Abstract: A quantum dot including a core that includes a first semiconductor nanocrystal including zinc and selenium, and optionally sulfur and/or tellurium, and a shell that includes a second semiconductor nanocrystal including zinc, and at least one of sulfur or selenium is disclosed. The quantum dot has an average particle diameter of greater than or equal to about 13 nm, an emission peak wavelength in a range of about 440 nm to about 470 nm, and a full width at half maximum (FWHM) of an emission wavelength of less than about 25 nm. A method for preparing the quantum dot, a quantum dot-polymer composite including the quantum dot, and an electronic device including the quantum dot is also disclosed.

Abstract: Disclosed is an intravenous drug dispensing kit including: a cylinder cartridge for introducing and discharging external fluids through changes in the volume of a cylinder occurring when a pair of first and second pistons disposed therein is fixed and rotates relatively to each other; a first tube connected to an outlet tube of the cylinder cartridge; a three-way valve having a first introducing flow path, a second introducing flow path, and a discharge flow path connected to any one of the first introducing flow path and the second introducing flow path; a second tube for connecting the discharge flow path of the three-way valve to an inlet tube of the cylinder cartridge; a third tube connected to the first introducing flow path of the three-way valve; and a fourth tube connected to the second introducing flow path of the three-way valve.

Abstract: The present invention relates to a cylinder pump including: a body part having a main body with a coupling groove formed thereon and a front body coupled to the main body by means of hinges; a cartridge detachably attached to the coupling groove of the body part; a driving part located inside the main body to operate the cartridge; a display part located on the front body to provide an interface necessary for the operation thereof; a controller for controlling the operation of the driving part; and an operating part for transmitting a user's operating signal or input information to the controller.

Abstract: The present invention relates to a simple and small cylinder pump, which can stably supply a medical fluid regardless of the installed height of a liquid container or a blood bag. The cylinder pump includes an upper casing, and a lower casing coupled to the upper casing. An upper rotation member is rotatably inserted in the upper casing. A lower rotation member slidingly contacting the upper rotation member is rotatably inserted in the lower casing. An inner wall of the upper casing, a lower outer surface of the upper rotation member, an inner wall of the lower casing, and an upper outer surface of the rotation member constitute a cylinder having a single-tube shape. Plungers are installed on the upper rotation member and on the lower rotation member, respectively, and rotate in the cylinder, the ends of which are closed.

Abstract: The present invention relates to a simple and small cylinder pump, which can stably supply a medical fluid regardless of the installed height of a liquid container or a blood bag. The cylinder pump includes an upper casing, and a lower casing coupled to the upper casing. An upper rotation member is rotatably inserted in the upper casing. A lower rotation member slidingly contacting the upper rotation member is rotatably inserted in the lower casing. An inner wall of the upper casing, a lower outer surface of the upper rotation member, an inner wall of the lower casing, and an upper outer surface of the rotation member constitute a cylinder having a single-tube shape. Plungers are installed on the upper rotation member and on the lower rotation member, respectively, and rotate in the cylinder, the ends of which are closed.

Abstract: A semiconductor wet etchant includes deionized water, a fluorine-based compound, an oxidizer and an inorganic salt. A concentration of the fluorine-based compound is 0.25 to 10.0 wt % based on a total weight of the etchant, a concentration of the oxidizer is 0.45 to 3.6 wt % based on a total weight of the etchant, and a concentration of the inorganic salt is 1.0 to 5.0 wt % based on a total weight of the etchant. The inorganic salt comprises at least one of an ammonium ion (NH4+) and a chlorine ion (Cl?).

Abstract: A semiconductor wet etchant includes deionized water, a fluorine-based compound, an oxidizer and an inorganic salt. A concentration of the fluorine-based compound is 0.25 to 10.0 wt % based on a total weight of the etchant, a concentration of the oxidizer is 0.45 to 3.6 wt % based on a total weight of the etchant, and a concentration of the inorganic salt is 1.0 to 5.0 wt % based on a total weight of the etchant. The inorganic salt comprises at least one of an ammonium ion (NH4+) and a chlorine ion (Cl?).

Abstract: In an embodiment, heat treatment equipment comprises a process tube, an exhaust duct connected to the process tube, and, during operation, exhausting gases present within the process tube. The heat treatment equipment also comprises a hollow pressure control member interposed between the process tube and the exhaust duct, the pressure control member being operatively connected to the process tube and the exhaust duct respectively, and including one or a number of openings. Negative pressure is avoided in the process tube during heat treatment processes so that unwanted gas and impurities cannot enter the process tube from outside.

Abstract: The present invention provides the pharmaceutical compositions, the pharmaceutical preparations thereof as an active ingredient, the health food, the food with health-promoting benefits and the like. The present invention provides the above-mentioned pharmaceutical preparations and the like comprising at least one of the compound shown in the following formula (I), physiologically acceptable salt thereof, or hydrate thereof. (wherein, R?1, R?2, and R?3 are independently a hydrogen atom, OH, or alkoxy group having C1 to C3, respectively. R1, R2, and R3 are independently a hydrogen atom or alkenyl group having C3 to C5, respectively).

Abstract: A semiconductor wet etchant includes deionized water, a fluorine-based compound, an oxidizer and an inorganic salt. A concentration of the fluorine-based compound is 0.25 to 10.0 wt % based on a total weight of the etchant, a concentration of the oxidizer is 0.45 to 3.6 wt % based on a total weight of the etchant, and a concentration of the inorganic salt is 1.0 to 5.0 wt % based on a total weight of the etchant. The inorganic salt comprises at least one of an ammonium ion (NH4+) and a chlorine ion (Cl?).

