Patents by Inventor Kun-Hee Park

Kun-Hee Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11935984
    Abstract: A quantum dot including a core that includes a first semiconductor nanocrystal including zinc and selenium, and optionally sulfur and/or tellurium, and a shell that includes a second semiconductor nanocrystal including zinc, and at least one of sulfur or selenium is disclosed. The quantum dot has an average particle diameter of greater than or equal to about 13 nm, an emission peak wavelength in a range of about 440 nm to about 470 nm, and a full width at half maximum (FWHM) of an emission wavelength of less than about 25 nm. A method for preparing the quantum dot, a quantum dot-polymer composite including the quantum dot, and an electronic device including the quantum dot is also disclosed.
    Type: Grant
    Filed: December 14, 2022
    Date of Patent: March 19, 2024
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yong Seok Han, Sung Woo Kim, Jin A Kim, Tae Hyung Kim, Kun Su Park, Yuho Won, Jeong Hee Lee, Eun Joo Jang, Hyo Sook Jang
  • Patent number: 11845912
    Abstract: The present disclosure relates to a cleaning liquid composition and a cleaning method using the same. A polishing slurry composition according to an embodiment of the present disclosure includes: a chelating agent containing an organic salt; and an anionic surfactant.
    Type: Grant
    Filed: August 7, 2019
    Date of Patent: December 19, 2023
    Assignee: KCTECH CO., LTD.
    Inventors: Ga Young Jung, Yong Ho Jeong, Kun Hee Park, Young Gon Kim, Young Ho Yoon, Young Lok Yoon
  • Patent number: 11732217
    Abstract: A cleaning solution composition and a cleaning method using the cleaning solution composition are provided. The cleaning solution composition includes a chelating agent including a first organic acid and a second organic acid, and an etching agent including a fluoride compound.
    Type: Grant
    Filed: July 21, 2021
    Date of Patent: August 22, 2023
    Assignee: KCTECH CO., LTD.
    Inventors: Kun Hee Park, Yong Ho Jeong, Kyong Jin Jung, Young Ho Yun
  • Publication number: 20230207355
    Abstract: An apparatus for treating a substrate of the present invention includes a buffer unit, an inversion unit, a first transfer chamber, a second transfer chamber, a first cleaning chamber, and a second cleaning chamber. The first transfer chamber, the inversion unit, and the second transfer chamber are sequentially arranged in one direction. The first cleaning chamber is disposed at one side of the first transfer chamber, and the second cleaning chamber is disposed at one side of the second transfer chamber. A first main transfer robot provided in the first transfer chamber directly transfers the substrate between the buffer unit, the inversion unit, and the first cleaning chamber. The second main transfer robot provided in the second transfer chamber directly transfers the substrate between the buffer unit, the inversion unit, and the second cleaning chamber.
    Type: Application
    Filed: December 22, 2022
    Publication date: June 29, 2023
    Applicant: SEMES CO., LTD.
    Inventors: Kun Hee PARK, Young Joon HAN, Cheol Hwan JEONG, Dae Hun KIM, Seong Hyun YUN, Ye Jin CHOI, Eun Hyeok CHOI, Tae Ho KANG, Young Jin KIM
  • Publication number: 20220145216
    Abstract: A composition for dissolving abrasive particles, and a cleaning method using the composition are provided. The composition includes a sulfur-containing organic acid, a fluorine ion-containing compound, and a solvent, and a turbidity change rate (%) measured at 60° C. for 15 minutes may be in a range of ?80 to ?99.
    Type: Application
    Filed: November 1, 2021
    Publication date: May 12, 2022
    Applicant: KCTECH CO., LTD.
    Inventors: Kyong Jin JUNG, Ga Young JUNG, Young Ho YUN, Kun Hee PARK, Young Gon KIM, Yong Ho JEONG
  • Publication number: 20220056373
    Abstract: The present disclosure relates to a cleaning liquid composition and a cleaning method using the same. A polishing slurry composition according to an embodiment of the present disclosure includes: a chelating agent containing an organic salt; and an anionic surfactant.
    Type: Application
    Filed: August 7, 2019
    Publication date: February 24, 2022
    Applicant: KCTECH CO., LTD.
    Inventors: Ga Young JUNG, Yong Ho JEONG, Kun Hee PARK, Young Gon KIM, Young Ho YOON, Young Lok YOON
  • Publication number: 20220025299
    Abstract: A cleaning solution composition and a cleaning method using the cleaning solution composition are provided. The cleaning solution composition includes a chelating agent including a first organic acid and a second organic acid, and an etching agent including a fluoride compound.
    Type: Application
    Filed: July 21, 2021
    Publication date: January 27, 2022
    Applicant: KCTECH CO., LTD.
    Inventors: Kun Hee PARK, Yong Ho JEONG, Kyong Jin JUNG, Young Ho YUN
  • Patent number: 8442325
    Abstract: A method for recognizing a music score included in an image and various information included in the music score, which may be obtained through a camera provided in a mobile terminal without requiring a separate editing program. The method includes detecting a region with staff lines from the image including the music score; detecting a region with an accompaniment chord from the image by taking the region with the staff lines and a region with a musical note into consideration; extracting and removing the staff lines from the music score included in the image; recognizing the musical note by extracting the musical note from the image, from which the staff lines have been removed; recognizing the accompaniment chord by extracting the accompaniment chord from the image, from which the staff lines have been removed; and generating data for reproducing a sound source corresponding to the musical note and accompaniment chord.
    Type: Grant
    Filed: February 11, 2009
    Date of Patent: May 14, 2013
    Assignees: Samsung Electronics Co., Ltd., Industry Foundation of Chonnam National University
    Inventors: Tae-Hwa Hong, Byung-Jun Son, Soo-Kyun Kim, Sung-Dae Cho, Guee-Sang Lee, Sung-Ryul Oh, Kun-Hee Park
  • Publication number: 20090202106
    Abstract: A method for recognizing a music score included in an image and various information included in the music score, which may be obtained through a camera provided in a mobile terminal without requiring a separate editing program. The method includes detecting a region with staff lines from the image including the music score; detecting a region with an accompaniment chord from the image by taking the region with the staff lines and a region with a musical note into consideration; extracting and removing the staff lines from the music score included in the image; recognizing the musical note by extracting the musical note from the image, from which the staff lines have been removed; recognizing the accompaniment chord by extracting the accompaniment chord from the image, from which the staff lines have been removed; and generating data for reproducing a sound source corresponding to the musical note and accompaniment chord.
    Type: Application
    Filed: February 11, 2009
    Publication date: August 13, 2009
    Inventors: Tae-Hwa HONG, Byung-Jun Son, Soo-Kyun Kim, Sung-Dae Cho, Guee-Sang Lee, Sung-Ryul Oh, Kun-Hee Park