Patents by Inventor Kunhiro Ichimura

Kunhiro Ichimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070134442
    Abstract: The present invention relates to a micropattern retardation element requiring no stretch processing and no extremely high positioning accuracy in cutting films, and the like, and having the retardation region controlled in width of a micron unit, and a producing method therefore. Said micropattern retardation element can be obtained by forming a liquid crystalline or non liquid crystalline polymer thin film layer having photoactive groups, on a substrate, and then, after orientation treatment in a micropattern form, forming a birefringence layer so as to contact with said polymer thin film layer, so that birefringence molecules of said birefringence layer are oriented according to orientation of photoactive groups in said thin film. Said retardation element is used in a three-dimensional display, and the like.
    Type: Application
    Filed: March 29, 2005
    Publication date: June 14, 2007
    Inventors: Daisaku Matsunaga, Masanori Hashimoto, Christian Ruslim, Takashi Tamaki, Kunhiro Ichimura