Abstract: In an embodiment, a system includes: a base; and a rod set comprising multiple rods connected to the base, wherein each rod of the rod set comprises multiple fingers disposed in a vertically-stacked relationship to each other and separated respectively from each other by respective slots, wherein each slot is configured to receive a bevel of a wafer, and wherein each of the multiple fingers comprises a rounded end at a furthest extension.

Abstract: In an embodiment, a system includes: a base; and a rod set comprising multiple rods connected to the base, wherein each rod of the rod set comprises multiple fingers disposed in a vertically-stacked relationship to each other and separated respectively from each other by respective slots, wherein each slot is configured to receive a bevel of a wafer, and wherein each of the multiple fingers comprises a rounded end at a furthest extension.

Abstract: In an embodiment, a system includes: a base; and a rod set comprising multiple rods connected to the base, wherein each rod of the rod set comprises multiple fingers disposed in a vertically-stacked relationship to each other and separated respectively from each other by respective slots, wherein each slot is configured to receive a bevel of a wafer, and wherein each of the multiple fingers comprises a rounded end at a furthest extension.

Abstract: In an embodiment, a system includes: a base; and a rod set comprising multiple rods connected to the base, wherein each rod of the rod set comprises multiple fingers disposed in a vertically-stacked relationship to each other and separated respectively from each other by respective slots, wherein each slot is configured to receive a bevel of a wafer, and wherein each of the multiple fingers comprises a rounded end at a furthest extension.

Abstract: A furnace for processing semiconductor wafers is provided. The furnace includes a tube having a closed upper end, an open lower end, and a sidewall connecting the upper end and the lower end. The furnace further includes a sealing lid removably connected to the lower end of the tube to define a reaction chamber. The furnace also includes an insulation cap connected to the sealing lid and positioned in the reaction chamber, and an opening is formed on a top surface of the insulation cap. In addition, the furnace includes a block member covering the opening and a wafer boat positioned on the top surface of the insulation cap.

Abstract: A furnace for processing semiconductor wafer is provided. The furnace includes a tube having a closed upper end, an open lower end, and a sidewall connecting the upper end and the lower end. The furnace further includes a sealing lid removably connected to the lower end of the tube to define a reaction chamber. The furnace also includes an insulation cap connected to the sealing lid and positioned in the reaction chamber, and an opening is formed on a top surface of the insulation cap. In addition, the furnace includes a block member covering the opening and a wafer boat positioned on the top surface of the insulation cap.