Abstract: A mask for manufacturing integrated circuits and use of the mask. The mask has a mask substrate. The mask also has an active mask region within a first portion of the mask substrate. The active region is adapted to accumulate a pre-determined level of static electricity. The mask also has a first guard ring structure surrounding a portion of the active mask region to isolate the active region from an outer region of the mask substrate and a second guard ring structure having at least one fuse structure surrounding a portion of the first guard ring structure. The fuse structure is operably coupled to the active region to absorb a current from static electricity. The static electricity is accumulated by the active region to the pre-determined level and being discharged as current to the fuse structure while maintaining the active region free from damage from the static electricity.

Abstract: A method and system for making a photographic mask. The method includes determining a first contact area, processing information associated with the first contact area, and determining whether a first optical compensation should be applied to the first contact area based on at least information associated with the first contact area. Additionally, the method includes if the first optical compensation should be applied to the first contact area, applying the first optical compensation to the first contact area, processing information associated with first optical compensation, determining a first distance between the first optical compensation and a second optical compensation or a second contact area, processing information associated with the first distance, and adjusting the first optical compensation based on at least information associated with the first distance.

Abstract: A method and system for making a photographic mask. The method includes determining a first contact area, processing information associated with the first contact area, and determining whether a first optical compensation should be applied to the first contact area based on at least information associated with the first contact area. Additionally, the method includes if the first optical compensation should be applied to the first contact area, applying the first optical compensation to the first contact area, processing information associated with first optical compensation, determining a first distance between the first optical compensation and a second optical compensation or a second contact area, processing information associated with the first distance, and adjusting the first optical compensation based on at least information associated with the first distance.

Abstract: A mask for manufacturing integrated circuits and use of the mask. The mask has a mask substrate. The mask also has an active mask region within a first portion of the mask substrate. The active region is adapted to accumulate a pre-determined level of static electricity. The mask also has a first guard ring structure surrounding a portion of the active mask region to isolate the active region from an outer region of the mask substrate and a second guard ring structure having at least one fuse structure surrounding a portion of the first guard ring structure. The fuse structure is operably coupled to the active region to absorb a current from static electricity. The static electricity is accumulated by the active region to the pre-determined level and being discharged as current to the fuse structure while maintaining the active region free from damage from the static electricity.

Abstract: A mask for manufacturing integrated circuits and use of the mask. The mask has a mask substrate. The mask also has an active mask region within a first portion of the mask substrate. The active region is adapted to accumulate a pre-determined level of static electricity. The mask also has a first guard ring structure surrounding a portion of the active mask region to isolate the active region from an outer region of the mask substrate and a second guard ring structure having at least one fuse structure surrounding a portion of the first guard ring structure. The fuse structure is operably coupled to the active region to absorb a current from static electricity. The static electricity is accumulated by the active region to the pre-determined level and being discharged as current to the fuse structure while maintaining the active region free from damage from the static electricity.

Abstract: A mask for manufacturing integrated circuits and use of the mask. The mask has a mask substrate. The mask also has an active mask region within a first portion of the mask substrate. The active region is adapted to accumulate a pre-determined level of static electricity. The mask also has a first guard ring structure surrounding a portion of the active mask region to isolate the active region from an outer region of the mask substrate and a second guard ring structure having at least one fuse structure surrounding a portion of the first guard ring structure. The fuse structure is operably coupled to the active region to absorb a current from static electricity. The static electricity is accumulated by the active region to the pre-determined level and being discharged as current to the fuse structure while maintaining the active region free from damage from the static electricity.