Patents by Inventor Kuniaki Satou

Kuniaki Satou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10111328
    Abstract: The present invention relates to a photosensitive resin composition containing (A) an acid-modified vinyl group-containing epoxy resin, (B) a photopolymerization initiator, (C) a thiol group-containing compound, and (E) a photopolymerizable compound, wherein the component (A) contains at least one acid-modified vinyl group-containing epoxy resin (A1) which is obtained from a bisphenol-novolak epoxy resin (a1) having a structural unit represented by a general formula (IV) or (V), and an acid-modified vinyl group-containing epoxy resin (A2) which is obtained from an epoxy resin (a2) differing from the epoxy resin (a1).
    Type: Grant
    Filed: March 6, 2014
    Date of Patent: October 23, 2018
    Assignee: HTACHI CHEMICAL COMPANY, LTD.
    Inventors: Nobuhito Komuro, Shinya Oosaki, Toshizumi Yoshino, Kuniaki Satou
  • Publication number: 20160007454
    Abstract: The present invention relates to a photosensitive resin composition containing (A) an acid-modified vinyl group-containing epoxy resin, (B) a photopolymerization initiator, (C) a thiol group-containing compound, and (E) a photopolymerizable compound, wherein the component (A) contains at least one acid-modified vinyl group-containing epoxy resin (A1) which is obtained from a bisphenol-novolak epoxy resin (a1) having a structural unit represented by a general formula (IV) or (V), and an acid-modified vinyl group-containing epoxy resin (A2) which is obtained from an epoxy resin (a2) differing from the epoxy resin (a1).
    Type: Application
    Filed: March 6, 2014
    Publication date: January 7, 2016
    Applicant: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Nobuhito KOMURO, Shinya OOSAKI, Toshizumi YOSHINO, Kuniaki SATOU
  • Patent number: 8642714
    Abstract: The present invention provides a phenol resin having, as a unit in its main-chain skeleton, a structure represented by the following general formula (I), as well as a resin composition using the same. According to the phenol resin of the invention, epoxylation thereof, chemical modification thereof, reaction thereof with an epoxy resin, and the like are facilitated. Phenol resins ranging from low-molecular-weight resins rich in fluidity to high-melting resins can be synthesized, and these phenol resins are industrially useful. When the phenol resin of the present invention is used as a hardening agent for epoxy resin etc., its resin composition can give a cured product of high Tg without deteriorating adhesiveness.
    Type: Grant
    Filed: January 24, 2007
    Date of Patent: February 4, 2014
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Haruaki Sue, Kuniaki Satou, Osamu Matsuzaka
  • Patent number: 7718090
    Abstract: The present invention provides an electroconductive paste that can contain a high proportion of an electroconductive powder, has excellent electroconductivity reliability and migration resistance, has a highly competitive price due to a reduced amount of silver plating, and is suitable for use in solder electrode formation, an electroconductive adhesive, etc. The electroconductive paste of the present invention comprises a binder and an electroconductive powder containing 80 to 97 wt % of a substantially spherical silver-coated copper powder in which the surface of a copper powder is coated with silver and the surface thereof is further coated with 0.02 to 0.5 wt % relative to the copper powder of a fatty acid, and 3 to 20 wt % of a flat-shaped silver-coated copper powder in which the surface of a copper powder is coated with silver and the surface thereof is further coated with 0.02 to 1.2 wt % relative to the copper powder of a fatty acid.
    Type: Grant
    Filed: November 13, 2003
    Date of Patent: May 18, 2010
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Hideji Kuwajima, Jun-ichi Kikuchi, Kuniaki Satou
  • Publication number: 20090171061
    Abstract: The present invention provides a phenol resin having, as a unit in its main-chain skeleton, a structure represented by the following general formula (I), as well as a resin composition using the same. According to the phenol resin of the invention, epoxylation thereof, chemical modification thereof, reaction thereof with an epoxy resin, and the like are facilitated. Phenol resins ranging from low-molecular-weight resins rich in fluidity to high-melting resins can be synthesized, and these phenol resins are industrially useful. When the phenol resin of the present invention is used as a hardening agent for epoxy resin etc., its resin composition can give a cured product of high Tg without deteriorating adhesiveness.
