Abstract: A substrate cassette having an electrode array includes a base frame, a plurality of first electrode plates, a plurality of second electrode plates, and a plurality of struts. The base frame includes at least one conductive member located at a bottom side thereof and each having a plurality of first channels and second channels parallel to the first channels. The first and second channels are alternately arranged. The base frame includes a plurality of fixtures located at a top side thereof. An insulator is mounted in each of the second channels. Each of the struts is mounted to two opposite sides of a bottom edge of each of the corresponding first and second electrode plates. The struts and the corresponding fixtures are vertically opposite to each other to jointly define a limited space for receiving substrates, wherein the struts carry the substrates. Therefore, the substrate cassette is applicable to the CVD process.

Abstract: A slotted electrode with uniform distribution of electric field and a process apparatus using the slotted electrode are disclosed. The slotted electrode comprises an electrode plate; a perturbation slot segment; a first edge perturbation slot segment; two second edge perturbation slot segments. By using the slot segments of the electrode plate, the electrode plate can improve the uniformity of plasma density, and is suitable for use in various types of substrate and can be widely applied in a plasma process system.

Abstract: An electrode with improved plasma uniformity is disclosed, which is used for a chamber capable of generating a plasma. The electrode comprises an electrode plate and a perturbation slot. By well designing the perturbation slot of the electrode, the disclosed electrode can improve the uniformity of the plasma density, and is suitable for use in various types of substrate and can be widely applied in a plasma process system.

Abstract: A batch forming system for amorphous silicon films is composed of at least one p-layer formation chamber having a sealing gate that can be opened or closed; at least one i-layer formation chamber having a sealing gate that can be opened or closed; at least one n-layer formation chamber having a sealing gate that can be opened or closed; a common vacuum chamber connected with said formation chambers; a conveyance device having a bearing surface movable to the fronts of said sealing gates respectively; and a cart for carrying a plurality of plate-shaped materials, being allowed passing through said sealing gates to enter said formation chambers respectively from said bearing surface or to exit said formation chambers and then go back to the bearing surface. Therefore, batch forming system can speedy up the production and do the batch formation of a multiplicity of the amorphous silicon films at a time.