Patents by Inventor Kun-Jin Wu

Kun-Jin Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Extreme ultraviolet lithography system with debris trapper on exhaust line
    Patent number: 10162277
    Abstract: An extreme ultraviolet (EUV) lithography system includes a collector designed to collect and reflect EUV radiation, a cover integrated with the collector, a first exhaust line connected to the cover and configured to receive debris vapor from the collector, a debris trapper connected to the first exhaust line and configured to trap the debris vapor, and a second exhaust line connected to the debris trapper.
    Type: Grant
    Filed: November 1, 2017
    Date of Patent: December 25, 2018
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shang-Chieh Chien, Jye-Fu Jeng, Shih-Chang Shih, Kun-Jin Wu, Guan-Heng Liu, Jen-Yang Chung, Li-Jui Chen, Po-Chung Cheng
  • Extreme Ultraviolet Lithography System with Debris Trapper on Exhaust Line
    Publication number: 20180173117
    Abstract: An extreme ultraviolet (EUV) lithography system includes a collector designed to collect and reflect EUV radiation, a cover integrated with the collector, a first exhaust line connected to the cover and configured to receive debris vapor from the collector, a debris trapper connected to the first exhaust line and configured to trap the debris vapor, and a second exhaust line connected to the debris trapper.
    Type: Application
    Filed: November 1, 2017
    Publication date: June 21, 2018
    Inventors: Shang-Chieh Chien, Jye-Fu Jeng, Shih-Chang Shih, Kun-Jin Wu, Guan-Heng Liu, Jen-Yang Chung, Li-Jui Chen, Po-Chung Cheng