Abstract: An area S (m2) of a facing surface of each of injectors which faces a glass ribbon is set so as to satisfy: S?(0.0116×P×Cg×T)/{?×F×?(Tgla4?Tinj4)}, wherein P is an output (ton/day) of the glass ribbon; Cg is a specific heat (J/(kg·° C.)) of the glass; T is an acceptable temperature drop (° C.); ? is radiation factor; F is a surface-to-surface view factor; ? is Boltzmann's constant; Tgla is a temperature (K) of the glass ribbon represented by K=(Tin+Tout)/2 where Tin and Tout are measured values of the glass ribbon at the inlet and outlet of the injector, respectively; and Tinj is a temperature (K) of the facing surface of the injector.

Abstract: A method for forming a SiO2 thin film on a glass substrate by an online atmospheric pressure CVD method, which uses, as a raw material gas supply means, a post mixing type raw material supply means of separately supplying a process gas 1 which contains monosilane (SiH4) as a main raw material gas and a process gas 2 which contains oxygen (O2) as an auxiliary raw material gas and mixing the process gases 1 and 2 on the glass substrate, wherein the flow rate of the monosilane (SiH4) per unit width is at least 1.0 NL/min·m, and the process gas 1 contains ethylene (C2H4) in an amount such that the concentration ratio to the monosilane (SiH4) (C2H4 (mol %)/SiH4 (mol %)) is at most 3.2, whereby the deposition rate for forming a SiO2 thin film is improved.

Abstract: A method for producing a glass substrate includes (a) a step of forming molten glass having a temperature T2 less than or equal to 1500° C. on molten tin having an iron concentration greater than or equal to 100 ppm to produce a glass ribbon having a temperature T4 less than or equal to 1100° C. and a logarithm log ? greater than or equal to 8.8, and (b) a step of cooling the glass ribbon to room temperature to produce the glass substrate. The temperature T2 represents a temperature when a logarithm of a viscosity ? (dPa·s) is 2, the temperature T4 represents a temperature when the logarithm of the viscosity ? (dPa·s) is 4, and the logarithm log ? represents a logarithm of a volume resistivity ? (?·cm) at 150° C.

Abstract: A method for manufacturing a laminated film-coated glass substrate in which a laminated film is formed on a glass ribbon by a CVD method by means of a plurality of injectors disposed in an annealing furnace and the glass ribbon is cut, wherein the laminated film is formed at Tg+50° C. or lower and at least two layers of the laminated film are formed in a temperature range of Tg+50° C. to Tg. In addition, a temperature drop K1 per unit length of the glass ribbon in a temperature range where all layers of the laminated film are formed is 0° C./m<K1<10° C./m.

Abstract: A method for manufacturing a laminated film-coated glass substrate in which a laminated film is formed on a glass ribbon by a CVD method by means of a plurality of injectors disposed in the annealing furnace, wherein: the laminated film is formed at Tg+50° C. or lower; and in each of the injectors, if a quantity of heat exchanged between the injector and the glass ribbon is expressed by Q1 (kW), a quantity of heat exchanged between a heater paired with the injector and the glass ribbon is expressed by Q2 (kW), and an output of the glass is expressed by P (tons/day), then the relational expression |Q1|?P×0.116?|Q2|?|Q1| is satisfied.

Abstract: An area S (m2) of a facing surface of each of injectors which faces a glass ribbon is set so as to satisfy: S?(0.0116×P×Cg×T)/{?×F×?(Tgla4?Tinj4)}, wherein P is an output (ton/day) of the glass ribbon; Cg is a specific heat (J/(kg·° C.)) of the glass; T is an acceptable temperature drop (° C.); ? is radiation factor; F is a surface-to-surface view factor; ? is Boltzmann's constant; Tgla is a temperature (K) of the glass ribbon represented by K=(Tin+Tout)/2 where Tin and Tout are measured values of the glass ribbon at the inlet and outlet of the injector, respectively; and Tinj is a temperature (K) of the facing surface of the injector.

Abstract: A method for producing active glass nanoparticles that exhibit upconversion is described. The method employs pulsed-laser ablation of an active glass substrate using, for example, a high repetition rate ultra-short pulse duration laser under normal atmospheric conditions or in a liquid environment.

Abstract: It is to provide a method for removing a tin defect present on the surface of a glass substrate produced by a float process in a short time without the glass substrate surface being damaged regardless of the glass temperature. A method for removing a tin-containing foreign matter from the surface of glass, which comprises applying to the surface of a glass substrate produced by a float process a pulse laser beam having a transmittance of at least 70% through the glass substrate and having a pulse width, a wavelength and an energy density per unit area on the glass substrate surface which satisfy specific relations, to remove a tin-containing foreign matter present on the rear face opposite to the face irradiated with the pulse laser beam.

Abstract: A method for producing active glass nanoparticles that exhibit upconversion is described. The method employs pulsed-laser ablation of an active glass substrate using, for example, a high repetition rate ultra-short pulse duration laser under normal atmospheric conditions or in a liquid environment.

Abstract: It is to provide a method for removing a tin defect present on the surface of a glass substrate produced by a float process in a short time without the glass substrate surface being damaged regardless of the glass temperature. A method for removing a tin-containing foreign matter from the surface of glass, which comprises applying to the surface of a glass substrate produced by a float process a pulse laser beam having a transmittance of at least 70% through the glass substrate and having a pulse width, a wavelength and an energy density per unit area on the glass substrate surface which satisfy specific relations, to remove a tin-containing foreign matter present on the rear face opposite to the face irradiated with the pulse laser beam.

Abstract: A process for producing float glass for a glass substrate particularly for LCD or PDP, the process comprising continuously supplying molten glass on molten tin, stretching the molten glass to form a glass ribbon, and cutting the glass ribbon after it is separated from the molten tin, characterized in that the temperature T0 of the glass ribbon when it is separated from the molten tin is from (TG?50° C.) to (TG+30° C.), where TG is the glass transition point of the float glass.