Patents by Inventor Kuen-Cherng Lin

Kuen-Cherng Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7853102
    Abstract: The present invention discloses a method for fabricating polymer wavelength filter with high-resolution periodical structure, which comprises: a positive photo-resister film is coated or a substrate, holographically exposed with grating pattern, and coated with a negative photo-resister film, then exposed by UV light and developed to obtain a waveguide mold having negative waveguide; a PDMS film coated on the waveguide mold, baked and peeled off to obtain a PDMS mold; a first tunnel formed over the PDMS mold, injected with a first UV polymer, then cured and separated the first UV polymer having groove to be the cladding layer of the polymer wavelength filter; a second UV polymer injected into the groove of the cladding layer, and cured to form the core of the waveguide in the groove of the cladding layer to finally be the polymer wavelength filter.
    Type: Grant
    Filed: November 27, 2007
    Date of Patent: December 14, 2010
    Assignee: China Institute of Technology
    Inventors: Kun-Yi Lee, Wei-Ching Chuang, Kuen-Cherng Lin, Cheng-Che Lee, Wei-Yu Lee
  • Publication number: 20090136180
    Abstract: The present invention discloses a method for fabricating polymer wavelength filter with high-resolution periodical structure, which comprises following steps: (a) a positive photo-resister film is coated on a substrate; (b) a grating pattern is holographically exposed on the positive photo-resister film; (c) the photo-resister film is coated with a negative photo-resister film; (d) the sample is exposed by UV light; (e) develops the sample to obtain a negative waveguide on the photo-resister film having gratings pattern on its bottom to be a waveguide mold; (f) coats a diluted PDMS film on the patterned waveguide mold; (g) bakes the PDMS film to be cured, and peels off from the waveguide mold to be a PDMS mold; (h) places a spacer between the PDMS mold and a thin glass slide to form a first tunnel; (i) injects a precure first UV polymer into the first tunnel; (j) cures the first UV polymer under a broadband UV light; (k) separates the first UV polymer when fully cured, a hardened first UV polymer is formed ha
    Type: Application
    Filed: November 27, 2007
    Publication date: May 28, 2009
    Applicant: CHINA INSTITUTE OF TECHNOLOGY
    Inventors: Kun-Yi Lee, Wei-Ching Chuang, Kuen-Cherng Lin, Cheng-Che Lee, Wei-Yu Lee