Patents by Inventor Kumiko Shimizu
Kumiko Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11798780Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: GrantFiled: December 28, 2021Date of Patent: October 24, 2023Assignee: Hitachi High-Tech CorporationInventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
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Publication number: 20220122804Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: ApplicationFiled: December 28, 2021Publication date: April 21, 2022Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO, Shahedul HOQUE, Kumiko SHIMIZU, Hiroyuki TAKAHASHI
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Patent number: 11239052Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: GrantFiled: June 12, 2020Date of Patent: February 1, 2022Assignee: Hitachi High-Tech CorporationInventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
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Patent number: 10984980Abstract: The objective of the present invention is to provide a charged particle beam device for setting, from an image of a trench-like groove or a pit, device conditions for finding a hole or the like provided in the trench or the pit, or measuring a hole or the like provided inside the trench or the like with high accuracy. In the present invention, a charged particle beam device comprises: a deflector for causing a charged particle beam emitted from a charged particle source to perform a scan; a detector for detecting a charged particle obtained on the basis of the scanning of the charged particle beam; and a computation processing device for generating an image on the basis of the output of the detector.Type: GrantFiled: January 29, 2016Date of Patent: April 20, 2021Assignee: Hitachi High-Tech CorporationInventors: Kei Sakai, Satoru Yamaguchi, Hideki Itai, Yasunori Takasugi, Kumiko Shimizu
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Patent number: 10984981Abstract: A charged particle beam device is provided which minimizes the beam irradiation amount while maintaining a high measurement success rate. The charged particle beam device includes a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m?1), the number m of frames being smaller than the number n of frames.Type: GrantFiled: August 31, 2018Date of Patent: April 20, 2021Assignee: Hitachi High-Tech CorporationInventors: Hideki Itai, Kumiko Shimizu, Wataru Mori, Hajime Kawano, Shahedul Hoque
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Publication number: 20200312615Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: ApplicationFiled: June 12, 2020Publication date: October 1, 2020Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO, Shahedul HOQUE, Kumiko SHIMIZU, Hiroyuki TAKAHASHI
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Patent number: 10720306Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: GrantFiled: February 14, 2019Date of Patent: July 21, 2020Assignee: Hitachi High-Tech CorporationInventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
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Publication number: 20190180979Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: ApplicationFiled: February 14, 2019Publication date: June 13, 2019Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO, Shahedul HOQUE, Kumiko SHIMIZU, Hiroyuki TAKAHASHI
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Patent number: 10249474Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: GrantFiled: June 9, 2017Date of Patent: April 2, 2019Assignee: Hitachi High-Technologies CorporationInventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
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Publication number: 20190035600Abstract: The objective of the present invention is to provide a charged particle beam device for setting, from an image of a trench-like groove or a pit, device conditions for finding a hole or the like provided in the trench or the pit, or measuring a hole or the like provided inside the trench or the like with high accuracy. In the present invention, a charged particle beam device comprises: a deflector for causing a charged particle beam emitted from a charged particle source to perform a scan; a detector for detecting a charged particle obtained on the basis of the scanning of the charged particle beam; and a computation processing device for generating an image on the basis of the output of the detector.Type: ApplicationFiled: January 29, 2016Publication date: January 31, 2019Applicant: Hitachi High-Technologies CorporationInventors: Kei SAKAI, Satoru YAMAGUCHI, Hideki ITAI, Yasunori TAKASUGI, Kumiko SHIMIZU
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Publication number: 20180374674Abstract: A charged particle beam device is provided which minimizes the beam irradiation amount while maintaining a high measurement success rate. The charged particle beam device includes a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m?1), the number m of frames being smaller than the number n of frames.Type: ApplicationFiled: August 31, 2018Publication date: December 27, 2018Inventors: Hideki ITAI, Kumiko SHIMIZU, Wataru MORI, Hajime KAWANO, Shahedul HOQUE
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Patent number: 9978558Abstract: The image processing device has: a scanning direction decision unit which divides an captured image into a plurality of scanning regions and deciding a scanning direction of each scanning region based on a pattern edge captured in each scanning region in the captured image, a scanning order decision unit which performs a raster scan per pixel constituting each scanning region such that the scanning direction of each of the decided scanning region is directed to a horizontal direction of the raster scan, and a scanning image acquisition unit which acquires a scanning image by capturing each scanning region by the scanning-electron-microscope based on the decided scanning order.Type: GrantFiled: February 20, 2013Date of Patent: May 22, 2018Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Kumiko Shimizu, Hajime Kawano