    Type: Application
    Filed: January 24, 2007
    Publication date: July 2, 2009
    Applicant: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Haruaki Sue, Kuniaki Satou, Osamu Matsuzaka
  • Publication number: 20060145125
    Abstract: The present invention provides an electroconductive paste that can contain a high proportion of an electroconductive powder, has excellent electroconductivity reliability and migration resistance, has a highly competitive price due to a reduced amount of silver plating, and is suitable for use in solder electrode formation, an electroconductive adhesive, etc. The electroconductive paste of the present invention comprises a binder and an electroconductive powder containing 80 to 97 wt % of a substantially spherical silver-coated copper powder in which the surface of a copper powder is coated with silver and the surface thereof is further coated with 0.02 to 0.5 wt % relative to the copper powder of a fatty acid, and 3 to 20 wt % of a flat-shaped silver-coated copper powder in which the surface of a copper powder is coated with silver and the surface thereof is further coated with 0.02 to 1.2 wt % relative to the copper powder of a fatty acid.
    Type: Application
    Filed: November 13, 2003
    Publication date: July 6, 2006
    Inventors: Hideji Kuwajima, Jun-ichi Kikuchi, Kuniaki Satou
  • Publication number: 20060141381
    Abstract: A photosensitive resin composition, characterized in comprising: (A) a polymer having a carbon hydrocarbon double bond and carboxyl group, formed by the reaction of an acid anhydride with the reaction product of an epoxy compound having a structure wherein a glycidyloxy group is bonded to a main chain comprising an aromatic ring, an alkylene group and an oxygen atom, with an unsaturated carboxyl compound having a carbon-carbon double bond and a carboxyl group, (B) a photopolymerizable monomer, (C) a radical photopolymerization initiator, and (D) a curing agent having reactivity with the functional groups of the polymer and/or the photopolymerizable monomer. Using this photosensitive resin composition, a solder resist having excellent resolution, adhesion, PCT resistance, electrical corrosion resistance, heat resistance and thermal impact resistance can be formed.
    Type: Application
    Filed: October 8, 2003
    Publication date: June 29, 2006
    Applicant: Hitachi Chemical Co., Ltd.
    Inventors: Toshizumi Yoshino, Kuniaki Satou, Masayoshi Joumen, Masayuki Hama, Keishi Hamada, Tsutomu Mamiya, Tooru Katsurahara, Kenichi Kawaguchi
  • Patent number: 7049036
    Abstract: Disclosed are a photosensitive resin composition comprising a photosensitive resin (A), a photopolymerization initiator (B), and a flame retardant (C), in which a content of halogen atoms or antimony atoms in the flame retardant is 5% or less by weight; a photosensitive element using this; a method of manufacturing a resist pattern; a resist pattern; and a resist pattern laminated substrate.
    Type: Grant
    Filed: October 23, 2000
    Date of Patent: May 23, 2006
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Kuniaki Satou, Takahiko Kutsuna, Toshizumi Yoshino, Takao Hirayama, Mikio Uzawa
  • Patent number: 5539051
    Abstract: There are disclosed a resin composition for coating which comprises a mixture of(i) a non-aqueous dispersion type resin containing(A) a vinyl polymer soluble in an organic solvent mainly comprising an aliphatic hydrocarbon, and(B) a vinyl polymer particle which is insoluble in the organic solvent and obtained by polymerizing a polymerizable unsaturated compound in the organic solvent using the vinyl polymer (A) as a dispersant, and(ii) a solvent type resin of(C) a vinyl polymer having a silyl group represented by the formula (I) which is soluble in the organic solvent: ##STR1## wherein R.sup.1 represents an alkyl group, an aryl group or an aralkyl group, X represents a halogen atom, an alkoxy group, an acyloxy group or a hydroxy group, and k is an integer of 1 to 3,and a paint containing the same.
    Type: Grant
    Filed: October 15, 1993
    Date of Patent: July 23, 1996
    Assignee: Hitachi Chemical Company Co., Ltd.
    Inventors: Kuniaki Satou, Tsutomu Mamiya, Takashi Amano, Akira Hironaka