Abstract: A plasma processing apparatus is provided. The apparatus includes a lower sheltering module. The apparatus further includes an upper sheltering module arranged adjacent to the lower sheltering module. The apparatus includes an upper plate and an upper PEZ ring positioned around the upper plate. The apparatus also includes a shadowing unit that includes a number of engaging parts in the form of arcs detachably positioned on the upper PEZ ring. In addition, the apparatus includes a plasma generation module for generating plasma in the peripheral region of the lower sheltering module and the upper sheltering module.

Abstract: A semiconductor manufacturing tool and process to form semiconductor devices is provided. An edge ring of the semiconductor manufacturing tool comprises a high electron mobility material in order to extend an electrical field and sheath such that curvature from the sheath is moved away from a semiconductor wafer so that an impact from the curvature is reduced or eliminated during an etching process.

Abstract: A plasma processing apparatus is provided. The apparatus includes a lower sheltering module. The apparatus further includes an upper sheltering module arranged adjacent to the lower sheltering module. The apparatus includes an upper plate and an upper PEZ ring positioned around the upper plate. The apparatus also includes a shadowing unit that includes a number of engaging parts in the form of arcs detachably positioned on the upper PEZ ring. In addition, the apparatus includes a plasma generation module for generating plasma in the peripheral region of the lower sheltering module and the upper sheltering module.

Abstract: A semiconductor manufacturing tool and process to form semiconductor devices is provided. An edge ring of the semiconductor manufacturing tool comprises a high electron mobility material in order to extend an electrical field and sheath such that curvature from the sheath is moved away from a semiconductor wafer so that an impact from the curvature is reduced or eliminated during an etching process.

Abstract: The present disclosure relates to a dust-cleaning structure, the dust-cleaning structure includes a first strainer, at least one fan, a vibrating motor and a controller. The at least one fan is assigned at a side of the first strainer and can be rotated a first direction and a second direction. The vibrating motor is connected to the first strainer. The controller is used to control the fan. The present disclosure also relates to an electronic system using the dust-cleaning structure.

Abstract: A lamp tube illumination stabilization device, mostly applicable to scanners, includes a lamp tube driver for controlling the illumination of the lamp tube, a sensor for detecting the change of the illumination, and a voltage controller for receiving a detection value of the sensor and controlling the power magnitude to the lamp tube driver according to comparison of the detection value with a predetermined value of the voltage controller.