Abstract: An apparatus and method for manufacturing semiconductor devices are disclosed. In accordance with the invention, a wafer transfer device for transferring wafers from wafer storage containers to wafer processing equipment includes a flow chamber designed to reduce the amount of contaminants that can enter the wafer container. The wafer transfer apparatus provide two gas inlets for allowing two gases to flow through the flow chamber of the transfer apparatus. This results in a reduced amount of contaminants able to enter the wafer container, which in turn results in manufacture of devices with more reliable performance characteristics as well as high manufacturing yield.

Abstract: In an embodiment, heat treatment equipment comprises a process tube, an exhaust duct connected to the process tube, and, during operation, exhausting gases present within the process tube. The heat treatment equipment also comprises a hollow pressure control member interposed between the process tube and the exhaust duct, the pressure control member being operatively connected to the process tube and the exhaust duct respectively, and including one or a number of openings. Negative pressure is avoided in the process tube during heat treatment processes so that unwanted gas and impurities cannot enter the process tube from outside.

Abstract: The present invention provides the pharmaceutical compositions, the pharmaceutical preparations thereof as an active ingredient, the health food, the food with health-promoting benefits and the like. The present invention provides the above-mentioned pharmaceutical preparations and the like comprising at least one of the compound shown in the following formula (I), physiologically acceptable salt thereof, or hydrate thereof. (wherein, R?1, R?2, and R?3 are independently a hydrogen atom, OH, or alkoxy group having C1 to C3, respectively. R1, R2, and R3 are independently a hydrogen atom or alkenyl group having C3 to C5, respectively).

Abstract: A surface acoustic wave gas sensor for detecting predetermined substances includes a piezoelectric substrate, an input transducer and an output transducer which is formed on the piezoelectric substrate, and a sensitive film which is formed between the input transducer and the output transducer and detects at least one of acetone, benzene, dichloroethane, ethanol, and toluene. The sensitive film includes mercaptoundecanoic acid and CMP composed of cellulose nitrate, dibutyl phthalate, compound of benzene and ethanol, ethyl acetate. The surface acoustic wave gas sensor can quickly detect even small amounts of these substances.

Abstract: An apparatus and method for manufacturing semiconductor devices are disclosed. In accordance with the invention, a wafer transfer device for transferring wafers from wafer storage containers to wafer processing equipment includes a flow chamber designed to reduce the amount of contaminants that can enter the wafer container. The wafer transfer apparatus provide two gas inlets for allowing two gases to flow through the flow chamber of the transfer apparatus. This results in a reduced amount of contaminants able to enter the wafer container, which in turn results in manufacture of devices with more reliable performance characteristics as well as high manufacturing yield.

Abstract: An improved wafer transfer apparatus is provided that allows the ambient atmosphere within a modified front open unified pod (“FOUP”) while the FOUP is positioned on a loading stage provided on an equipment front end module (“EFEM”). In particular, the wafer transfer apparatus includes both an injection assembly and an exhaust assembly that will be engaged when the door of the FOUP is docked to a door holder provided on the EFEM. The injection assembly may include a mass flow controller (“MFC”) for controlling the injection of purge gas(es) into the container. Similarly, the exhaust assembly may include a MFC for controlling the removal of fluid from the container. While the door is docked to the door holder, inert or less reactive gases may be introduced into the container, thereby reducing the likelihood of oxidation or contamination of the wafers therein.

Abstract: An apparatus and method for manufacturing semiconductor devices are disclosed. In accordance with the invention, a wafer transfer device for transferring wafers from wafer storage containers to wafer processing equipment includes a flow chamber designed to reduce the amount of contaminants that can enter the wafer container. The wafer transfer apparatus provide two gas inlets for allowing two gases to flow through the flow chamber of the transfer apparatus. This results in a reduced amount of contaminants able to enter the wafer container, which in turn results in manufacture of devices with more reliable performance characteristics as well as high manufacturing yield.

Abstract: An apparatus for processing a substrate includes a load port for supporting a container for receiving a plurality of substrates, a substrate processing module for processing the substrate transferred from the container, a substrate transfer module, including a substrate transfer chamber connecting the load port with the substrate processing module and a substrate transfer robot disposed in the substrate transfer chamber for transferring the substrate, a fan filter unit connected to the substrate transfer chamber for supplying air, a differential pressure gauge connected to the substrate transfer chamber for measuring a differential pressure between internal and external pressures of the substrate transfer chamber, and a pressure adjustment means for exhausting air supplied into the substrate transfer chamber and for adjusting a flow rate of air being exhausted from the substrate transfer chamber according to the differential pressure so that the internal pressure is maintained higher than the external pressur

Abstract: A surface acoustic wave gas sensor for detecting predetermined substances includes a piezoelectric substrate, an input transducer and an output transducer which is formed on the piezoelectric substrate, and a sensitive film which is formed between the input transducer and the output transducer and detects at least one of acetone, benzene, dichloroethane, ethanol, and toluene. The sensitive film includes mercaptoundecanoic acid and CMP composed of cellulose nitrate, dibutyl phthalate, compound of benzene and ethanol, ethyl acetate. The surface acoustic wave gas sensor can quickly detect even small amounts of these substances.

Abstract: A cassette table on which a wafer cassette is supported allows static electricity to be discharged from the cassette and hence, form the wafers disposed in the cassette. The cassette table includes a top plate, a cassette supporter that is mounted on the top plate and supports the cassette. At least part of the cassette supporter is made of a material that allows static electricity to be discharged to ground therethrough.