Patents by Inventor Kuei-Ming TSAI

Kuei-Ming TSAI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240170326
    Abstract: A manufacturing method of a semiconductor device includes at least the following steps. A sacrificial substrate is provided. An etch stop layer is formed on the sacrificial substrate. A portion of the etch stop layer is oxidized to form an oxide layer between the sacrificial substrate and the remaining etch stop layer. A capping layer is formed on the remaining etch stop layer. A device layer is formed on the capping layer. A first etching process is performed to remove the sacrificial substrate. A second etching process is performed to remove the oxide layer. A third etching process is performed to remove the remaining etch stop layer. A power rail is formed on the capping layer opposite to the device layer.
    Type: Application
    Filed: January 25, 2024
    Publication date: May 23, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chi-Ming Chen, Kuei-Ming Chen, Po-Chun Liu, Chung-Yi Yu, Chia-Shiung Tsai
  • Patent number: 11923237
    Abstract: A manufacturing method of a semiconductor device includes at least the following steps. A sacrificial substrate is provided. An epitaxial layer is formed on the sacrificial substrate. An etch stop layer is formed on the epitaxial layer. Carbon atoms are implanted into the etch stop layer. A capping layer and a device layer are formed on the etch stop layer. A handle substrate is bonded to the device layer. The sacrificial substrate, the epitaxial layer, and the etch stop layer having the carbon atoms are removed from the handle substrate.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: March 5, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chi-Ming Chen, Kuei-Ming Chen, Po-Chun Liu, Chung-Yi Yu, Chia-Shiung Tsai
  • Patent number: 10334673
    Abstract: A lighting system includes: at least one lamp each including an LED unit; and a power converting device disposed outside of each lamp, and including a first EMI filter, a power converter and a second EMI filter. The first EMI filter is for receiving an AC input voltage from an AC power source, and filters the AC input voltage to generate a filtered voltage. The power converter is for receiving the filtered voltage from the first EMI filter, and performs AC to DC conversion on the filtered voltage to generate a converted voltage. The second EMI filter is for receiving the converted voltage from the power converter, and filters the converted voltage to generate a DC output voltage for receipt by the LED unit of each lamp.
    Type: Grant
    Filed: July 23, 2018
    Date of Patent: June 25, 2019
    Assignee: DA LIANG TECHNIQUE INDUSTRY LIMITED COMPANY
    Inventor: Kuei-Ming Tsai
  • Publication number: 20190037656
    Abstract: A lighting system includes: at least one lamp each including an LED unit; and a power converting device disposed outside of each lamp, and including a first EMI filter, a power converter and a second EMI filter. The first EMI filter is for receiving an AC input voltage from an AC power source, and filters the AC input voltage to generate a filtered voltage. The power converter is for receiving the filtered voltage from the first EMI filter, and performs AC to DC conversion on the filtered voltage to generate a converted voltage. The second EMI filter is for receiving the converted voltage from the power converter, and filters the converted voltage to generate a DC output voltage for receipt by the LED unit of each lamp.
    Type: Application
    Filed: July 23, 2018
    Publication date: January 31, 2019
    Inventor: Kuei-Ming TSAI