Abstract: Provided is a convenient display device including: a display unit capable of projecting a projection image on a domain in accordance with a position of a user; and a judgment unit that judges whether the projection image can be projected on the domain.

Abstract: Provided is a convenient display device including: a display unit capable of projecting a projection image on a domain in accordance with a position of a user; and a judgment unit that judges whether the projection image can be projected on the domain.

Abstract: Provided is a convenient display device including: a display unit capable of projecting a projection image on a domain in accordance with a position of a user; and a judgment unit that judges whether the projection image can be projected on the domain.

Abstract: Provided is a convenient display device including: a display unit capable of projecting a projection image on a domain in accordance with a position of a user; and a judgment unit that judges whether the projection image can be projected on the domain.

Abstract: Provided is a convenient display device including: a display unit capable of projecting a projection image on a domain in accordance with a position of a user; and a judgment unit that judges whether the projection image can be projected on the domain.

Abstract: Provided is a convenient display device including: a display unit capable of projecting a projection image on a domain in accordance with a position of a user; and a judgment unit that judges whether the projection image can be projected on the domain.

Abstract: A projection optical system and exposure method for forming a reduced image of a first surface on a second surface, including forming a projection exposure of a reduced image of a pattern formed on a mask on a photosensitive substrate, the optical path between the projection optical system and the second surface being filled with a medium having a refractive index larger than 1.1 where a refractive index of an atmosphere in the optical path of the projection optical system is 1, and the magnification of the projection optical system being not more than ?. In variations, the projection optical system is substantially telecentric on both the first surface side and the second surface side; every optical member having a power in the projection optical system is a transmitting optical member; and a projection exposure in a one shot-area can include a plurality of partial exposures in partial exposure regions.

Abstract: An exposure apparatus uses a dioptric projection optical system easy to manufacture and a mask of an ordinary size, and is able to effect a projection exposure in a high resolution with high throughput, while securing a large effective image-side numerical aperture through the intervention of a high-refractive-index medium in an optical path between the projection optical system and a photosensitive substrate. The exposure apparatus is configured to effect a projection exposure of a reduced image of a pattern formed on the mask (R), through the projection optical system (PL) onto the photosensitive substrate (W). Where a refractive index of an atmosphere in an optical path of the projection optical system is 1, the optical path between the projection optical system and the photosensitive substrate is filled with a medium having the refractive index larger than 1.1.