Abstract: A photosensitive assembly includes a circuit board. The circuit board has a first surface, a second surface opposite to the first surface, and a first through hole extending through the first surface and the second surface. A photosensitive chip is disposed on the second surface. The photosensitive chip has a photosensitive area and a non-photosensitive area connected to the photosensitive area, the non-photosensitive area is electrically connected to one side of the second surface, and the photosensitive area is exposed from the first through hole. A reinforcing plate is disposed on the first surface. A thermal conductive layer is disposed on the photosensitive chip, and the thermal conductive layer includes a silica gel or a metal.

Abstract: A process for producing a barrier composition includes subjecting a siloxane compound having 1 to 3 amino groups and an aqueous solution including water and an alcohol to hydrolysis and first-stage condensation under required conditions, subjecting a first colloidal mixture obtained and an additional alcohol to second-stage condensation, subjecting a second colloidal mixture obtained, which has a particular solid content, to heating under required conditions, and subjecting a cured product obtained to aging under required conditions. A barrier composition produced by the process is also disclosed.

Abstract: A process for producing a barrier composition includes subjecting a siloxane compound having 1 to 3 amino groups and an aqueous solution including water and an alcohol to hydrolysis and first-stage condensation under required conditions, subjecting a first colloidal mixture obtained and an additional alcohol to second-stage condensation, subjecting a second colloidal mixture obtained, which has a particular solid content, to heating under required conditions, and subjecting a cured product obtained to aging under required conditions. A barrier composition produced by the process is also disclosed.

Abstract: A gas barrier laminate includes an organic layer and an inorganic layered unit. The organic layer includes a product obtained by subjecting a silane compound having an alkoxy group to hydrolysis and condensation. The inorganic layered unit is disposed on the organic layer, and includes an aluminum oxide layer, a hafnium oxide layer, and a silicon aluminum oxide layer that are laminated to one another.

Abstract: A moisture barrier film, a moisture barrier device including the same and a method for preparing the moisture barrier device is provided. The moisture barrier film includes a hydrophobic modifying layer adapted to be formed on a substrate. The hydrophobic modifying layer is formed by solidification of a colloidal solution which includes a product obtained by subjecting a first trialkoxysilane having a hydrophobic group to a hydrolysis and condensation reaction with at least one of a second trialkoxysilane having a reactive group or a tetraalkoxysilane to form a polysilsesquioxane mixture, and subjecting the polysilsesquioxane mixture to modification with a metal source.

Abstract: A barrier film includes at least one laminate to be disposed on a substrate. The laminate includes a modifying layer proximate to the substrate and at least one multi-layered barrier unit disposed on the modifying layer. The multi-layered barrier unit includes an aluminum oxide layer, a silicon oxide layer, and a zirconium oxide layer laminated to one another.

Abstract: A high water-containing electrolyte with higher electrical conductivity for an electrolytic capacitor, which includes a solvent made of 65% to 100% by weight of water and 35% to 0% by weight of organic solvent and an alkanolamine compound additive. An aluminum electrolytic capacitor using as its electrolyte has low impedance and excellent low-temperature stability and high-temperature prolonged life and shelf life.