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Publication number: 20170323763Abstract: The purpose of the present invention is to provide a charged particle beam device with which it is possible to minimize the beam irradiation amount while maintaining a high measurement success rate. The present invention is a charged particle beam device provided with a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m?1), the number m of frames being smaller than the number n of frames.Type: ApplicationFiled: July 27, 2015Publication date: November 9, 2017Inventors: Hideki ITAI, Kumiko SHIMIZU, Wataru MORI, Hajime KAWANO, Shahedul HOQUE
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Publication number: 20170278671Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: ApplicationFiled: June 9, 2017Publication date: September 28, 2017Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO, Shahedul HOQUE, Kumiko SHIMIZU, Hiroyuki TAKAHASHI
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Patent number: 9697987Abstract: The scanning charged particle beam microscope according to the present invention is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: GrantFiled: June 11, 2014Date of Patent: July 4, 2017Assignee: Hitachi High-Technologies CorporationInventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
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Patent number: 9601307Abstract: The present invention provides a high-throughput scanning electron microscope in which a wafer (9) is held by an electrostatic chuck (10), an image is obtained using an electron beam, and the wafer surface is measured, wherein even in a case where the temperature of the wafer (9) is changed due to the environmental temperature the electron scanning microscope is capable of preventing any loss in resolution or the deterioration of the measurement reproducibility caused by thermal shrinkage accompanied by temperature change of the wafer (9). A drill hole is provided on the rear surface of the electrostatic chuck (10), and a thermometer (34) is secured in place so that the front end is brought into elastic contact with the bottom surface of the drill hole.Type: GrantFiled: February 5, 2014Date of Patent: March 21, 2017Assignee: Hitachi High-Technologies CorporationInventors: Seiichiro Kanno, Masashi Fujita, Naoya Ishigaki, Makoto Nishihara, Kumiko Shimizu
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Publication number: 20160240348Abstract: The scanning charged particle beam microscope according to the present invention is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: ApplicationFiled: June 11, 2014Publication date: August 18, 2016Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO, Shahedul HOQUE, Kumiko SHIMIZU, Hiroyuki TAKAHASHI
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Publication number: 20150371814Abstract: The present invention provides a high-throughput scanning electron microscope in which a wafer (9) is held by an electrostatic chuck (10), an image is obtained using an electron beam, and the wafer surface is measured, wherein even in a case where the temperature of the wafer (9) is changed due to the environmental temperature the electron scanning microscope is capable of preventing any loss in resolution or the deterioration of the measurement reproducibility caused by thermal shrinkage accompanied by temperature change of the wafer (9). A drill hole is provided on the rear surface of the electrostatic chuck (10), and a thermometer (34) is secured in place so that the front end is brought into elastic contact with the bottom surface of the drill hole.Type: ApplicationFiled: February 5, 2014Publication date: December 24, 2015Inventors: Seiichiro KANNO, Masashi FUJITA, Naoya ISHIGAKI, Makoto NISHIHARA, Kumiko SHIMIZU
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Publication number: 20150002651Abstract: The image processing device has: a scanning direction decision unit which divides an captured image into a plurality of scanning regions and deciding a scanning direction of each scanning region based on a pattern edge captured in each scanning region in the captured image, a scanning order decision unit which performs a raster scan per pixel constituting each scanning region such that the scanning direction of each of the decided scanning region is directed to a horizontal direction of the raster scan, and a scanning image acquisition unit which acquires a scanning image by capturing each scanning region by the scanning-electron-microscope based on the decided scanning order.Type: ApplicationFiled: February 20, 2013Publication date: January 1, 2015Inventors: Kumiko Shimizu, Hajime Kawano
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Patent number: 6827944Abstract: Provided is a composition for percutaneous administration containing a mixture of polymers forming a surface-segregated film, and (B) an active ingredient. The composition provides excellent percutaneous absorption efficacy of the active ingredient, particularly, a water-soluble active ingredient, has excellent feeling and is convenient to use.Type: GrantFiled: October 25, 2001Date of Patent: December 7, 2004Assignee: Kao CorporationInventors: Masaru Hosokawa, Kumiko Shimizu, Toshio Uesaka, Ichiro Sugai, Shinobu Mori