Abstract: A coating apparatus for continuously forming a film through chemical vapor deposition (CVD) includes a conveyor unit for conveying a substrate along a moving path, a deposition unit and a film formation-prohibiting unit. The deposition unit is disposed on the moving path and includes a deposition chamber adapted for receiving the substrate and forming a film on the substrate through CVD. The film formation-prohibiting unit includes a heating mechanism that is disposed in the deposition chamber for maintaining the conveyor unit at a film formation-prohibiting temperature.

Abstract: An apparatus for continuously forming a film through chemical vapor deposition includes a conveyor unit, a depositing unit and a cooling mechanism. The conveyor unit is for conveying a substrate along a moving path. The depositing unit includes at least one deposition chamber disposed to deposit a film-forming material on the substrate. The cooling mechanism includes inlet and outlet cooling units that are disposed oppositely relatively to the deposition chamber, that are communicated fluidly with the deposition chamber and that are controllable to provide a cooling temperature preventing the film-forming material from escaping and scattering away from the inlet and outlet cooling units.

Abstract: A composition for coating a solid support to immobilize and hybridize nucleic acid molecules on the solid support comprises an amine silane and an epoxy silane. A nucleic acid microarray and a method of manufacturing such microarray using such composition are described.