Abstract: A method for manufacturing a semiconductor device includes: providing a wafer-bonding stack structure having a sidewall layer and an exposed first component layer; forming a photoresist layer on the first component layer; performing an edge trimming process to at least remove the sidewall layer; and removing the photoresist layer. In this way, contaminant particles generated from the blade during the edge trimming process may fall on the photoresist layer but not fall on the first component layer, so as to protect the first component layer from being contaminated.

Abstract: A method for manufacturing a semiconductor structure is provided. The method includes: providing a substrate and a dielectric layer on the substrate; forming a hole in the dielectric layer; forming an initial barrier material layer and a conductive layer on an upper surface of the dielectric layer and in the hole; removing part of the initial barrier material layer and part of the conductive layer to form a barrier material layer and a via element in the hole respectively and expose the upper surface of the dielectric layer. An upper surface of the barrier material layer is higher than the upper surface of the dielectric layer.

Abstract: A method for modifying a photomask layout includes the following steps. First, a photomask layout having at least an edge is provided. A plurality of evaluation points are positioned on the edge. Then, the photomask layout is interpreted to have an interpreted photomask layout and an interpreted edge pattern. The interpreted edge pattern is formed by interpreting the above-mentioned edge. After that, a shift between the edge and the interpreted edge and corresponding to each of the evaluation points is calculated. Afterwards, a shift gradient between two evaluation points can be derived from the shift. Finally, a number of segments between each two evaluation points can be estimated.

Abstract: A method for modifying a photomask layout includes the following steps. First, a photomask layout having at least an edge is provided. A plurality of evaluation points are positioned on the edge. Then, the photomask layout is interpreted to have an interpreted photomask layout and an interpreted edge pattern. The interpreted edge pattern is formed by interpreting the above-mentioned edge. After that, a shift between the edge and the interpreted edge and corresponding to each of the evaluation points is calculated. Afterwards, a shift gradient between two evaluation points can be derived from the shift. Finally, a number of segments between each two evaluation points can be estimated.

Abstract: An impact sensor for installation in a moving machine to detect an impact includes first and second electrically conductive strip and an insulative layer sandwiched therebetween. The first electrically conductive strip has at least one electrically conductive member facing but insulatively separated by the insulative layer from at least one electrically conductive member of the second electrically conductive strip. The insulative layer has a plurality of through holes, through at least one of which the electrically conductive member of the first electrically conductive strip and the electrically conductive member of the second electrically conductive strip are electrically contactable with each other when the second electrically conductive strip deforms under impact.

Abstract: A floor-cleaning device primarily comprises a pair of driving units provided at two opposite sides of a main body thereof wherein the driving units are electrically connected to a control unit and a power-supply unit which are both deposited in the main body so that the main body is capable of moving freely on a substantial surface. Particularly, a moving-along-edge sensing unit is provided at the left or right side of the main body to conduct a movement of the main body along the edge of the surrounding objects. The sensing unit is composed of non-contact sensing components so as to permit the main body to move along the edge of the surrounding objects with a predetermined distance in a continuous slightly oscillatory S-shaped route. In virtue of the sensing unit, the main body can automatically approach and connect to a charger for automatic charge.

Abstract: A method for generating an image public key uses a predefined image as an input to the RSA algorithm to calculate a public key that includes the predefined image information. Translating the public key into an image generates an image public key. Therefore, the method allows a user to use a predefined image for identification and to generate a visible public key. That is, using the image public key easily identifies to whom the public key belongs so use of the wrong public key is less likely.

Abstract: A method for generating an image public key uses a predefined image as an input to the RSA algorithm to calculate a public key that includes the predefined image information. Translating the public key into an image generates an image public key. Therefore, the method allows a user to use a predefined image for identification and to generate a visible public key. That is, using the image public key easily identifies to whom the public key belongs so use of the wrong public key is less likely.