Abstract: A system and method for detecting an invalid winding path in a layout design file includes generating a first reticle pattern file using a first path generation program, generating a second reticle pattern file using a second path generation program, comparing the first and second reticle patterns files to detect the invalid winding path. The invalid winding path includes one or more overlapping polygons.

Abstract: A system and method for detecting one or more winding paths for patterns on a reticle for the manufacture of semiconductor integrated circuits. A method for detecting invalid winding path in a layout design. The method includes the step of obtaining a first winding path parameter and a second winding path parameter. The method includes defining a first plurality of reticle patterns in accordance with the first winding path parameter and the second winding path parameter. The first winding path parameter has a first value. The first plurality of reticle patterns is associated with the least one winding path. The method additionally includes defining a second plurality of reticle patterns in accordance with the second winding path parameter and the second winding path parameter. The first winding path parameter has a second value. The second plurality of reticle patterns is associated with the at least one winding path.