalents from a lithography perspective.
    Type: Grant
    Filed: June 1, 2011
    Date of Patent: October 16, 2012
    Assignee: Cadence Design Systems, Inc.
    Inventors: Junjiang Lei, Kuang-Hao Lay, Srini Doddi, Weiping Fang
  • INTELLIGENT PATTERN SIGNATURE BASED ON LITHOGRAPHY EFFECTS
    Publication number: 20110239168
    Abstract: The present invention is directed to an improved method, system, and computer program product for accessing and analyzing patterns in the integrated circuit design. The method, system or computer program product includes generating an intelligent signature for a pattern. The derived pattern signature is an intelligent pattern identifier because it retains only essential information about a pattern that corresponds to lithography printable portions of the pattern. Accordingly, one pattern signature can represent a group of design patterns that are equivalents from a lithography perspective.
    Type: Application
    Filed: June 1, 2011
    Publication date: September 29, 2011
    Applicant: CADENCE DESIGN SYSTEMS, INC.
    Inventors: Junjiang Lei, Kuang-Hao Lay, Srini Doddi, Weiping Fang
  • Intelligent pattern signature based on lithography effects
    Patent number: 7966586
    Abstract: The present invention is directed to an improved method, system, and computer program product for accessing and analyzing patterns in the integrated circuit design. The method, system or computer program product includes generating an intelligent signature for a pattern. The derived pattern signature is an intelligent pattern identifier because it retains only essential information about a pattern that corresponds to lithography printable portions of the pattern. Accordingly, one pattern signature can represent a group of design patterns that are equivalents from a lithography perspective.
    Type: Grant
    Filed: December 7, 2007
    Date of Patent: June 21, 2011
    Assignee: Cadence Design Systems, Inc.
    Inventors: Junjiang Lei, Kuang-Hao Lay, Srini Doddi, Weiping Fang
  • INTERPOLATION OF IRREGULAR DATA IN A FINITE-DIMENSIONAL METRIC SPACE IN LITHOGRAPHIC SIMULATION
    Publication number: 20090169114
    Abstract: A method, system, and computer program product for preprocessing a pattern in a library of patterns and querying a preprocessed library of patterns are disclosed. Embodiments for querying a preprocessed library of patterns are disclosed for determining a distance between the representation for the first pattern and the representation for the second pattern, determining whether the distance between the representation for the first pattern and the representation for the second pattern is within the range for the first pattern, and transforming the second pattern with the transformation matrix to provide information about the second pattern.
    Type: Application
    Filed: December 28, 2007
    Publication date: July 2, 2009
    Applicant: CADENCE DESIGN SYSTEMS, INC.
    Inventors: Srini Doddi, Junjiang Lei, Kuang-Hao Lay, Weiping Fang
  • Intelligent Pattern Signature Based on Lithography Effects
    Publication number: 20090150836
    Abstract: The present invention is directed to an improved method, system, and computer program product for accessing and analyzing patterns in the integrated circuit design. The method, system or computer program product includes generating an intelligent signature for a pattern. The derived pattern signature is an intelligent pattern identifier because it retains only essential information about a pattern that corresponds to lithography printable portions of the pattern. Accordingly, one pattern signature can represent a group of design patterns that are equivalents from a lithography perspective.
    Type: Application
    Filed: December 7, 2007
    Publication date: June 11, 2009
    Applicant: CADENCE DESIGN SYSTEMS, INC.
    Inventors: Junjiang Lei, Kuang-Hao Lay, Srini Doddi, Weiping Fang