Abstract: The present application discloses an apparatus for pulsed laser deposition and method. The device includes a laser scanning sputtering component comprising: a base; an adjustment device located on the base; multiple second supports located on the adjustment device and extending in the third direction; a first support located on the multiple second supports. The adjustment device adjusts the second supports and the first support to move in the first direction and/or the second direction, the first direction, the second direction, and the third direction being mutually perpendicular. The apparatus for pulsed laser deposition and method provided by the present disclosure enable precise control of the irradiation time of the laser beam on the target material surface through the laser scanning sputtering component, thereby not only improving the rate for depositing a film but also enhancing the performance of a single-component film and a combinatorial film.

Abstract: A game control method is provided. The method comprises: acquiring the distance between a game character and a shielding face, and an included angle between the orientation of the game character and a vertical line of the shielding face; displaying a bunker-entering control on a graphical user interface when the distance is smaller than or equal to a first preset distance and the included angle is smaller than or equal to a preset included angle; and in response to a selection operation for the bunker-entering control, controlling the game character to move to a shielding area corresponding to the shielding face, such that a bunker shields the game character.

Abstract: A filament (18) for an ion implanter ion source or plasma shower is provided comprising first and second legs (20a, 20b) and a thermally emissive central portion (40) having ends connected, respectively, to the first and second legs. Preferably, the legs (20a, 20b) are constructed from tantalum (Ta), and the thermally emissive portion (40) is constructed of tungsten (W). The thermally emissive portion is coiled substantially along the entire length thereof and formed in the shape of a generally closed loop, such as a toroid. The toroid is comprised of two toroid halves (40a, 40b) coiled in opposite directions. The toroid halves are constructed of a plurality of filament strands (42, 44, 46) twisted together along substantially the entire length thereof. The coils of the toroid are capable of establishing closed loop magnetic field lines (B) therein when electrical current flows through the thermally emissive portion.