Patents by Inventor Kun-Rung Lin

Kun-Rung Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Touch panel and a manufacturing method thereof
    Patent number: 9116587
    Abstract: The present disclosure provides a method for manufacturing a touch panel, wherein the method comprises: forming a touch sensing layer on a visible region and a non-visible region of a cover substrate, wherein the non-visible region is located at periphery of the visible region forming a first opaque insulating layer on the touch sensing layer in the non-visible region; forming a wiring layer on the first opaque insulating layer: and forming a conductive layer to electrically connect the wiring layer and the touch sensing layer. Moreover, the present disclosure also provides a touch panel. Accordingly, the touch sensing accuracy is maintained, and the production rate is improved.
    Type: Grant
    Filed: December 25, 2012
    Date of Patent: August 25, 2015
    Assignee: TPK Touch Solutions (Xiamen) Inc.
    Inventors: Yuh-Wen Lee, Hsiang-Lung Hsia, Kun-Rung Lin, Minghua Ye, Xianbin Xu, Tsung-Ke Chiu, Huilin Ye, Jing Yu
  • TOUCH PANEL AND A MANUFACTURING METHOD THEREOF
    Publication number: 20140176453
    Abstract: The present disclosure provides a method for manufacturing a touch panel, wherein the method comprises: forming a touch sensing layer on a visible region and a non-visible region of a cover substrate, wherein the non-visible region is located at periphery of the visible region forming a first opaque insulating layer on the touch sensing layer in the non-visible region; forming a wiring layer on the first opaque insulating layer: and forming a conductive layer to electrically connect the wiring layer and the touch sensing layer. Moreover, the present disclosure also provides a touch panel. Accordingly, the touch sensing accuracy is maintained, and the production rate is improved.
    Type: Application
    Filed: December 25, 2012
    Publication date: June 26, 2014
    Inventors: YUH-WEN LEE, Hsiang-Lung Hsia, Kun-Rung Lin, Minghua Ya, Xianbin Xu, Tsung-Ke Chiu, Huilin Ye, Jung Yu
  • Method of forming and testing a phase shift mask
    Patent number: 7232629
    Abstract: A surface of a mask substrate is divided into a main field region and a blank periphery region surrounding the main field region. A first pattern, at least one second pattern and at least one third pattern are formed within the main field region to form a phase shift mask (PSM). By using the PSM, a pattern transferring process is performed to transfer the first pattern, the second pattern and the third pattern to a semiconductor wafer. Finally, by using the second and third patterns transferred to the semiconductor wafer, a PSM test is performed.
    Type: Grant
    Filed: March 30, 2004
    Date of Patent: June 19, 2007
    Assignee: United Microelectronics Corp.
    Inventors: Lin-Hsin Tu, Kun-Rung Lin
  • METHOD OF FORMING AND TESTING A PHASE SHIFT MASK
    Publication number: 20040224240
    Abstract: A surface of a mask substrate is divided into a main field region and a blank periphery region surrounding the main field region. A first pattern, at least one second pattern and at least one third pattern are formed within the main field region to form a phase shift mask (PSM). By using the PSM, a pattern transferring process is performed to transfer the first pattern, the second pattern and the third pattern to a semiconductor wafer. Finally, by using the second and third patterns transferred to the semiconductor wafer, a PSM test is performed.
    Type: Application
    Filed: March 30, 2004
    Publication date: November 11, 2004
    Inventors: Lin-Hsin Tu, Kun-Rung Lin